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I . 7 'prll' ".IIIV ‘7 .771” ‘VVV .7I7 I' '7III‘I'7V . ‘ 7.'.7.7 ' ' I I II' vet-0‘ LIBRAR Y Michigan Sm: Univcnicy This is to certify that the thesis entitled The Electrical Resistivity and the Thermoelectric Ratio of Potassium and Dilute Potassium-Rubidium Alloys Below lK presented by Chi-Wai Lee has been accepted towards fulfillment of the requirements for Ph.D. degree in Physics has Major professor Date August 1, 1980 0-7639 OVERDUE FINES: \ 25¢ per day per item fu‘é‘ékaL A RETURNING LIBRARY MATERIALS: Place in book returnt to remove charge from circulation records THE ELECTRICAL RESISTIVITY AND THE THERMOELECTRIC RATIO OF POTASSIUM AND DILUTE POTASSIUM-RUBIDIUM ALLOYS BELOW 1 K By Chi-Wai Lee A DISSERTATION Submitted to Michigan State University in partial fulfillment of the requirements for the degree of DOCTOR OF PHILOSOPHY Department of Physics 1980 (.27 // (L762) “U ABSTRACT THE ELECTRICAL RESISTIVITY AND THE THERMOELECTRIC RATIO OF POTASSIUM AND DILUTE POTASSIUM-RUBIDIUM ALLOYS BELOW 1 K By Chi-Wai Lee We have measured the electrical resistivity of K and dilute K-Rb Alloys with a new high precision technique (0.1 ppm) and the thermoelectric ratio of the same specimens over the temperature range from “.2 K to 0.07 K. Measurements were carried out on free hanging, polycrystal- line specimens with emphasis on data below 1 K, especially for the resistivity. Our resistivity data above 1 K are comparable to previously published results by others. Below 1 K, the resistivity due to electron-phonon scat- tering becomes at least three orders of magnitude smaller than the total temperature dependent resistivity, therefore our results are not affected by the phonon effect. For the pure K, we have measured one 1.5 mm diameter sample and three 3 mm diameter samples. For the K-Rb alloys, we Chi-W31 Lee have measured five 3 mm diameter samples of nominal atomic concentrations 2.2A%, 0.83%, 0.32%, 0.13% and 0.05%. For the pure K, our resistivity data below 1 K for the 2 3 mm samples show a possible T dependence from 1.0 K to 0.4 K, but there is complicated behavior below 0.“ K. In the temperature range from 0.08 to 0.42 K, best fits 1.910.03 with T were observed, and below 0.2 K, possible T2 fits were again found. For the 1.5 mm sample, the temperature dependence was found to be lower than T2 and higher than T from 1 K down to at least 0.2 K. Below 2 dependence. The 2 0.2 K, the data are consistent with a T coefficients determined from the possible T terms for the pure samples range from (2.57:0.5) x 10-13 t0 (3.2:0-3) x 10"13 Q-cm/K2. These T2 terms are consistent with the theory of simple isotropic e-e scattering, i.e., they are of the right magnitude and roughly sample independent. However, there are presently no satisfactory explanations for the apparent Tl'9 dependence for the 3 mm samples and the different behaviors of the 1.5 mm sample and the 3 mm samples above 0.2 K. 2 For the K-Rb alloys, a term proportional to T and to the residual resistivity is positively identified below 1.3 K. This is consistent with the resistivity due to inelastic electron—impurity scattering as predicted by Koshino-Taylor. We obtained, below 1.3 K, the re- sistivity p = p + (8.510.26) x 10-6 p0 T2 + (2.15:0.32) o x 10-13 T2 Q-cm. The term (8.5:0.26) x 10'6 00 T2 is Chi-Wei Lee best described by the theory of inelastic electron-im— purity scattering. The coefficient is close to the theo- retical value. We believe that this is the first time the Koshino-Taylor term has unambiguously been observed. The other T2 term (2.15:0.32) x 10"13 T2 Q-cm can be com- pared with the results of the pure samples for which a term (2.7:0.27) x 10—13 T2 Q-cm was found. This T2 term, which is independent Of p0, could be associated with e—e scattering. The measurements of the thermoelectric ratio of K and K-Rb alloys were made with higher precision than that which has been attained before. we were able to unam- biguously separate the diffusion component, the normal phonon drag component and the umklapp phonon drag component. For the pure samples, the thermoelectric ratio was found to be of the form G = G0 + AT2 + % e'e*/T. From the data up to 4.2 K, we obtained for the umklapp phonon drag 6* = 23:2 K. From the data below 1.0 K, we obtained the 1 and the normal phonon drag component A = -0.30:0.01 V'lK’Z. These results are diffusion term G0 = —0.03:0.03 V- consistent with the results of MacDonald 33 al. For the K- Rb alloys, we found the positive diffusion thermoelectric ratio characteristic of Rb impurities in K to be G0 = Rb in K + 0.A8 i 0.01 V”1 from a Gorter-Nordheim plot. The normal phonon drag is quenched slightly and is no longer ac- 2 curately a T dependence. The normal and umklapp phonon Chi-wai Lee drag terms are quenched more and more as the impurity concentration increases, similar to the data of Guénault and MacDonald. TO MY PARENTS ii ACKNOWLEDGMENTS It is a great pleasure to acknowledge my thesis ad- visor, Professor Jack Bass, whose guidance, support and criticism at all stages of this research were invaluable. I am indebted to Professor W. P. Pratt for his advice and help in the construction of the dilution refrigerator system, especially for his construction of the dilution unit and the direct current comparator and the recalibra- tion of the thermometer. I would also like to thank Professor Peter Schroeder for his advice and aid in carry- ing out this research. I wish also to thank Dr. John Rowlands for his helpful advice and ideas in the design and handling of potassium. Thanks are also due to Pro- fessor Robin Fletcher for suggestions involving the glove box. The time donated by Mark Haerle in helping to make measurements is gratefully acknowledged. Specific thanks go to Dr. Gopal Kote, Vernon Heinen, Brent Blumenstock and Henry Elzinga for their help in various stages of the construction of the dilution re- frigerator system. Thanks are also due to Dan Edmunds for his help in constructing various items of electronic equipment, especially the current comparator, and to Boyd Schumaker for preparing the Ag-Au alloy and Ag thermal iii links, as well as his help in various other ways. I would like to thank all the guys of the machine shop for their help in constructing the various pieces of appara- tus. I would also like to acknowledge the financial support of the National Science Foundation. iv Chapter TABLE OF CONTENTS LIST OF TABLES . . . . . . . . . . LIST OF FIGURES. . . . . . . . . . . . I. II. INTRODUCTION . . . . . . . . . . . 1. l. 2 2. 1. Basic Electronic Transport Properties of Metals . . . . . . . 1.1.1. Electrical Resistivity '0 1.1.2. Thermal Conductivity K 1.1.3. Thermoelectric Power S Previous Work on K and K-Rb. . . . 1.2.1. Resistivity. . . . . . . 1.2.2. Thermopower. . . . . . . Present Thesis . . . . . . . . . 1.3.1. Electrical Resistivity . 1.3.2. Thermoelectric Ratio G EXPERIMENTAL TECHNIQUES . . . . . . . .l. 2. Dilution Refrigerator. . . . . . High Precision (0.1 ppm) Resistance Bridge . . . . . . . . . . . . . 2.2.1. SQUID (Superconducting Quantum Interference Device . . . . . . . . . . 2.2.2. Current Comparator Resistance Bridge. . Page .Viii \O\OO\U'1 13 15 17 3A Chapter Page 2.3. Measurement Methods. . . . . . . . . . . . 36 2.3.1. Resistivity. . . . . . . . . . . . 36 2.3.2. Thermoelectric Ratio G . . . . . . A2 2.3.3. Thermometry. . . . . . . . . . . . uu 2.A. Sample Preparation . . . . . . . . . . . . A5 2.5. Error Analysis . . . . . . . . . . . . . . 58 2.5.1. Temperature Determination. . . . . 58 2.5.2. Heat Loss. . . . . . . . . . . . . 61 2.5.3. Thermal e.m.f. and Johnson NOise. O O O O O O O O O O O O O O 6“ 2.5.“. Uncertainty in p0 and Sample Contraction. . . . . . . . . . . 65 III. THEORY . . . . . . . . . . . . . . . . . . . . 69 3.1. Basic Transport Theory . . . . . . . . . . 69 3.2. Resistivity p. . . . . . . . . . . . . . . 76 3.2.1. Resistivity due to Electron- Phonon Scattering. . . . . . . . . 79 3.2.2. Resistivity due to Electron- Electron Scattering. . . . . . . . 80 3.2.3. Resistivity due to Electron- Impurity Scattering. . . . . . . . 82 3.3. Thermopower S. . . . . . . . . . . . . . . 83 3.3.1. Diffusion Thermopower. . . . . . . 83 3.3.2. Phonon Drag. . . . . . . . . . . . 85 3.3.3. Impurity . . . . . . . . . . . . . 88 3.“. Thermoelectric Ratio G . . . . . . . . . . 90 3.5. The Resistivity of K . . . . . . . . . . . 93 vi Chapter Page 3.5.1. The Resistivity of K Above 105 K. o o o o o o I o o o o o o 9!" 3.5.2. The Resistivity of K Below 105 K. o o o o o o o o o o o o o 97 3.6. The Resistivity of K-Rb. . . . . . . . . . 101 3.7. The Thermopower of Pure K. . . . . . . . . 105 3.8. The Thermopower of K-Rb. . . . . . . . . . 109 IV. THE EXPERIMENTS AND RESULTS . . . . . . . . . . 114 4.1. Resistivity for Pure K . . . . . . . . . . 114 4.2. Resistivity for K-Rb . . . . . . . . . . . 133 4.3. Thermoelectric Ratio for Pure K. . . . . . 145 4.4. Thermoelectric Ratio for K-Rb. . . . . . . 151 4.5. Discussion and Summary . . . . . . . . . . 158 4.5.1. Resistivity for Pure K . . . . . . 158 a. Isotropic e-e Scattering . . . . . 159 b. Anisotropic e-e Scattering . . . . 160 c. Electron-Phason Scattering . . . . 162 d. Conclusion . . . . . . . . . . . . 165 4.5.2. Resistivity for K-Rb Alloys. . . . 166 4.5.3. Thermoelectric Ratio for K and K-Rb . . . . . . . . . . . . 166 REFERENCES . . . . . . . . . . . . . . . . . . . . . 169 APPENDIX A . . . . . . . . . . . . . . . . . . . . . 173 vii Table 2-3 2-4 LIST OF TABLES Page Characteristics of the samples. (a) Pure potassium samples; (b) K-Rb alloys; (c) Samples of Guenault and MacDonald(23) (for comparison). . . . . . . 54 Parameters of the alkali metals (after Ziman(l)). . . . . . . . . . . 57 Transition temperatures of the superconducting fixed point devices used to recalibrate the thermometer and the cor- responding temperature indicated by the thermometer. . . . . . . . . . . . . 59 The thermal conductance of the Ag-Au wire, the Nylon support and the stainless steel tube at 4 K and 1 K and the ratios to the thermal conductance of the Ag-Au wire . . . . . . . .63 The values of AV/IR at tempera- tures 0.1 K, 0.5 K, 1.0 and 3.0 K viii Table Page 2-5 and the values of Vn/IR at 1 K for K-Rb 2.24%, K-Rb 0.83% and Pure sample K 1 . . . . . . . . . . . . . . 66 4-1 The ratios of AT from the Wiede- mann-Franz law to AT' from direct measurements for the pure sample K1, K2 and K4 . . . . . . . . . . . . . . . 116 4-2 The ratios of AT from the Wiede- mann-Franz law to AT' from direct measurements for the K—Rb 0.13%, 0.32%, 0.83% and 2.24% alloys . . . . . . . 135 4-3 The parameters from the best fits to the term BTe-e*/T for the K—Rb 0.32%, 0.83%, 2.24% samples . . . . . . . . 138 4-4 The coefficients A of the T2 terms for the K-Rb alloys and pure K sample K4. . . . . . . . . . . . . . . . . . . . . 139 4-5 Comparison between results of our data and the results of MacDonald, _t _l.(22) for the pure K and of Guenault and MacDonald<23> for the K-Rb alloys, assuming 8' = GLOT 2 C -e*/T (GO+AT +Te )LOT A'T+B'T3+C'e'9*/T. . . . . . . . . . 150 ix Table Page 4-6 The diffusion components GO of the pure samples K1 and K2 and the K—Rb alloys 0 o o o o o o o o o o 0152 Figure LIST OF FIGURES Page Conventional low temperature measure- ment methods for resistivity and thermo- power. (a) Resistivity measurement; (b) Thermopower measurement . . . . . . . 3 “He solutions. Phase diagram of 3He- (After Radebaugh, NBS Technical Note 362, 1967). . . . . . . . . . . . . . 20 The principal parts of a conven- tional dilution refrigerator: 1. Condenser, 2. Main impedance, 3. Still, 4. Still heat-exchanger, 5. Discrete heat exchangers, 6. Phase boundary, 7. Mixing chamber, 8. 1.3K “He pot, 9. Orifice, 10. Dilute phase, 11. Contin- uous heat exchanger, 12. Concentrated phase. . . . . . . . . . . . . . . . . . . 22 Bellow assembly for vibration isola— tion . . . . . . . . . . . . . . . . . . . 27 Schematic diagram of the dilution refrigerator gas handling system . . . . . 28 xi Figure Page 2-5 The rms value of the minimum detectable voltage as a function of Rx for four different values of Tx’ assuming that Af = 1 Hz, T6 = 4.2K, and Re = 12 mg. The limiting behavior, l/2 = [4kAf Te Ri/Rell/2 is shown by the dashed line. (After Lounasmaa<30)) . . . . . . . . . . . . . . 33 2-6 Simplified block diagram of resistance bridge. Inside the region with a bold outline, the components are at 4K or below and all the wiring is superconducting. (After Edmunds, gt a1.(38).) . . . . . . . . . . . . . . . 35 2-7 Schematic diagram of the set up of specimens for resistivity measure- ment using the temperature modulation technique.G heaters are included for G measurements . . . . . . . . . . . . . . . 38 2-8 Calibration curve for thermometer Th2 (GR-200A-30) . . . . . . . . . . . . . 46 2-9 Potassium sample holder: 1. Copper well for attachment to mixing chamber, 2. G heater electrical leads, 3. Ag thermal link, 4. Current and potential xii Figure 2-9 2-10 2-11 3-1 Page leads, 5. Brass flange, 6. 1/8" stainless steel tube, 7. Nylon sup- port, 8. OFHC copper pieces, 9. Po- tassium samples, 10. G heater, 11. P0- tassium cold welded to copper, 12. Super- conducting leads . . . . . . . . . . . . 48 Dry box gas handling system. . . . . . . 50 Sample press . . . . . . . . . . . . . . 52 Schematic diagrams of the electron- phonon normal and umklapp processes for spherical Fermi surfaces that do not touch the lst Brillouin zone boundary. . 81 Plot of resistivity vs T for the data of sample K2C of Rowlands §£.e1-(lu) The fitting curve with J4 is shown. In the inset, extrapolations of Tl°5, J2, J“, J5 fits to lower tem- peratures are shown. (After Bishop and Overhauser(15).) . . . . . . . . . . 102 121.0. .1. Plots of log (p dT) vs T for sample Kl. Similar results extracted from data of van Kempen gt al.(l3) and of Ekin and Maxfie1d(11) are also shown for comparison . . . . . . . . . . 117 xiii Figure 4-3 4-4 4-5 4-6 4-7 4-8 Page Plots of % %% vs T below 1.6K for the two runs on K1 (Kla and Klb) . . . . 119 Plots of l g% vs T below 1K for 0 sample Kl, showing both data using measured AT and using AT from the Wiedemann-Franz law. Open squares are data obtained from differentiating C(T) below 0.25K . . . . . . . . . . . . 120 Plots ofll g9 vs T below 1K for p dT sample K2, showing both data using measured AT and using AT from the Wiedemann-Franz law. Open squares are data obtained from differentiating C(T) below 0.25K . . . . . . . . . . . . 121 Plots of C vs T and T2 below 0.25K for sample K1 (1.5 mm) . . . . . . . . . 123 Plots of C vs T and T2 below 0.25K for sample K2 (3mm). . . . . . . . . . . 124 2 Plots of C vs T and T below 0.45K for sample K3 (3 mm) showing both data using old temperature calibra- tion (.) and new temperature cali- bration (o). . . . . . . . . . . . . . . 125 2 Plots of C vs T for sample K3 (3 mm) showing three sets of measurements . . . 126 xiv Figure u-9 4-10 4-11 4-12 4-13 4-14 4-15 Page Plots of C vs T and T2 below 0.25K for sample K3 (3 mm), showing two sets of measurements . . . . . . . . . . . 128 Plots of C vs T2, Tl'g, Tl'8 below 0.45K for sample K3. . . . . . . . . . . . 129 Plots of C vs T2, Tl'9, T below 0.45K for sample K4. . . . . . . . . . . . 130 1 do Plots of E'dT vs T below 1K for samples K2, K3 and K4. Open symbols are data obtained from differentiating C(T) . . . . . . . . . . . 131 1.99 .1. _ Plots of log (p dT) vs T for K Rb 2.24% and 0.32% samples. .’. . . . . . . . 136 The fitting curve for % %% data of K-Rb 0.32%, assuming p = pO + AT2 - i e 6 /T. Shown in the three + BT temperature ranges: (a) 0 to 4.2K, (b) o to 2.5K, (c) o to 1K. 6* = 19.6K . . . . . . . . . . . . . . . . 140 Plots of %'%% vs T for T < 1.3K for K-Rb alloys 2.24%, 0.83%, 0.32%, 0.13% and 0.05%. Typical error bars are shown for the 0.13% sample . . . . . . . . 141 XV Figure Page 4—16 The coefficient A of the T2 term plotted against po for the K-Rb alloys 0 O 0 O 0 O 0 O O O O O O O O O O O 1182 4-17 The slope M ( = EA) plotted against 1 0 po 0 O O O O I O O I C O O O O O O O O O O 1“” 4-18 G data for samples K1 and K2 and the K—Rb alloys below 4.2K . . . . . . . . 146 4-19 The fitting curve for the G data of sample K1, assuming G = G0 + AT2 + _ i g e 9 /T with 6* = 23i2K . . . . . . . . . 1u7 4-20 Plots of G vs T and T2 for samples K1 and K2 below 1.2K . . . . . . . . . . . 148 4-21 G data below 4.2K for the K-Rb alloys . . . . . . . . . . . . . . . . . . 153 4—22 Plots of G vs T below 1.2K for the K-Rb alloys. . . . . . . . . . . . . . . . 154 4-23 Plots of G vs T and T2 below 1K for the K-Rb 2.24%, 0.83%, 0.32% and 0.13% alloys and pure sample K1. . . . 155 4-24 Gorter-Nordheim plot: G0 vs 5; 1 0 G0 = +Oou8i0001 (V) o o o o o o o o o 156 Rb in K 4-25 The fitting curve for % g%~data of K1 below 1K, assuming p = p0 + AT2 J2 (e¢/T), With 6 = uoBSKo o o o o o o o o o o o o o 163 ¢ xvi Figure 4-26 A-3 Best fit to % %9 data of K1 below 1K, assuming p = p0 + AT2 J2 (6¢/T), With e¢ = 605K 0 o o o o o o o o The principal types of Josephson Junction. a) Tunnel Junction. b) Normal or semiconductor barrier Junc— tion. c) Dayem bridge. d) Adjustable point-contact. e) Solder drop 'SLUG'. f) Crossed wire or hair pin Junction (After Giffard et al., Prog. Quan. Electr., 4, 301 (1976)). a) The Josephson Junction in a superconducting loop. b) Single Junction, rf biased symmetric SQUID of Zimmerman, Thiene and Harding<36) ¢/¢O as a function of ¢ext/¢o in three cases: 211LJc = ¢ 3¢O and o’ 5¢O. Vertical lines with arrows correspond to discontinuous changes of one flux quantum in the fluxoid ¢' a and to somewhat smaller changes in the flux ¢. (After Lounasmaa<30)) . . . . The staircase pattern. The voltage Urf across the tuned L C -circuit is shown as a rf rf xvii Page 164 175 176 179 Figure Page function of the rf level. At the plateaus the quantity plotted is Urf(maX), the voltage Just before a dissipative transition occurs. (After Lounasmaa<3o)). . . . . . . . . . . 180 The "triangle" pattern. The maximum voltage Urf(maX) vs ¢dc for different values of the rf level. (After Lounasmaa<30)) . . . . . 182 Typical rf SQUID electronics . . . . . . . 183 xviii I. INTRODUCTION In this introduction, we first define the basic elec- tronic transport properties of metals and then review pre- vious work on K and K-Rb. We will indicate why we were interested in measurements on K and K-Rb at very low tem- peratures. Then the work in the present thesis is briefly described. In Chapter 2, the experimental techniques relevant to this work are described. In Chapter 3, the basic transport theory applicable to potassium and K-Rb alloys is given. The experimental results are presented and interpreted in Chapter 4. 1.1. Basic Electronic Transport Properties of Metals The electronic transport properties of a cubic metal are completely determined from measurements of the electrical resistivity, o, thermal conductivity K and thermoelectric power S. Study of the temperature dependence of these properties down to very low temperatures provides informa- tion about the dominant scattering mechanisms of the electrons in metals. For a cubic metal, the macroscopic electronic transport equations are given by + + E = pJ + SVT (l-la) 6 = %§.E - K$T., (l-lb) where E is the electric field, 0 the heat current density and RT the temperature gradient applied to the metal. In the following, we will define p, K, S as well as a new quantity G, the thermoelectric ratio, based on these equa- tions. We will only discuss these properties at low temp— erature (less than 6D/30, where 6 is the Debye temperature). D 1.1.1. Electrical Resistivity p The electrical resistivity p is defined as p =,% (1-2) where E and J are in the same direction. Low temperature electrical resistivity is best measured with a potentiom- etric method. A conventional method is shown in Figure 1-la. The specimen at temperature T is measured in a 4-termina1 configuration. A known current Ix is passed through the specimen (through the current leads), and is nulled using a very sensitive null-detector, by the voltage V across a 1 thermal link to cold sink at (-———— controlled temperature Fir—'4— Ir reference resistor at 4 K l..__’_ I' X ‘9 n superconductinc leads / < ., Tc —— reference AT Rf resistor ll"—‘ é # heater b. Thermopower = - 33L AT Figure 1-1. Conventional low temperature measurement methods for resistivity and thermopower. (a) Resistivity measurement; (b) Thermo- power measurement. reference resistor produced by current Ir' The reference resistor is normally held at constant temperature (e.g., 4.2 K). p(T) is then given by Ir =-I—)-{-RT pn> pm> m_1. _ om-I , (13) X where A is the cross-sectional area of the sample and A is the separation between the potential leads. At temperatures much below the Debye temperature,the resistivity, according to basic transport theory, is ex- (1) pected to have the form _ N U , C(T) - D0 + pe-e + pe-ph + pe-ph ' (1-4) p0 is the residual resistivity caused by elastic scattering of electrons by residual impurities or lattice defects in the metal. The resistivity is said to be in the "dirty" limit(2) when 90 is much greater than the other terms. pe-e is attributed to electron-electron scattering and is 2 expected to have a temperature dependence of the form AT , where the coefficient A is essentially independent of p0(3). N pe-ph is due to electron-phonon scattering normal processes (see Section 3.2 for a discussion of normal and umklapp processes). From Bloch-Grfineisen theory, 02-ph = BT5. In general, we have 82-ph m Tn, with n = 5. The last term pg_ph is attributed to electron-phonon umklapp processes, which in a metal such as K, with a spherical Fermi surface completely within the first Brillouin zone and not touch- (1) ing the boundary, is expected to have the form U -8*/T 'pe-ph « e . where 6* is a constant. This term diminishes much faster than the p§_ph indicated above and thus would normally be expected to be negligible at sufficiently low temperatures. 1.1.2. Thermal Conductivity K The thermal conductivity K due to electronic conduc- tion is defined as 6'9 K = .. . (l-S) VT E=0 (l) K is related to p by the Wiedemann-Franz law 59 = L . (1-6) When elastic scattering of electrons is dominant, 2 2 L = L = Il_3_ k = 2.145 X 10-8 VZK-2 0 L0 is known as the ideal Lorentz number. 1.1.3. Thermoelectric Power S Thermoelectric power or thermopower S is associated with the Seebeck effect, which is one of the three basic thermoelectric effects: Seebeck, Peltier, and Thomson effects. These three effects are related through the Kelvin- (l) Onsager relations and thus can all be determined when one is known. The thermopower S is defined as .12 S = VT (1‘7) + J=O When a temperature gradient AT/AX is established across a metal, a thermoelectric e.m.f. AV appears between the hot and the cold ends of the metal. For low temperature measure- ments, the specimen is best measured in a 4—terminal con- figuration as shown in Figure 1-1b. The thermal e.m.f. AV across the potential leads is nulled by a nulling voltage, such as that across a reference resistor, using a null detector. The leads to the potential probes are super- conducting wires so that there is no thermal e.m.f. due to the leads(u). The temperatures at the hot and cold ends are measured with thermometers,which allow the determina- tion of AT. S(T) is then given by __E_ -_-_9_‘l _ S‘VT AT ° (18) (5) At low temperatures, S(T) is expressed as _ N U where Sdiff is due to electron diffusion, s: is the normal U 8 thermopower. Sdiff is expected to have the form is the Umklapp phonon drag (5) phonon drag thermopower and S diff = AT , (1-10) and s = BT3 , (1-11) whereas for K (1-12) Another quantity associated with S, the thermoelectric ratio G, which was first introduced by Garland and Van- Harlingen(6), is defined as G = 4 . <1-13) Q where J is the current density through the sample needed to null the thermal e.m.f. caused by the heat current den- sity Q. G is easier to measure than S in that there is no need to determine AT and J and Q can be measured accurately. In general, S = GLT and QIU) l - Kp. (1-14) When elastic scattering is dominant, L = L0 and U) ll so that determination of G implies determination of S. At low temperatures, when elastic scattering predom— inates, G is expected to have the form n -6 /T 2 Be (1-15) 2 term is where G0 is due to the electron diffusion, the T the normal phonon drag term and the third term is the um- klapp phonon drag term appropriate to K. In the next section, a review is given of previous work on p and S for K, which shows that p deviates from the simple temperature dependence indicated above, whereas S does not. 1.2. Previous Work on K and K-Rb 1.2.1. Resistivity In the past decade, there has been a lot of interest in the study of the resistivity of pure potassium. K is a simple monovalent metal with cubic symmetry and a nearly spherical Fermi surface (to within 0.1% according to deA (7)). measurements It is studied in preference to other alkali metals because it has several advantages. Li and Na undergo martenistic transitions (from b.c.c. to h.c.p. structure) when cooled down from room temperature to liquid helium temperatures. Rb and Cs are much more reactive than K and therefore more difficult to handle. Earlier resistivity measurements on K by MacDonald et a1. (1956)(8) in the range 2 to 8°K, by Natale and Rudnick (1968)(9) below 7K and by Garland and Bowers (1969)(10) from 2 to 4K showed an approximate T5 dependence. However, in 1971, more precise resistivity measurements were re- (11) ported by Ekin and Maxfield from 1 to 25K and by 10 (12) Gugan from 1.2 to 4.2K. Both groups found clear devia- tions from the T5 law, which were consistent with an exponen- tial behavior below about 4.2K. Gugan analyzed his data in the form o(T) = NT5 + U(T) e‘l/T = o” + p” . Equally good fits could be obtained with and without the T5 term. Assuming U(T) = U Tn, with n=0 the fit with and 0 without the T5 term yielded ¢ = 23.6 °K and ¢ = 23.1K, respectively. Fairly good fits could be obtained up to Tn is to reduce ¢ by (12) n=3 in U(T). The effect of U(T) = UO about 2.8K for each additional power of T (13) Later, van Kempen et a1. measured pure K with very high pre- cision (ml ppm) from 1.1 to 4.2K and fitted the electron- phonon resistivity (corrected for DO and a T2 term determined from data below 1.75K, see below) to the form expected for electron-phonon umklapp scattering n -e*/T pe—ph = BT e ’ with n = l and 6* = 19.9 i 0.2K. No normal electron- phonon T5 term was required and the term BTn e'Ew/T was consistent with the data of Ekin and Maxfield and of Gugan. The absence of the T5 term is now understood from the nonequilibrium nature of the phonons (phonon drag ll effect) and the theory is described in more detail in Section 3.5. Lawrence and Wilkins in 1972(3) had predicted for K at temperatures below about 2K a dominant electron—electron scattering term proportional to AT2 with A z 0.17 x 10-12 0cm/K2. The coefficient A was expected to be independent of po and of other scattering mechanisms. Van Kempen et al(13) fitted their resistivity data on K below 1.75K to the formula S -6*/T p = 00 + AT + BTn e (1-17) with n and 9* as given above. They pointed out that their data could be equally well described with S between 1 and 2. Using S = 2, as expected from the theory of electron-electron scattering, the coefficient A they obtained showed varia- tions from sample to sample by as much as a factor of 3.6, in contradiction to theory. In 1978, Rowlands et a1.(lu) extended measurements of the resistivity of K down to 0.5K, also with very high precision (m0.l ppm). Their results showed a possible deviation from T2 behavior, with a best fit of the form ATl'S from 0.5K to 1.3K with A = (86 i 10) -6 -1.5 (15) x 10 p0 K . Bishop and Overhauser such a form could be explained by the scattering of elec- argued that trons by phasons - the collective excitations of an incom- mensurate charge density wave. Later, Levy et a1 (1979)(l6) 12 reported additional measurements on pure K and claimed to 2.0:0.l observe from 1.1 to 1.4K a term AT attributed to electron-electron scattering. They also found that the coefficient A was sample dependent, with Ao=(od/po)2 3 where pd is the contribution to p0 arising from electron- dislocation scattering, as predicted by a theory of Kaveh (17). If the temperature dependence of the and Wiser resistivity data of van Kempen, et a1., and of Rowlands, et a1., were assumed to be T2 (below 1.5K), Kaveh and Wiser were able to explain the sample dependence of their results also. 8 In order to resolve the apparent discrepancies discussed above for data below 1.5K, one needs very high precision measurements down to below 0.1K, so that other higher power temperature dependent terms such as e-6 /T, etc., become negligible, and a sufficient temperature range so that the power of T can be definitely established. No high precision resistivity measurements on any alloys of K with known amountscfi‘known impurities at low temperatures have been previously reported. According to (18) Koshino , also Taylor (19), an impurity concentration dependent T2 term in the resistivity could be due to the in- elastic scattering of electrons by impurities. Kus and (20) Taylor performed a more detailed calculation of this T term for K—Rb alloys and obtained a coefficient A of the T term which was linear with be. For K—l% Rb, A = 2.2 x 12 10' Q-cm/Kz. 13 1.2.2. Thermopower About twenty years ago, MacDonald et al.(21’22’23) at the National Research Council of Canada performed ex- cellent work on the thermo-electricity of the alkali-metals at very low temperatures. They measured the thermal e.m.f. E of encapsulated specimens down to about 0.1K using a de- magnetized salt as the cooling agent. For pure K, their deduced thermopower S = dE/dT could be fitted, below 3K, to the form it S = AT + BT3 + Ce" The exponential term was attributed to electron-phonon umklapp processes with 6* = 21K. The detailed form of the coefficient 0 could be temperature dependent(22), but that was unimportant because the exponential was the dominant factor. The term BT3 was attributed to normal phonon drag thermopower and the term AT to diffusion thermopower. Be- cause of the difficulties involved in separating the various terms, they were only able to obtain the coefficients A 8 V to be (+ .5 to -1.0) x 10‘ —2- and B to be (-.15 to -.30) x 10.8 3% . Ziman (1959)(24§ and Bailyn (1960)(25) were K both able to explain qualitatively the data of MacDonald et al.(2l) between 2 and 20K by considering the contribu- tions from electron-phonon normal and umklapp processes. However Ziman required a significant Fermi surface 14 distortion in his theory and the normal and umklapp phonon drag effects were not separable, i.e., simply additive. The Fermi surface distortion requirement was not supported by subsequent experiments(7). On the other hand, Bailyn did not consider any Fermi surface distortion, but the normal and umklapp processes were assumed to be additive. Bailyn's treatment was the basis of the analysis using Equation (1-18). Guénault and MacDonald (196l)(23) later measured the thermopower of alkali-alkali alloys below 3K. The quenched phonon drag Sph was fitted to (2) _ l (1) 2 (l) where 6/T - S(l) = B(‘§')3 f X e 2 f(X)dX, 0 (l-e'x) = E%; 6 is the Debye temperature of the lattice; f(x) is the fraction of phonon-electron scattering among all phonon scattering: l5 ¢L,T’ 8L,T denote the parameters for the longitudinal and transverse polarizations of phonons. The diffusion thermo- power was anomolously positive<23). Thornton et a1 (1968)(26) explained the thermopowers of alkali-alkali alloys using a phase shift analysis and found fair agreement with these data, including the correct sign for the diffusion thermo- power. No extensive measurements of S for the alkali—metals and alkali-alkali alloys have been made since. 1.3. Present Thesis 1.3.1. Electrical Resistivity The electrical resistivity in metals attributed to electron-electron scattering is predicted to have a T2 temperature dependence. Such a term has been observed at low temperatures in transition metals, e.g., Pt<27). Law- (3) rence and Wilkins predicted such an e—e scattering T2 term to be observable below 2K for potassium. However, experimental results below 1.5K by various groups showed discrepancies with this theory, as described above in Sec- tion 1.2.1. The difficulties in previous experiments in determining the power of T in the temperature dependent part of the resistivity were primarily due to their limited temperature range (that is, they were not able to make measurements to low enough temperatures to definitely establish the temperature dependence); as well as to l6 insufficient precision at very low temperatures. In order to resolve these apparent discrepancies we began to ex- tend resistivity measurements of K to lower temperatures (about 70 mK) using a dilution refrigerator and a high precision resistance bridge with 0.1 ppm precision and 15 sensitivity better than 10- volts (see Section 2.1 and 2.2). This high precision is essential for measurements below 1K because the temperature dependent part of the 4 of the residual resistivity resistivity is only 10‘5 to 10' of K (in the dirty limit). A precision of 10‘7 of the resis- tivity enables one to measure changes in resistivity below 1 K to about 1%. Two samples with different diameters were measured as a first order check to see if our data were size dependent. (From the Blatt-Satz theory(28) , size effects could produce a resistivity approximately proportional to T2.) In order to determine whether the various behaviors of the resistivity below 1.5K described in Section 1.2.1 could be caused by the residual impurities in the metal, we put Rb as a controlled impurity into the potassium. Rb was chosen because its atomic size is close to that of K, and because, since Rb has the same valence as K, its presence does not deform the Fermi surface significantly. The change in the lattice parameter of K-Rb with increasing solute concentra- tion is estimated to be 0.09%/at %.(29) Also, if the Koshino- Taylor T2 term becomes dominant over other temperature l7 dependent terms in sufficiently concentrated alloys, we should be able to determine it directly with our precision. 1.3.2. Thermoelectric Ratio G No extensive low temperature thermopower measurements below 1K have been made on K and K-Rb alloys since the NRC group. Since with our dilution refrigerator, we could reach temperatures down to about 70 mK, and since G, which gives essentially the same information as S in the elastic scatter— ing regime, could be measured accurately with the available SOUID null detector, we made a careful study of G on free hanging K and dilute K-Rb alloys in an attempt to determine the diffusion, normal phonon drag and umklapp phonon drag terms. The G measurements were made during the same run as the resistivity measurements. This allowed us to analyze the two properties on the same specimen. II. EXPERIMENTAL TECHNIQUES In this chapter, a brief review of the basic principle of the dilution refrigerator is first given, and the opera- tion of the refrigerator with our locally built gas handling system is described. Then the high precision resistance bridge with commercial dc current comparator and SQUID null-detector is described. The basic principle of the SQUID is briefly reviewed. A description of the measure- ment methods for the resistivity and thermoelectric ratio, as well as the thermometry calibration are then given. Finally, the sample preparation techniques are discussed and error analysis outlined. 2.1. Dilution Refrigerator To obtain temperatures significantly below 0.3 K continuously for low temperature research work, the only practical device is the 3He/uHe dilution refrigerator.(30) The principle of dilution refrigeration was first suggested by London in 1951(31) and by London, Clarke and Mendoza (1962).(32) The first prototype of this type of dilution refrigerator was built by Das, De Bruyn Ouboter and Taconis in 1965.(33) It reached 0.22 K. Rapid development 18 19 followed shortly after that. The most modern, well de- signed dilution refrigerator is capable of maintaining a (34) temperature of 2.0 mK continuously. An elementary one today can easily reach 70 mK. A dilution refrigerator system with commercial cryostat insert was built locally for our experiments. 3He/uHe dilution refrigeration is based on the finding of a finite solubility of 3He in liquid “He even at abso- lute zero temperature. The phase diagram of 3He/uHe mixture (Figure 2-1) shows that below about 0.86 K, phase separation of the two liquids takes place. The phase which is rich in 3He (the concentrated phase) will float on top of the other which is rich in “He (the dilute phase). Below 0.86 K, the left branch of the phase diagram curve represents the dilute phase, which shows a solubility of 3He in ”He of 0.064 at T = 0°K. The right branch of the curve represents the concentrated phase. Below 0.1 K, X0 = 1 (0.99997 actually), $43,, the concentrated phase is made of practically pure 3He, while the dilute phase con- tains at least 6.4% of 3He in “He. The finite solubility of 3He in liquid ”He at T = 0°K can be understood by the 3He quasiparticle concept. Liquid 4 He, having zero nuclear spin, superfluid properties, and obeying Bose-Einstein statistics, is effectively in its quantum mechanical ground state below T = 0.5 K. Whereas the lighter 3He with nuclear spin of 1/2, obeys Fermi—Dirac statistics. The concentrated 20 I l l I r l I I I l I f O - de Bruyn Oubo/er er a/ D - Edwards a! a/ 5 L5 _ A ' Brewer and Keyston - x'0”‘ — o F b— O 5 —- ._. PHASE SEPARA T/ON bl REG/0N O I o , u 1 I I I 02 09 X 0.6 08 - l.O Figure 2-1. Phase Diagram of 3He-uHe solutions. (After Radebaugh, NBS Technical Note 362, 1967). 2O Ill . I N l I I T l I l T T I fl ._ O O - de Bruyn Oubo/er er a/ . D - Edwards :9! a/ I I6 — A ‘ Brewer and Keyston -* ll Line I— .4 O -— -1 O o O r5 _ . ° . e . T i . _ O >— . O —4 O 5 ’— e ._ PHASE SEPARA 770M ’ . REG/0N . ~ _ . _ ... I I O i 1 ' l ' ' ' l ' ' ' l 1 ' l l . ' . O 2 O 4 X 0.6 O 8 - IO Figure 2-1. Phase Diagram of 3He-uHe solutions. (After Radebaugh, NBS Technical Note 362, 1967). 21 phase, which at low temperatures is practically pure 3He, can be thought of as Fermi liquid. 3He atoms, which are bound more strongly to liquid “He than to liquid 3He, dissolve across the phase boundary into superfluid “He. 4 4 3He atoms interact with He atoms to form a 3He- He quasi- particle gas with an effective mass m*. The superfluid “He, in its inert ground state, provides a background 'vacuum'. We can thus think of the dilution process as analogous to an ordinary evaporation process: 3He atoms evaporate from the Fermi liquid and form a quasiparticle gas supported by the inert “He background, which is at a pressure equal to “He. The thermal properties the osmotic pressure of 3He in of the quasiparticle gas can be calculated from the proper- ties of an ideal Fermi-Dirac gas. The cooling of the dilu- tion refrigerator comes from continuously removing 3He atoms from the dilute phase; thus 3He atoms continuously 'evaporate' across the phase boundary to keep the concen- tration of 3He in the dilute phase in equilibrium. In a dilution refrigerator, the removed 3He atoms are recircu- lated through a mechanical pump at room temperature, re- condensed and returned through heat exchangers back to the concentrated side to keep the cooling process going continuously The principal parts of a dilution refrigerator are schematically shown in Figure 2-2. The phase separation occurs in the mixing chamber. 3He atoms in the dilute Figure 2-2. ft) h) — - o o a a no u, f... ..‘.ee~ 0.0... :‘e' .“ C I ' g' 0" '0'... O fi‘- -- -- - --- 12 IO The principal parts of a conventional dilution refrigerator: 1. Condenser, 2. Main im- pedance, 3. Still, 4. Still heat exchanger, 5. Discrete heat exchangers, 6. Phase” boundary, 7. Mixing Chamber, 8. 1.3 K pot, 9. Orifice, 10. Dilute phase, 11. 11. Continuous heat exchanger, 12. Concen- trated phase. He 23 solution, driven by the osmotic pressure, go through the heat exchangers, reach the still and are pumped away by a mechanical pump. The 3He gas is recirculated through the pump. Incoming 3He is first precooled to 4.2 K and liqui- -fied in the condenser which is attached to a pumped “He (1.3 K) pot. Condensation is possible because of the flow impedance below the condenser. The liquid then enters the still exchanger at 0.7 K and passes into the heat ex- changers, cooled by the dilute solution, and reaches the mixing chamber again. “He in the circulating gas is sup- pressed by the specially designed still in which superfluid “He film flow is reduced. The circulation rate is con— trolled by heating the still. The efficiency and per— formance of adilution refrigerator depend critically on the design of the heat exchangers. The cooling power of the dilution process can be understood from the enthalpy considerations in the mixing (35) For the concentrated phase, the entropy and chamber. enthalpy are T C3 J s = f —)dT = 25 T — mol , (2-1) c T 2 0 K . T 2 J H = f c dT = 12.5 T — mol , (2—2) = 25 T (3— mol below 140 mK). with C 3 K2 24 In the dilute phase, CD = 107 T J/(K2 mol), and the entropy SD = A? DC/T dT = 107 T JK-2 mol-l. The chemical potential “c (concentrated phase) and “D (dilute phase) of 3He in both phases in the mixing chamber under equilibrium are equal. Since the chemical potential per mole u = H-TS, we have Thus HD = He + T(SD-Sc) = 94.5 T2 JK-2m01-l (2-3) The cooling rate at the mixing chamber is n3EHD(Tm) - Hc3 <2-u> where Tm is the mixing chamber temperature, and n3 is the 3He circulation rate in moles/sec. External heating is from the heat leak Q and the incoming 3He which is at temperature Tn' At equilibrium, 6 + n3tHcl = n3EHD(Tm)-HC(Tm)]- <2-5) Putting in values of HC and Hd, the cooling power 0 is given by 25 [94.5 Tm2-12.5 Tn2] JK‘2 mol’l . (2-6) ,0. ll n3 H Hi 38° II o v a II 0.36 Tn' For a perfect exchanger, T = T Tm = Q/(82 113). This is the lowest temperature the mixing chamber can reach for a given heat load and circulation rate n3 with an ideal heat exchanger. The most efficient type of heat exchanger is the con- tinuous counter—flow heat exchanger. For such a heat ex- changer, one can show that the mixing chamber temperature is given by(3“) Tm2 = 6.4 ka 53/6 + 6/(82 n3) , (2-7) where ka is the Kapitza thermal boundary resistivity defined as ka = AT/Q 0T3, in m2K“/watt, n3 in mol/sec, o is the 2 exchanger surface area in m and Q in watts. One sees that the larger the exchanger surface, the lower the Tm. The optimal circulation rate n t can be determined from 30p the condition dTm/dn3 = 0. In our system, the dilution refrigeration unit was built locally by Dr. Pratt, using a continuous counter flow tubular heat exchanger and a commercially built cryostat 26 insert unit (SHE 40/4000). This dilution refrigerator is capable of reaching 60 mK. The gas handling system was built locally. The cryostat is mounted on a vibration isolation air mount (NeWport Research), the top of which is filled with sand for additional weight and damping. The pumping lines are all vibration isolated through flex- ible metal bellows. For the large diameter pumping lines (the still line and the l K pot line), special bellow as- semblies are used. The assembly consists of two (1-1/2") 1/2" flexible stainless steel bellows and a 2-1/2" diameter stainless steel bellow. They are arranged as shown in Figure 2-3. The two 1-1/2" bellows, counter act each other's contraction forces and provide isolation to vibra- tions perpendicular to the bellows. The third bellow (stiffer) provides isolation to vibrations along the two smaller bellows. Thus vibrations along all directions are damped. A diagram of the gas handling system is given in Figure 2-4. The sealed pump for 3He circulation is an Edwards ED660 rotary pump. It provides sufficient pumping speed for the present system to reach 60 mK. However, a booster pump is installed in case greater pumping speed should be needed in the future. The gas handling system is built on a rack anchored to the floor. The top of the rack is sand filled to damp out vibrations from the pumps. The whole system is enclosed in a screened room with the pumps outside. The pumping lines from the pumps to the gas 27 .COfiumHomH soapmpnfi> pom mHnEommm zoaamm .mlm opswfim \ \ _ «25:2. \ . e338: N :— a 26:2. m in 28 men, _. e: .:::a T... .Eopmzm mafiapcmc mam nonmpowflpmop COszHHp map mo Empwmfip oHmeocom .233: .zlm ogzwfim 29 handling system are connected through bellows and enter the screened room with non-conducting portions through appropri- ately long metal pipes. The screened room is important in screening out radio frequency noise that affects the opera— tion of the SQUID. In a normal experimental run, the sample can is first mounted and all electrical connections are checked. The outer vacuum can is then put on (indium O-ring is used for the seal) and leak tested. After closing the cryostat, the refrigerator is flushed with the 3He/“He mixture. The continuity of the main flow impedance is then checked by letting in mixture to the condenser side and noting the rate of pressure rise in the still, indicated by the thermocouple gauge, after the still is pumped out with the sealed pump. The 1 K pot is flushed out with “He and the “He inlet capillary continuity is similarly checked. The 1 K pot is “He afterwards. The left with a slight overpressure of system is then precooled to liquid nitrogen temperature with appropriate exchange gases in each part. The same continuity test procedure is repeated at LN2 temperature to get ready for the liquid helium transfer. After the helium transfer, all the thermometers and heaters are checked and the SQUID electronics set up. To operate the refrigerator, the mixture is first precleaned through a liquid nitrogen cooled molecular-sieve cold trap, and the l K pot is pumped to 1.3 K. All the mixture in the storage 30 tank is then evacuated into the refrigerator. Circulation is started by first using the circulation helium pump main valve throttle to keep the condensing pressure close to about -2" Hg. A safety valve connected to the storage tank is switched on to ensure that the pump output pressure is less than 1 atm so as to protect the sealed pump, which is not designed to work above 1 atm, otherwise precious 3He gas might leak out of the system. The mixing chamber cools as the condensing process proceeds. After all the mixture is condensed and the mixing chamber temperature is around 0.8 K, the still body and still orifice heaters are turned on. The mixing chamber then cools down rapidly to its lowest temperature. Measurements can be made during the cool down by regulating the M.C. temperature at the desired value. 2.2. High Precision (0.1 ppm) Resistance Bridge The resistance bridge used in our measurement system- consists of a commercial direct current comparator and a very sensitive SQUID null-detector. The basic principle of the operation of the SQUID and its limitations are reviewed and then the complete resistance bridge is des- cribed. 31 2.2.1. SQUID (Superconducting Quantum Interference Device) The SQUID is an important device in our high precision measurement. It is used as a null-detector in our system. It provides the sensitivity high enough to measure voltages below 10’15 volts, limited only by the thermal Johnson noise in the source resistance. The basic working principle of the SQUID is based on the Josephson effects. A description of how the SQUID works is given in Appendix A. In our system, a symmetric point contact r.f. biased SQUID, first developed by Zimmer- man 33 a1. (1970),(36) is used. The SQUID probe used is a SHE Model RMPC with SHE Model 330 electronics. The sym- metric SQUID Magnetometer is used as a null detector by con- necting a current source to the signal coil. The SQUID out- put voltage is then proportional to the current through the signal coil. The mean square current noise can be expressed as 2 4kTeAf (Jne> = T ’ (2'83) e where T8 is the SQUID temperature (usually 4.2 K), Af the bandwidth and Re the equivalent noise resistance. For a typical SQUID magnetometer, Re a 12 m0. The thermal noise (Johnson-Nyquist noise) of the source resistance RX 32 is 4kTXAf <3ix> = “‘l?“' , (2-8b) X where Tx is the temperature of the source resistance. So the total mean square current noise 2 _ 2 2 + R T + R T = 4kAf e x X 9 (2-80) ReRx or the mean square noise voltage R R R R (R T +R T ) = < e x )2 = 4kAf 6‘ X e x 2" 9 (2-9) Re+Rx (Re+Rx) The minimum detectable voltage VU:(min) = 1/2 A plot of"VU§(min) vs. R is shown in Figure (2-5). One x sees that for TX < l K, Rx << Re, voltage sensitivity of 10-15 V is possible and for most cases limited only by the Johnson noise of the source resistance. The SQUID null detector is much superior in sensitivity to other devices such as superconducting chopper amplifiers, etc., and together with the current comparator, providesggxxienough 33 (Unz- (manl) (V) l 3 10‘ 3 10' Figure 2—5. The rms value of the minimum detectable voltage as a function of Rx for four dif- ferent values of Tx’ assuming that Af = 1 Hz, Te = 4.2 K, and R6 = 12 m0. The limiting 2 1/2 2 1/2 behavior, = [“kAfTeRx/Re] is shown by the dashed line. (After Lounas- )(30) 1118.3. 34 precision for our measurements which would be impossible to do with lesser techniques. 2.2.2. Current Comparator Resistance Bridge A commercial dc current comparator which provides cur- rent ratio resolution of 0.1 ppm is used with the SQUID null detector in a 4-terminal resistance bridge. The cur- rent comparator is based on the design of MacMartin and Kuster (1966).(37) The main components of this comparator are two ratio windings which carry the currents to be com- pared, and a double toroidal core magnetic modulator which is completely shielded by a magnetic shield. The ratio windingseuwacoupled to the modulator. The magnetic modu- lator senses the flux imbalance in the magnetic core caused by the imbalance of current ratio in the ratio windings. If the output of the modulator is fed back to one of the current windings (slave current) to keep the flux zero, then the ratio of the two currents would be given by the turns ratio of the two windings. With a variable turns ratio, we can get currents of various ratios. The cur- rent comparator used in our system is a commercial model from Guildline Instruments Ltd. It is modified for semi- automatic operation with operating electronics built by Edmunds e: al.(38) A block diagram of the resistance bridge is shown in Figure 2-6. It provides precision of 0.1 ppm with currents from 10 to 100 mA when the current 35 7va 4m Mm .nossEom pooh: ma mafinfiz on» Ham can zoaon no m: up one mucoOQEoo map .mCHHpso paon a .owpfihn mocmpmfimmp mo Emnwwfip xooan pofiMfiHQEHm cpfiz seamen map mcfimaH .wCHpospcoopoQSm F—_—'l Aw ._ _ 55: 9:2... 5.5a . >32. . m . umoo :33 «0.25323 hzwceau o; 5:33 , muaaaoo acufido «65.23 348:6 .x #9»: . . _ 2350 3.39... g _ . 338 :35". ~33...“ use Enema _ .quecau 5.5;. 9:. or 526.. u>3m zowwwwuo . $542 2. 526a _ . . a . . N . " copuupuo 3.: use onmwum.» I. 93 o... 532. to o. H.338 23 5438 5&8 33:8 :m n. 43:36 5&3. 526a 526.. “23..” 5.552 _ fl _ 7 5qu 3.5.53 Haywoou cause .65on 44:05 3.5:: .. c - _ ._ » o> n. uxe or 530.. » 3 c: .mlm omswfim 36 ratio is close to one. The precision decreases with larger or smaller ratios. The detailscfi‘this resistance bridge are published elsewhere. (38) The resistance bridge and the dilution refrigerator system are all enclosed in a commercial screened room (Erik A. Lingren and Associates, Inc.). The screened room shields out rf interference that would unlock the SQUID. The walls are made of two sheets of metal, an outer galvanized steel sheet and an inner copper sheet. The galvanized steel sheet reduces lev frequency' electromagnetic fields and the copper sheet reduces high frequency fields. The power lines into the screened room are fed through r,f,I, filters to eliminate interference that could be carried by the power lines. Batteries are used in the power supplies to the master and slave circuits as well as for the logic cir- cuits. This eliminates the annoying problem of ground loops and A.C. line interference. With the screened room, we can operate the SQUID with optimal low noise. The reduction of rf interference also reduces the problem of rf induced self heating in our resistance thermometers, which would otherwise require complicated filters. 2.3. Measurement Methods 2.3.1. Resistivity In the conventional u-terminal resistance bridge, a reference resistor kept at constant temperature, usually 37 h.2 K, is used. In order to get optimal precision, the noise caused by this reference resistor must not be worse than that of the specimen. The factors that affect the accuracy and the precision of a measurement due to the reference resistor are: Johnson noise, thermoelectric voltage noise due to temperature fluctuations, temperature dependence and current dependence of the resistor, as well as long term stability. A good reference resistor with low thermopower, low temperature dependence, low current dependence and stable resistance upon thermal cycling is difficult to make.(39) Also, in order to make full use of the precision of the current comparator, the resistance of this reference resistor must be close to that of the speci- men; thus different reference resistors are required for dif- ferent specimen resistances. The Johnson noise (/FkTfiKf7 of such a reference resistor kept at “.2 K would be much larger than that of the specimen (of similar resistance) at low temperature (pso coapmsnfiamo .mlm mpzwfim 2.02:. 0000— 000— 00— O— 1 — d a . q . . . no. . . . . .. —.O I. e e x . . . m6 1 — .. .. m “7 (1“) In order to avoid straining the sample, in a dry box. or adding oil contamination, we prepare our samples in free hanging form inside a dry box. A special sample can was designed to allow us to mount two nearly identical samples for making resistivity measurements with the temperature modulation technique and also for G measurements in the same run. The standard sample preparation procedure is as follows. The twin samples are prepared inside the dry box under clean argon atmosphere (see below) and mounted on the sample holder. The can is then sealed and transported out of the dry box to be tested before mounting on the dilution re- frigerator. A sketch of the sample can is shown in Figure 2-9. Two pure silver wires are used as thermal links to the sample. They are spotwelded onto OFHC copper pieces which are secured onto nylon blocks with screws. Each silver wire is fed through a 1/8" stainless steel tube on the top flange with teflon spaghetti tube as insulation. Eight electrical leads come from each stainless steel tube. The tubes are sealed with Stycast GT2850 epoxy. All electrical leads are superconducting wires (%“ mil) with either copper cladding or CuNi cladding. Eight leads are used as current and potential leads to the two samples. Two others go to each of the G heaters at the end of each sample. The current and potential leads are soldered onto OFHC copper pieces. (For leads with copper cladding, “8 .mpmmH wCHposo Icoommasm .ma .pmdooo on pupae; oHoo Esfimmmpom .HH .memmn 0 .OH .mmHaEMm Edfimmmpom .m .mmomHQ pmdqoo ammo .m .QAOQQSm coamz .5 .mnzu Hompm mmmacfimpm =w\H .m .wwcmam mmmpm .m .mpmmH Hmfiucmpoa one unmmpso .= .xcfia awaken» w< .m .mcmoH Havappooam Ampmmn c .m .Lmnemno mcfixfie on psmenomppm mom Ham: hwdaoo .H “hopaon mHQEmm Edfimmmpom .mum mpswfim “9 about 1 cm of the cladding is etched away before attaching to the copper pieces, so as to obtain better thermal isola— tion). The copper pieces for the potential leads are secured onto 1/8" threaded nylon rods with GE703l varnish. The copper pieces for current leads are secured onto the nylon blocks by screws. The G heaters (Dale l/“ watt wire- wound resistors) are inserted into a hole in the copper block and secured with GE7031 varnish. The top of the sample holder has a 1/2" diameter well with slots cut to allow a snug fit onto the mating post at the mixing chamber of the dilution refrigerator. A nylon collar is used to squeeze this assembly tight at low temperature. An indium O-ring (0.0“5") is used to seal the sample can. The dry box gas handling system is sketched in Figure 2-10. Argon gas from the tank is passed first through an oxygen reduction catalyst (BASF R3-ll)(u2) and then through a moisture trap filled with SA molecular-sieve. A pressure sensor senses the difference between the pressures inside and outside the dry box. When the pressure of argon inside drops to less than l/2" H 0 above the outside atmosphere, 2 a solenoid valve switches on, admitting more gas to keep the pressure inside at about l/2" H20 above atmosphere. This way air leakage into the dry box is minimized. Ac- cessories can be transported in and out through the access port without contaminating the clean atmosphere. The catalyst used in the purifying system can be reduced and 50 .Eopmzm wcfiaocmn mow xon mam .oalm mhsmfim 33::— cot—v.33... .m>_ U.— 00 F? n. 23 E at: (m :8 2.35 3 é“ fi “@III to: «385 3 88/1 e Rryuul. £33888 G \ :2. f a were 1 an... .3 S. Q11 ‘ _ cl. efifl e>.flnr..----._w .033 30.8. ebemmoa . AX)“ . oliol. a5...— 3 51 reused again by passing H2 through it at a temperature about 200 °C to remove oxygen. Before making samples, the argon atmosphere in the dry box is further purified by circulating the gas through the catalyst and molecular-sieve purifying system with a rotary gas pump for about two hours, until a test potassium piece can stay bright for about a minute. When the argon atmosphere is in an acceptably clean condition, potassium in a storage vial can be heated up to melt (about 70 °C) and poured into a stainless steel sample press (Figure 2-11). K sample wires are extruded from this press by pressing K out through a screw bolt with a hole in the center. Different diameter wires can be made with bolts having different size holes. The K specimen wire is placed on one side of the holder and cold welded onto the two copper cross pieces to which the current leads are attached. The welding occurs easily if the copper pieces are first fully file cleaned. The potential probes, made of the same potassium wire, are cold welded to the specimen and to the copper pieces to which the potential leads are attached. The separation between the potential probes is about “ m 5 cm. With a sample diameter of 3 mm, the geometric factor % is about 10-2. The reference sample is made in the same way and mounted on the other side of the holder. The sample can is sealed inside the glove box. The argon inside the can solidifies at liquid helium temperatures, so the samples are in vacuum during the stainless steel Figure 2-11. Sample press. 53 measurements. No oil is used in preparing the samples and the samples hang freely except at the two end supports. With this design, we can measure both % %% and G of both samples in the same run. After the samples are mounted, and the sample can sealed, the can is transported out of the dry box. The room temperature resistances of both samples are measured. Using a resistivity of 7.19 uQ—cm at room temperature for K,(1l) one can determine the % of the specimens. The residual resistivities of the specimens are measured by cooling the sample can to “.2 K in liquid helium. The residual resistivity ratios, defined as R(R.T.)/R(“.2K), are then determined. Table 2-1 shows the details of all the samples. Three sets of 3 mm and one set of 1.5 mm samples were made so as to have a first order check of size ef- fects. (The resistive electron mean free path for our pure K samples with p0 = 1.5 nQ-cm is about 0.15 mm.). Our 3 mm diameter sample is the largest diameter, free hanging K sample for which resistivity at low temperature has ever been measured. The resistance of that sample at “ K is 7 about 10' 9. Thus with a measuring current of 50 mA, in order to measure this resistance to 0.1 ppm, one needs 0'16 volts a null detector with ability to resolve 5 x l or better, which the SQUID null detector is capable of. For the 1.5 mm sample, a quenched resistivity (quenched from room temperature to liquid nitrogen temperature) and a slow Table 2—1. Characteristics of the samples. (a) Pure 5“ potasium samples; (b) K-Rb alloys; (c) Samples of Guénault and MacDonald (23) (for comparison). (a) Diameter A Sample p(“.2K)(10'90—cm) (mm) I (cm) RRR K1 1.88 (quenched) 1.5 3.91310‘3 3850 K1 1.50 (slow cooled) 1.5 3.91x10'3 “800 K2 1.73 (quenched) 3 1.61_x10"2 “170 K3 1.70 (slow cooled) 3 1.18310"2 M200 K“ l.““ (slow cooled) 3 1.199(10-2 5000 (b) Sample pfg°2K) diameter A (10—2 cm) Nom. at.% Rb (10 Q-cm) (mm) A RRR 2.2“ 387 3 1.18 18.6 0.83 1u2 3 1.0g 50.5 0.32 56 3 1.18 129 0.13 23.5 3 1.02 30“ 0.05 9.97 3 1.23 720 (0) Sample Diameter Length At.% Rb (mm) (cm) RRR 2.1 0.2 10 26.6 0.9 10 “6.5 0.2 10 157 pure 10 5“0 55 cooled resistivity (2 hours to cool down from room tempera- ture to liquid nitrogen temperature) were measured. The results are given in Table 2-1. Typically, the room tem- perature resistance of a sample increased about 5—10% the first day after it was prepared, and an additional 1 - 7% in two weeks to a few months, as checked before and after measurements in the dilution refrigerator system. This is an indication of how the sample surface deteriorates inside the sample can. Also, a couple of sample cans were reopened after two weeks to a few months and the samples visually checked. Only thin surface corrosion was observed. In the initial check, the contact resistances of the joints are also measured to make sure that the whole SQUID circuit resistance is acceptable and that there is no excessive Joule heating at the current lead junctions. The SQUID circuit resistance measured is typically three times the specimen resistance because the two samples and the potential probes made of the same material are all in the circuit. After all the initial checks, the sample can is mounted onto the cryostat. The set up of the samples on the cryostat is shown in Figure 2-7. The silver thermal links are separately spotwelded to the corresponding Ag—Au alloy links. The link of the reference sample to the mixing chamber is through an electrically isolated assembly. This assembly is made of two l/l6" thick OFHC copper plates of surface area about 5 cm2, separated by cigarette paper and 56 varnished together with GE7031 varnish. Its purpose is to break the ground loop between the two samples." All the upper and lower heaters (Dale RS 1/2 “K0 resistors) are first wrapped with annealed insulated copper wire for thermal contact. The copper wire is soldered to a silver wire which is then spotwelded in place to the Ag-Au alloy. The ther- mometers are mounted inside copper block wells soldered to the silver thermal link. Apiezon N grease is used to get good thermal contact between the thermometers and the copper wells. The K—Rb alloy samples are prepared in the same manner. The potassium and rubidium materials were obtained from Mine Safety Appliances Ltd. (MSA). The lattice constants and other relevant parameters of the alkali metals are given in Table 2-2. The K-Rb alloys were made by first mixing one gram of Rb with 20 grams of K to get a nominal 2.2“ at % master alloy. More dilute alloys were made by suc- cessively diluting approximately 2 portions of pure K with 1 portion of the starting alloy to obtain an alloy of con- centration about 1/3 of the starting alloy. A total of 5 different concentrations of K-Rb samples were made. The sample details are given in Table 2-1. The residual resistivity of the nominal 2.2“ at % master alloy was mea- sured to determine the resistivity per at % of Rb which was 0.172 uQ-cm/at %. The concentrations of other alloys were determined using this value in conjunction with their 57 Table 2-2. Parameters of the alkali metals (after Ziman (1)). Li Na K Rb Cs Lattice const.(K at 90K) 3.“7 “.23 5.20 5.62 6.05 Atomic radius (3) 1.71 2.08 2.56 2.77 2.98 6D (K) “00 150 100 52 5“ Fermi energy 8F, for free electrons (eV) “.76 3.20 2.12 1.81 1.57 58 residual resitivities due to the impurities. Our RRR and concentration values are roughly consistent with those of (23) The homogeneity of the master alloy Guénault gt 31. (2.2“%) was checked during the G measurements of the two 2.2“ at % samples in the same sample can. Both samples gave G values the same to within a few %. 2.5. Error Analysis 2.5.1. Temperature Determination Our temperature determination was based on the calibra- tion of thermometer Th2 (GR-200A-30 Germanium resistance thermometer, referring to Figure 2-7) as described in Sec- tion 2.3. The calibration of the thermometers was later checked against NBS superconductive fixed point devices 1(k) 0 Mi . . _ .. a; rk = fk — Te—Hkh - [ELTH-vrrnefi - gm . <3-13) The current density is then + + + J = fe v fk dk _ _l_ * EA _ _ “"3 ff e v fk hv d8 (3 1“) 1 + afo If e v {- jfi§&(i)$ - [5%E(-VT)+e(E - %§)J%é}de, where the integral fdA is over constant energy surface 8. Likewise, the heat current density 0 v -+ _ . Q = 13 fr(e-u)§r’{- 3—51('12)'6-[-€—.f“—(-$T)+e - 1? K1161 - ' '— "' —— : Iv": 3:0 T 2 Y0 and the thermopower tensor 4+ E 1 we 1 S E {FM = 57f (KlKO ) ’ and the thermoelectric ratio tensor 3 4+ 1 f1? At low temperatures, K2 >> , so the ratio K O This is the Wiedemann-Franz law. In the case when scattering predominates and for a metal with cubic (3-20) (3-21) (3-22) (3-23) elastic symmetry 75 such that the tensors reduce to scalars. 2 2 L = L = E—-E-= 2.U5 x 10-8 V2K-2 O 3 2 e «4+ Kn can be evaluated as ++ _ aro Kr1 - f (€) (— '57:)“ 2 2 (e) _ w 2 3 ¢n Be e-u where + + + me) = 1 f mm V(e-u)n 5% Hw3h The integral is over constant energy surface s. ., (3-2Ua) (3-2UD) 76 3.2. Resistivity_p For a metal with cubic symmetry, the conductivity tensor reduces to a scalar, (3-25) e2 I ' 2 = __§_. Fermi T(k)V dA + 0(kT) . Aw h surface + A(k), the mean free + Thus one needs to determine 1(k)v path. In the nearly free electron model, 0 is simplified to 621' (3-26) with (3-27) neff 3 T can be determined from 77 k k k' - —) = _, = f(g "g v)Q dk' : (3'283) 3 scatt 1(k) k k k i.e., 1 gk' k' + = f(1 - -—-)Qk dk' . (3-28b) T(k) gk In the case of a spherical Fermi surface and elastic scatter- ing, Fill-J = fQ(e)(1 - cose)dA, (3-28c) where 6 is the angle between E and k', Q(e) = QE' is a func- tion of a only and the integral is over the Fermi surface. In general, one cannot solve the Boltzmann equation exactly, so the variational method, first used tnr Kohler and Sondheimer, is used. In the variational principle, the Boltzmann equation is expressed in the form X = P¢, where 78 - 1 Pk' dk' P¢k - ET- f(¢k’¢kt) k and ”11+ .5... + + 6.. X = - -a—€-V ° ['TIT—(‘VT) + 8(E - ?)J The solution ¢ is the trial function that gives a minimum value of <¢,P¢> 2 , {} where <¢,X> E f ¢kadk . Applying this method to resistivity, one finds(l) l 2 k' v EFT- ff(¢k-¢k') Pk dk dk o ark 2 I fev¢n 3;— dkl (3-29) of. Nearly all the calculations discussed below were based on this equation. 79 3.2.1. Resistivity Due to Electron-Phonon Scattering For electron-phonon scattering, assuming that the phonons are in thermal equilibrium and considering normal processes (1) only, it can be shown that T 5 6D where e n Jn = f D z 2 dz -2 C) (e -l)(1-e ) and GD is the Debye temperature. At high temperatures, 6 D N T T >> 6D, J5 m (17) , so pph a 5—. At low temperatures, D T << 9D, J5 is a constant, so pph « (6%)5. This is the T5 law from Block theory. In the above discussion, only e - ph normal processes were considered. The Umklapp processes are different from the normal processes in that there is a reciprocal lattice vector in the momentum conservation wave vector equation E' — E = a + E . (3-30) The normal processes correspond to 3 = 0. Schematic 80 drawings of the electron-phonon U- and N-processes are shown in Figure 3-1. For a U-process to take place in a metal with a spherical Fermi surface that is completely inside the first Brillouin zone and not touching the zone boundary, one must have phonon momentum with wave.vector at least amin' The probability of a phonon with a wave vector + (-hwamin/kT) qmin is proportional to e ‘ . Ziman predicted for the U-processes a contribution to the resistivity of the (1) form U a e-fiwqmin/kT = e-6*/T pe-ph ' This contribution, however, should decrease much more rapidly at low temperatures than the contribution from the N—pro- cesses which have no 3min requirement. When the phonons are not in equilibrium, there is phonon drag. It will be shown in Section 3.5.1 that for K, the phonon drag effect largely cancels out the normal T5 term, leaving a dominant Umklapp term. 3.2.2. Resistivity due to Electron-Electron Scattering For electron-electron Coulomb scattering in a simple metal, assuming an isotropic relaxation time, the N-processes Fermi __ surface Bri Ilouin zone H. a, Normal processes k, -k=q b, Umklapp processes k'— k = q + G Schematic diagrams of the electron—phonon normal and umklapp processes for spherical Fermi surfaces that do not touch the lst Brillouin zone boundary. VINUI'G 3"]... 82 do not contribute to any resistance and the U-processes (1) can be shown to produce a resistivity a kT 2 pe-e (a) This T2 term is expected to dominate at sufficiently low temperatures, since the phonon terms decrease much more rapidly with decreasing temperature.1\similar T2 term can be obtained for transition metals. In the presence of electron-impurity scattering, which is isotropic, pe_e is not affected. Therefore, the coefficient of the e-e scattering T2 term is expected to be, to first order, independent of the residual resistivity p0. In the case of an anisotropic relaxation time, such as in the presence of anisotropic electron-dislocation scattering, e-e scatter- ing N-processes could produce a resistivity that is sample dependent and proportional to T2.(17) Also when there is electron charge modulation, a lower power law could be possible.(l5) More details are given in Section 3.5.2. 3.2.3. Resistivity Due to Electron—Impurity Scattering For elastic scattering of electrons by impurities one gets a temperature independent residual resistivity be. In (18) (19) the case of inelastic scattering, Koshino, also Taylor 83 2 showed that at low temperatures, a small T term linear with 00 could be produced. More details are given in Section 3.6. In the presence of multiple independent scattering mech- anisms that can be characterized by relaxation times, T1, the resistivity can be expressed in the form 3.3. Thermopower S 3.3.1. Diffusion Thermopower For diffusion thermopower, we have s = 511.1%. (3-31) By substituting in 2 (12 KO = ¢(u) + 16- (RT)2[d-;_§¢(€)]e=u , K1 = 362- (kT)2[-932- ¢(€)] de e=u 814 (145) and keeping only lowest order terms, one gets 2 2 S = ;?_keT{d£nfife)} = eLOT{d£n§fe)} , (3_32) €=u e=u where w2k2 L0 = 2 3e This is the famous diffusion thermopower equation, first derived by Mott.(u5) In the case of an isotropic relaxation time T, 2 e 2 2 o = ——-— '* e TVA e 3 ft(k)vdA = = ————— AA . (3-33) I” 1" 121311 1231*. So 1 3A 1 31 Thus Sd is sensitive to the energy dependence of the Fermi surface and to that of the mean free path at the Fermi sur- face. Ziman called S the most sensitive electronic transport 85 (1) property. Depending upon the structure of the Fermi surface, %2 and gg are usually positive. For a spherical Fermi surface, we thus expect to have a negative diffusion thermopower and as T + O, = -|eILO egg: <3-35) -l/2 where g = 1 for T a E and g = 3 for r a E3/2. In general, with an anisotropic 1, one has to evaluate e2 Uw3fi 0(8) = Q: T(k)vdA and apply Mott's formula (Equation 3-32) to get Sd' 3.3.2. Phonon Drag The above discussion is under the assumption that the phonons are in thermal equilibrium. This is the case at high temperatures when the phonon-phonon interaction is dominant or when strong interactions between phonons and impurities or dislocations, etc., exist. However, at lower temperatures when phonons are not in equilibrium, phonon- electron scattering would drag electrons along with the 86 phonon flow; thus extra thermopower is created. We now have to solve for the phonon distribution function n from Boltzmann's equation 6 3mg) -V o n = _ — r q 3t scatt In the relaxation approximation, one can define for phonon- phonon, phonon-impurity, phonon-boundary scatterings, etc., relaxation times Tp,p’ Tp,I, Tp,b, etc., such that an n -n0 in?) = — ?§——3 , etc. p,p 9,9 We denote T as the relaxation time for scattering be- pax tween phonons and all particles except electrons, T T T T p,x pap p’I pgb + ... . (3-36) The thermopower due to phonon drag SP). for N—processes only should then be(5) 87 P S C p’e a ijx + + g Pp.x Pp.e Tp.x Tp.e -l > 6 a T For T D’ Tp,p eD/2T T < 6D, Tp,p « e At very low temperatures in a sufficiently pure sample the boundary scattering T will dominate. At low tempera- p.b tures, Tpix, + 1 ’ T << 6D, Tp’e << Tp,x, Tp,x+Tp’e then Sg can be expressed as C T ' C v p x v s = - ’ = - . (3-37a) N + N 8 3 leTTp,x Tp,e 3 IeI where Cv is the heat capacity. 6 /T U x T‘ 3 D x e c = 9 N k (-—> f ——————— dx (3-37b) v o 9D <3 (ex-1)2 88 The Debye integral goes to a constant at T << 0D. So Sg is proportional to T3 at low temperatures and negative. The phonon drag thermopower in K due to U-processes is _ * expected to be of the form e 0 /T as suggested by Bailyn(25) (22) and by MacDonald (1960). For a spherical Fermi sur- face, this contribution is positive as can be seen from Figure 3.1. The change in electron momentum Ak in the U- processes is approximately opposite to the phonon momentum 6, thus electrons are moving in the opposite direction to the phonon flux, causing a positive Sg. Similarly, for N-processes, the change in electron momentum is parallel to 3, thus giving a negative S By employing a variational g' method, Ziman, as well as Bailyn, derived a simple rule for a complex Fermi surface involving both U- and N-processes: If the chord q passes through occupied region, the contribu- tion to SE is negative, if it passes through an unoccupied region, the contribution is positive. 3.3.3. Impurity For allo s . y , Tp,e is no longer much less than Tp,x The contribution to SE due to N—processes must be modified with the factor 89 With the Debye approximation for the phonon frequency dis— persion, it is shown that(5 ) u -x s = 3 5 (1)3 reD/T '13:“? WW g e 6D (3 (l-e ) T where f(x) = T pi: 19.1 13.6 For alloys, the diffusion thermopower SD is affected by different scattering processes of different relaxation times Ti. If the resistivity is expressed as m* 1 9: 227:291’ neffe i i i then (3-38a) 90 with —-——) - (3-38b) This is the Nordheim-Gorter rule. 3.“. Thermoelectric Ratio G G was first introduced by Garland and Van Harlingen.(6) From Equation 3-22 1 G = e . K2 Substituting in 2 3 ¢ (8) K1 = 1— (kT)2 [-—-l§—— , Be €=u 2 2 3 o (6) K2 = "— - (-v J > o S V¢=O S 3:0 1 + + = — T(uTVT°J), (3-u0b) the Thomson coefficient. U1 where “T = T %% i 92 AS is then Just that due to Joule heating and AS0 due irr to Thomson heat. Since 2 J__ + -+ + o + SVT . J = 0 when E = 0, and at low temperatures, S 2 AT, so Therefore, the Joule heat is simply absorbed by the Thomson heat, i.e., there is no extra thermoelectric effect in the measurement of G due to the flowing electric current. A11 discussions of S can then be applied to G using the equation For alloys where there are multiple scattering mechan- isms, the diffusion thermoelectric ratio This is analogous to the Nordheim-Gorter rule, but is not restricted to the validity of the Wiedemann-Franz law. 93 Denoting by pa the resistivity due to impurities and by on the resistivity oftflmepure metal, . G = p_p = G + jkL—— (G -G ) . (3-Ul) i = 3; should give a straight 0a Ob 00 the diffusion thermoelectric ratio So a plot of G versus line with intercept Ga, due to the impurities in the metal. 3.5. The Resistivitygof K As described in Section 1.1.1, the resistivity of K above 1.5 K showed an exponential behavior characteristic of electron-phonon Umklapp processes, as reported by various groups with high precision measurements. However, at tem- 2 behaviors inconsistent with simple 1.5 peratures below 1.5 K, T electron-electron scattering theory,as well as a T power law,have been reported. Below, the theories that describe well the exponential behavior are given. Various theoreti— cal models that have been proposed for the resistivity of K below 1.5 K are also reviewed. 9“ 3.5.1. The Resistivity of K Above 1.5 K The exponential behavior in the resistivity of K can be understood by the scattering of electrons by non-equilibrium (“6) phonons involving N- and U-processes. Kaveh and Wiser, (47) (48) Orlov and Frobose calculated the phonon resistivity for K. Orlov(u7) solved the Boltzmann equations for elec- trons and phonos, taken into account both N- and U—pro— cesses, for pure alkali metals. The non—equilibrium nature of the phonons results in a greatly reduced contribution to the resistivity due to N-processes. The resistivity he obtained is pe-ph W C‘—§'yg e , (3-U2) with 0* m 0.2 6D. His result fits well with experimental (12) data of Gugan, of Ekin and Maxfie1d(11) and of van Kempen, gt a1.(13) Van Kempen et 1. fitted their data to the form 0 = p0 + AT2 + BTn e'e/T, and obtained n=1.0 and 6=l9.9i0.2 K. Kaveh and Wiser3/2 e (1 + 22> , <3-uu) e-ph 0 96 with B = 0.98, e = 17.5 K. Since do ——R—e' h = ————“1‘/2 T‘”'5 e‘e/T (1+2.u8 1), d(T5) 59 9 he plotted T14 5 c195 1 d(T ) 1 g(—) = zn ( ) vs - T 1+2.u8 g T and got a good fit to the data of van Kempen gt gl.(l3) In general, the form describes well the resistivity of K down to about 2 K. Kaveh gt al.(u9) later proposed an explanation as to why different parameters n and 6 could give nearly equally good fits. They considered the resistivity in the form pe£_ph(T) = 4: 0(w,T)dm. (3-u5) 97 p(w,T) is the contribution to resistivity from phonons of frequency m. In terms of p(w,T), the mean phonon frequency S(T) is given by $(T) = -—-4: wp(w,T)dw/€fp(w,T)dw 58‘ Q? wp(w,T)dw/pe_ph(T) of)” _ -1 a _ - Toe-pho Denoting p0I and 00D the contributions to the residual resistivity resulting from electron-impurity scattering and electron-dislocation scattering, respectively, they pre- dicted the coefficient of the e-e T2 term to be p (— COD 2 (1 + —°—¥-)‘2 . (3-u9) 00 DoD Ac: This explains fairly well the sample dependence of the co- efficient A for data of Levy, gt gt., of van Kempen, gt gt., and of Rowlands, gt_gl., assuming the T2 power law is ac- curately obeyed. 0n the other hand, Rowlands, gt gt. (1978),(1u) had extended their measurements down to 0.5 K and found a possible deviation from the T2 behavior, with a best fit of the form AT1'5 from 0.5 K to 1.3 K. Bishop (15) provided a possible explanationfkn’this and Overhauser apparent Tl'5 dependence with the theory of electron- phason scattering. Phasons are collective excitations cor- responding to phase modulation of a charge density wave (CDW). 100 (50) argued that when the charge density in a Overhauser metal is not uniform, a deformable Jellium model can be used in which each electron experiences a sinusoidal po- tential with the Schrodinger equation 2 + + (55 + vO + a cos(Q'Y))¢k = E(k)¢k' <3-50) Charge modulation occurs if the periodic potential is large enough to sustain a density modulation. This is charac- terized by a wave vector 5, which is incommensurate with the reciprocal lattice. Electrons are scattered with the wave vector equation + ‘ + + + k' - k = q i Q . (3-51) So a CDWéUmklapp effect occurs and enhances large angle scattering. Boriack and Overhauser<51) derived the electron- phason interaction to be of the form e¢ = g 2 ¢qfcos[(§+a)°7 - wqt] q V - cost<6-E)-? - wth, (3-52) 101 where ¢q’ w E are magnitude, frequency, and wave vector q, of the phason, respectively. With this potential, they obtained the resistivity, using the variational method and assuming the Fermi surface to be rigidly displaced in k-space by the electric field, as - - 5 (ii. .111” 91 pe¢(T) — A(/2 T/G¢) J5(/§_T_) + B(®¢) Ju(T) + c (g: 2 J2 (%$) (3-53a) where zndz Jn 1 . (3 60b) This describes well the data of MacDonald, gt gt. 3.8. Thermopower of K-Rb In 1961, Guénault and MacDonald<23> reported their experiments on thermoelectricity in K and its alloys below 3 K. Following the theoretical expressions of Klemens and 110 of Sondheimer,(53) they used as a first approximation to the phonon drag thermopower u -x g e 6D o (l-e ) _ 22 where x kT and P f(x) 0: 2:9 Pp,x + Ppae T = p,x (3-62a) + T0,): T10,6 is the fraction of phonon-electron scattering in all scatter- ing of phonons such as phonon-phonon, phonon-impurity, etc. When phonon-impurity scattering is dominant,as in alloys, p,e l m Tp,I « S—E (Raleigh scattering limit) and T q T p,x a l/vq, so 1 l f( ) = —--— = -—-—j§ (3-62b) x 1+qu3 l+(§)x 111 In the case when electron-phonon is dominant, f(x) + l, and (1) = l Clatt g 3 Ne power. In the presence of impurities, Sél) is quenched to we have S , the total normal phonon drag thermo- a smaller value expressed by Equation 3-61. In their analysis, GuEnault and MacDonald obtained qualitative agreement with data with appropriate values of ¢. For quantitative agreement, they used a second approximation, allowing differences between longitudinal and transverse polarizations of phonons in the form 2 l l 2 l s; ) = § sé ) (0L,¢L) + § Sé ) (0T,¢T) . (3-63) Assuming Sg was negligible below 0.5 K, they determined the value of Sd' The data below 3 K, after subtracting Sd, were then fitted to S with appropriate values of (2) 8 ¢L and 0T, with 6L = l30°K and 9T = 90°K. The Umklapp phonon drag was taken to be negligible below 3 K. The relaxation time for phonon-impurity scattering was ex- pected to be proportional to AMX/MO, where AMx is the mass difference between the impurity and the host with mass Mo' However, from the values of ¢, Na and Cs were found to scatter more strongly than expected from the mass dif- ferences, probably due to greater misfit of the atomic volumes of Na and Cs in K. The diffusion components were anomalously positive for K-Rb and K-Cs. From a Gorter-Nordheim plot for K-Rb, they 112 8 obtained sdiff = 2 x 10‘ V/K at 3 K. Also, as indicated from the G-N plot, no appreciable change in the Fermi surface took place even up to 25% Rb in K. From the ex- pression of Sd 1 3X +f‘E] ’ 3A a _ e-u l s = — |e|LOTEK3— (3-614) d we see that there is anomalous energy dependence in the scattering mean free path. In order to have a positive Sd, it is required that the relaxation time t a E'2. Later in 1968, Thornton, Young and Meyer(26) calculated the thermopowers of alkali-alkali alloys and obtained satis- factory agreement with the results of Guénault and Mac— Donald. They expressed the change in diffusion thermo- power AS due to addition of impurities as S 1 + iL. , Ag alne ° (3 65) Ap F Ap is the corresponding change of resistivity. As T + O, Ae: >F 8F S + AS m - lelLOT (3-66) 113 To calculate (A€)F, they used the phase shift method and expressed A0 in the form AD 3 - 12n3hN 2 ‘6’) " mu— ZQIYZ-l "' Yfil (3'67) where l o -l; (e2inl — e2in1) 21 The phase shifts n: and n% are phase shifts determined from experiments. An approximate expression was derived for A€)F: z<22+l>lv2|k 53E lvll z(22+1)ly2|2 (Ag)? approx = 2 - Using the phase shift data given by Meyer, gt a1.,(56) the correct sign of Sd was obtained. IV. THE EXPERIMENTS AND RESULTS 4.1. Resistivity for Pure K The experimental procedure is as described in Section 2.3. Five sets of resistivity (%»%%) measurements were made on the pure samples. Two sets of measurements were made on the same 1.5 mm sample (Sample Kl) with the sample being cycled back to room temperature for two weeks in between the two runs. In the first run for the sample (Kla), measurements were made from u.2 K to 0.3 K using the temperature modulation technique. In the second run (Klb), measurements were made primarily below 1.6 K. The temperature modulation technique was used down to 0.18 K. The temperature sweeping technique was used from 0.25 K to 0.07 K to determine the resistance ratio C as a function of T, and the data were then differentiated to obtain %-%%-. One set of data was taken on one 3 mm sample (Sample K2) from 0.2 K to 0.8 K using the temperature modulation tech- nique and from 0.07 K to 0.25 K using the temperature sweeping technique. Another 3 mm sample (Sample K3) was measured using the temperature sweeping technique in three temperature ranges. 0.08 K to 0.19 K, 0.08 K to 0.H2 K and 0.27 K to 0.U6 K. A third 3 mm sample (Sample KM) 11“ 115 with improved sample holder, was measured from 0.37 K to 1 K using the temperature modulation technique and from. 0.088 K to 0.h3 K using the temperature sweeping technique. For temperatures below 1.5 K, the values of AT obtained using the Wiedemann—Franz law and those from direct therm- ometer determination (AT') were compared. In Table “-1, the ratios AT/AT' at different temperatures for the 1.5 mm sample (K1) and the 3 mm samples K2 and K4 are shown. One sees that the deviations are typically 20% to 35% for samples K1 and K2. This means that there was significant heat loss, so we can only consider the data obtained using the Weide- mann—Franz law as qualitatively valid data. For T < 1.0 K, the data obtained using the measured AT's are considered as reasonably close to the actual results (especially for the 3 mm samples), as described in Section 2.5, and justified in more detail below. For Sample K“, a new sample holder with better thermal isolation and a silver thermal link with much higher conductance were used. Heat loss was reduced significantly. For all our samples, our quanti- tative analysis is based on the data below 1.0 K using the measured AT's. In Figure H-l,‘% %% data using the Wiedemann-Franz law from the first run on the 1.5 mm diameter sample (Kla) are plotted on a logarithmic scale against % in the range u.2 K to 1.2 K. Above 2 K, we found the usual exponential behavior. Similar results extracted from the resistivity 116 Table “-1. The ratios of AT from the Wiedemann-Franz law to AT' from direct measurements for the pure sample K1, K2 and K4. Sample T (K) AT/AT' Sample T (K) AT/AT' Kla (1.5 mm) 1.4H8 1.H9 K2 (3mm) .2016 1.07 1.322 1.46 .2U99 1.08 1.212 1.37 .2627 1.11 1.107 1.50 .3070 1.2M 1.018 1.h2 .3u98 1.15 0.903 1.h1 .U003 1.21 0.820 1.38 .h588 1.31 0.739 1.37 .5115 1.3M 0.657 1.35 .5A66 1.26 0.585 1.32 .6127 1.26 0.515 1.3” .6972 1.28 0.M68 1.3N .7933 1.23 Klb (1.5 mm) 1.018 1.N2 KN (3mm) 0.37”“ 1.01H 0.5129 1.2M 0.U632 1.018 0.M671 1.29 0.5295 1.019 0.u288 1.27 0.6707 1.022 0.3069 1.19 0.8205 1.038 0.3336 1.2a 0.8650 1.051 0.3750 1.22 0.9U58 1.05u 0.2539 1.19 1.0217 1.068 0.2192 1.16 0.1983 1.16 0.173“ 1.18 117 <- [ii- 8: Maxfield ' 41v. Kunpen etal 5 T Figure “-1. Plots of log (% g%) vs % for sample K1. Similar results extracted from data of van Kempen et al.(13) and of Ekin and Max- field.wm_fl mo mpoam .ml: madman 3 no 9.0 to «.o o 4 q _ d d 4 o or”. own no 0 ”a. o .l fiv— _su_ h—II>) o duo 0 ..MD. mum 52.253. .... -Tm- v . . .wmm _ . ...c . 3.38:. 55 121 mommsom coco .xmm.o zoamn Aevo wefipaapcmaoeefio edge emeadpno dude mam .zmH NcmhmlzcmEmUmHE osp Soap B< ucfimz cam B< venomwoe a mafia: mono anon wcfizonm «NM mamemm pom Ma zoaon B m> %m A mo muoam .al: ohswfim o.— O. v .p «.0 «.0 o 0.0 To _ q — O O .... ...: as. 2 5:. 1r . O .0 o lf/ll hh‘ . . 3.33... 5:. 0 .fi 0 ' co o 122 shown in Figure 9-5 and Figure “-6. For both the 3 mm (K2) 2 fit below 2 and the 1.5 mm (K1) samples, we see a possible T about 0.2 K and the data gradually turn away from this T dependence toward a lower power above 0.2 K. The coef- 2 ficients of this possible T term for the samples determined from data below 0.2 K are: 2.61 x 10‘13 Q-cm/K2 A(Kl) A(K2) 2.57 x 10‘13 Q-cm/K2. Due to the uncertainty in QC (i20%) as discussed in Section 2.5, the uncertainties for these values are about 20%. In order to determine whether a single power law for the resistivity is possible up to about 0.5 K, we measured another 3 mm sample (K3) using the temperature sweeping technique. A new thermometer calibration (checked against NBS superconducting fixed-point devices) was used in parallel with the existing calibration to check whether the devia- tion from T2 is possibly due to the temperature calibration. Figure 4-7 shows C vs T and T2 for the set of data in the temperature range from 0.08 K to 0.U2 K using the old and new temperature calibrations. One sees that both calibra- tions yield similar results, and that the deviation from T2 behavior is not due to the temperature calibration. The new calibration is used in the following graphs. Figure “-8 .Aee m.Hv Hm madame soc mmm.o Sofioo me one B n> o co wooed .muz ossmHm c. I mad do «3 ..o _ q 4 A mOA. o . 1 low— 0 3 . . . Loo. . . .. u 1. End _ n .. Susilmoo. .o .AEE mV mm mademm mom xmm.o zoaon NB 6cm 9 m> 0 mo mpon .ml: mpdwfim A o. F mad «6 m3 1 ..o . d d . no.0 o . a O ‘Or- In x? ......” N o 125 .on soap unpnfiamo manpmmodfiop 30: van A.V soapManHmo enduwpoQEop UHo wcfim: numb anon wcfizonm AEE mv mm oHQEmm hog Mmz.o soaon m a one B n> o no noofid .su: magmas 3.: to no «.o ..o - o .. .. ..omk h .. .. o ... ... Omflk .. ....1 ones .. .. . .1 u .. ..omoaaod Ll - P p P b b _ b - N.ocau o. o 126 .mpcoEoLSmmoE mo mpom oops» mcfizonm ASE my mm oHQEmm you 9 m> 0 mo mpoam .wlz madman m nomxom _ Lawns . . 1r 0 o L Omsk .. «... . .. . iommh T .. ..v 1 omwkr. .TJ . LOQON one? . .88 127 shows C vs T2 in three temperature ranges, 0.08 K to 0.19 K, 0.08 K to 0.u2 K and 0.27 K to 0.46 K. Since the reference sample was kept at different temperatures for these three sets of measurements, we can only compare the temperature dependences or slopes of these data. They are in excellent 2 agreement, as can be seen from Figure “—8. The T behavior is not observed for the whole temperature range (80 mK to H60 mK). The data below 0.25 K are plotted against T and T2 in Figure u—9 for two sets of measurements. A T2 be- havior is possible at the lowest end of the temperature range, with A(K3) = (3.2:0.3) x 10-13 Q-cm/K2, similar to the data of samples K1 and K2. A least square fit was made on the set of data in the range from 80 mK to 420 mK to de- termine the best single power law TN. N was found to be 1.910.03. Figure u-lo shows plots of c vs T2, T1°9 and T1.8 In Figure 4-11, plots of C vs T, TL9 and T2 for sample K“ are shown from 88 mK to N30 mK. One can see that the behavior is similar to the results of Sample K3 (Figure U-7 and Figure N-lO). Since the heat loss problem was prac- tically solved below 1 K for Sample KA, and the results are similar to the data of Sample K3 where there was sig- nificant heat loss, our assumption that the measured T's were close to the actual T's for Sample K3 verified for this temperature range. In Figure u-12, the results of % %% 0f samples K3 and KM (obtained by differentiating the 128 .mpcosthmmoE no open 03p wcfizonm .AEE mv mx oaaemm mom m mm.o zoaon me can a .m> 0 mo mpoam .ml: opswfim C: ... A . mad 0N0 m —.0 90 no.0 q A q o h.+ . u 1 own 1 005 . . 1 000 v o o o+.h .1 “V p _ _ e 1 §k¢omd «.23 m a _ o 129 e .m.He . e n> o oo wooed .oau: enemas .mm oedema too xma.o sodoo m.H m a... S sup 0’ 0 a- 1 «.31 cons — q 0—x0N 000k coon u 0000fimo .0 130 .:x mHQEMm ho0 mm:.o BOHmD B .m.HB «NB m> 0 mo mpoam .HHI: mkdwfim 110 may 0.: w 5 NA. —A. 0 000m 000m 130 .:x oedema toe xme.o soHoo e .m.He .me as 0 do wooed .HHI: enemas VA. 0A0 0.: ~20 00 0 1W 4 000m 000m 131 one mHOQE>m Como .Aevo mnenefionenenneo none oenfieeoo eneo Q .zn one mm .mn eoaoeee non me nofieo a e> w no wooed .mHu: eneman 3:.— o._ «.0 06 Yo ad 0 . T 3 . _ _ T 4 0 inc. 10¢ 132 temperature sweeping data, using the new temperature cali- bration) and the 55% data of Sample KN (obtained from the temperature modulation method, using the new temperature calibration) are shown together with the %-%%-data of Sample K2 (using old temperature calibrations). One sees that the results are similar. A straight line passing through 2 law cannot be fitted to the zero that corresponds to a T data in the entire temperature range shown to within the uncertainty of our data. However, the data of Sample KN from 0.3 K to l K are consistent with a T2 law. For Samples K3 and KN, the resistivities p(N.2K) were determined during the measurements with a newly added Sn-In standard resistor which was mounted on the l K pot. This Sn-In standard resistor turns superconducting when the l K pot is pumped down to 1.3 K, so no deterioration in noise and sensitivity takes place. In this way, the value of p(N.2K) for a particular run can be determined accurately (aside from the uncertainty in A/l, which is a constant multiplying factor). Since the temperature dependent part of the resistivity of K at N.2 K is about 10%, we can correct for pO accordingly. From the possible straight line fit to the data of KN from 2 0.37 K to l K, the coefficient of the T term is found to be A(KN) = (2.7i0.27) x 10'13 Q-cm/KZ. 133 This is consistent with results of samples K1 and K2 derived from data below 0.2 K. To summarize, we have measured %-g% on 3 mm diameter and 1.5 mm diameter pure K samples down to 70 mK. Reason- ably good data were obtained for Sample KN below 1K. The 2 dependence down to 0.37 K. From data show a possible T 0.N2 K to 0.08 K, deviations from a T2 dependence were observed and the best fit to the data was with T1'9. The data for other 3 mm samples K2 and K3, for which significant heat loss were found, show similar behavior when determined using measured AT's. The data for the 1.5 mm sample (K1) 2 show larger deviations from a T dependence below 1 K. However, since there was significant heat loss, this result 2 cannot be solidly confirmed. Possible T dependences were found below 0.2 K for all the pure samples. In Section N.5, our data below 1.0 K for the pure samples are compared with currently available theoretical models. N.2. Resistivity for K-Rb We measured %-%% on five dilute (3 mm diameter) K—Rb alloys of concentrations 2.2N at. %, 0.83%, 0.32%, 0.13% and 0.05%. We obtained the usual exponential behavior for T > 2 K for all samples. This is illustrated in the log (% %%) vs %~plot for the 2.2N% and 0.32% samples in Figure 13N N-l3. We also calculated %»%% using the measured AT below 1.N K and compared with those obtained using Wiedemann- Franz law. The deviations between AT using the two methods are shown in Table N-2. For those samples (2.2N%, 0.83% and 0.32%) with Cu-Ni cladding superconducting leads, devia- tions are less than N% in the region where the thermometer is sensitive enough so that relatively accurate AT can be determined. For the 0.13% and 0.05% samples with copper cladding superconducting leads, the deviations as shown for the 0.13% sample are similar to those of the pure sample where the same kind of leads were used. As discussed in Section 2.5.1 and Just above, the measured AT should be reasonably close to the actual AT of the sample. Therefore, the measured AT's are used in the analysis for T < 1.3 K. No significant change occurs in our data when the new tem- perature calibration is used, so data using the old tempera- ture calibration are analyzed in the following. We fitted the data for the 2.2N%, 0.83% and 0.32% samples from 0.1 K to N.2 K, assuming a resistivity of the -0*/T form 0 = pO + AT2 + BTp e , where the exponential term is assumed from results for pure K. Hence 19.22_1_d p dT p d 0 2A B P-l-0*/T 0* 2— +-— P-— DOT DOT e ( T) 135 Table N-2. The ratios of AT from the Wiedemann—Franz law to AT' from direct measurements for the K-Rb 0.13%, 0.32%, 0.83% and 2.2N% alloys. Sample T (K) AT/AT' Sample T (K) AT/AT' K-Rb 0.13% 0.33N5 1.10 K-Rb 0.83% 0.N7N6 1.0N 0.N010 1.1N 0.606 1.0N 0.5120 1.17 0.650 1.0N 0.5877 1.11 0.717 1.0N 0.6N03 1.19 0.8395 1.0N 0.6983 1.19 0.8917 1.00 0.8016 1.19 1.113 1.07 0.950 1.22 1.2Nl 1.08 1.092 1.28 1.338 1.09 1.25N 1.17 1.508 1.08 K-Rb 0.32% 0.3872 0.99 K—Rb 2.2N% 0.5362 1.03 0.N7N5 0.98 0.618N 1.03 0.5788 1.08 0.6888 1.03 0.6N71 0.99 0.8225 1.0N 0.7201 0.99 0.9829 1.03 0.81Nl 0.99 1.1NN3 1.13 0.9212 0.98 1.3268 0.986 1.017 0.99 1.155 1.01 1.336 0.98 136 .3211 I . 2.241 1111114 1° 0.2 Figure N-13. 0.4 0.6 0.3 1 J. ‘ 1- ( x) 1 d Plots of log <3 5%) vs F}. for K-Rb 2.211% and 0.32% samples. 137 We obtained the best fit with p l. The values for B and 0* obtained from the least square fit are shown in Table N-3. One can see that B is roughly independent of po and 9* is approximately the same as that of the pure sample. The fitting curves are shown for the 0.32% specimen in the tem- perature ranges 0 to N.2 K, 0 to 2.5 K and 0 to l K are shown in Figure N-lN. Below about 1.3 K, the exponential term becomes small compared to the other terms as in the pure samples. Like the pure sample KN, good straight line fits passing through zero can be seen below 1.3K for all the K-Rb alloys, as shown in Figure N-15. This implies that p is proportional to T2 with p in the form o = 00 + AT2, T < 1.3 K, The slope of the straight line is equal to 2A/po. Table N-N lists the values of 2A/pO and A for all the samples de- termined with measured AT's. The values for the 3 mm pure specimen (KN) obtained from an approximate T2 fit below 1K are included. A plot of A versus pO is shown in Figure N-l6. A good linear relationship between A and p0 is ob- tained. So we can express the AT2 term in the form 2 _ 2 S AT ‘ Ainel po T + AxT ’ where S 2 2. The first term on the right hand side is 138 Table N-3. The parameters from the best fits to the term -ex/T BTe for the K-Rb 0.32%, 0.83%, 2.2N% samples. 0 p0 (Q-cm) B(0-cm/K) 0* (K) ‘7 u 8 ‘9 0.32% .56x10 .9 x10 19.6 0.83% 1.N2x10-7 N.5x10'9 19.32 2.29% 3.87::10‘7 6.N6x10-9 18.75 139 Table N-N. The coefficients A of the T2 terms for the K-Rb alloys and pure K sample KN. C pO (Q-cm) 2A/pO (K-Z) A (0-cm/K2) 2.2uz 38.7x10“8 1.78::10‘5 3N.Nx10-l3 0.83% lN.2xlO-8 1.95xio'5 13.85 0.32% 5.60x10'8 2.1131(10'5 6.80 0.13% 2.35x10-8 3.55::10'5 1.17 0.05% 9.97::10‘9 6x10‘5 3.0 0 (KN) l.NNx10-9 111.6x10'5 2.7 1N0 <5 01 safe.» V” l I ..- 0" T \ O 1 \ L.‘ T r— li f \ A O: C” II” F THO Figure N-lN. The fitting curve for 99 data of K-Rb 2 0.32%, assuming 0 = 00 + AT + BTe'e*/T. Shown in three temperature ranges: (a) 0 to N.2K, (b) 0 to 2.5K, (c) 0 to 1K. 0* = 19.6K. 0H4 Q. 1N1 //’ // () I l 1 All. 1 11. 11 1 l . 0 0.4 0.8 1.2 1.6 ' mo Figure N-15. Plots of 8'88 vs T for T < 1.3K for K-Rb alloys 2.2uz, 0.83%, 0.32%, 0.13% and 0.05%. Typical error bars are shown for the 0.13% sample. 1N2 .maoaam nmlx can now on unseewm coupoao Ego» NB man no ¢ ucoHOHmmooo one .mal: opzwfim A EYO .159 Van V m N _ _ _ A O O 1N3 consistent with the impurity concentration dependent T2 term predicted by Koshino-Taylor. From Figure N-l6, we have for the resistivity of K—Rb alloys below 1.3 K, p = 00 + 8.3 X 10-6 00 T2 + 2.2 X 10-13 T2 9-Cm. In order to determine the uncertainty in Aincl’ we used the equation 2A X M ‘ E— 00 +2Ainel A plot of M vs 5; should yield a straight line with slope o 2Ax and intercept 2A1ne1' This way, the independent errors in M and p0 can be used in determining the uncertainty in Aincl' Figure N-l7 shows such a plot. The results are 6 -2 A (8.510.26) x 10' K inel = Ax = (2.15:0.32) x 10‘13 0—cm/K2 The result of Ainel is in good agreement with the approxi- (18) mate theoretical values predicted by Koshino and by (55) Taylor (m10-5)(19). Frobfise and Jackle calculated this T2 term for pure potassium and obtained Ain 1 = 1.8 x 10"5 K- (20) 2 Also, Kus and Taylor calculated for K-Rb alloys and lNN o rm. @2583 @8539 Adam. ....v z oaoam one .NHI: @81me .. On 3. :LZUWCNCC w. MW 3 .V N O _ _ _ _ _ _ _ T A e 1N5 obtained _ -5 -2 Ainel - 1.25 x 10 K The agreement between experimental results and theoretical results is good. N.3. Thermoelectric Ratio for Pure K The experimental procedure is described in Section 2.3.2. The G data fortfluepure samples are shown in Figure N-18 along with data for the K-Rb alloys which we will discuss later. The data up to N.2 K were fitted to the form _* 2+9 e/T G = G0 + AT T e . We obtained 9* = 23:2 K. This is consistent with the um- klapp processes "scattering temperature" obtained by Mac- l.(2l,22). Donald gt Also, this is in rough agreement with the result for pure K. The fitting curve is shown for the 1.5 mm sample in Figure N-19. In Figure N-20, data below 1.1 K are plotted versus T and T2. One sees that G can be expressed as G = G + AT 3 T < 1.1 K 1N6 .xm.s nofieo nsofifie omum one one we one an eefioeee non eneo o 0:... n ¢. 0. N — d1 - O O O C ‘ ‘ o a O O O N 1 1 {I 4 .wHI: mpswfim 1N7 I E o u 3 w I + B< + ow n o wcfiesmme .Hx oHQEmm mo open 0 map pom o>n50 wcfippfim one .mHIz opzwfim m AMY? O «1- (‘0 N A __‘F 1N8 .x N.H zoaon mm one HM moHQEMm how me one B m> 0 mo mpoam .omu: ennwfin 1N9 From the graph, we get - 1 GO - - 0.03i0.03 V A = - 0.30:0.01 -l;— . V-K2 Since we are in the elastic limit, the thermopower can be determined by S' = GLOT and compared with results of Mac- Donald gt al. In Table N-5, the results for our samples are shown. The results of MacDonald et_al. are also shown for comparison. They fitted their data below 3 K to the form -* S = A'T + B'T3 + C e /T Since 8' = GLOT, we have A' = GOLO, B' = ALO. Because of the difficulties involved in separating the diffusion term, normal phonon drag and umklapp phonon drag terms from their data, their values of A' and B' are of high uncertainty. Since we can observe directly the normal phonon drag term from our data (T2 dependence of G), our uncertainties in A' and B' are much smaller. 150 Table N-5. Comparison between results of our data and the results of MacDonald et a1. (22) for the pure K and of Guénault and—MacDonald(23) for the K-Rb alloys, assuming 8' = GLOT _ 2 Q -0*/T - (G0 + AT + T e )LOT _ * =A'T+B'T3+C'e9/T This Work MacDonald, et a1. 19"8V + Pure K A (10 K5) -0.07N-0.07N +0.5 to -l.0 B'(10-8 XE) -0.735i0.025 -0.15 to -0.30 K 0*(K) 23:2 N21 RRR N800 mSOO Diameter (mm) 1.5 or 3.0 ‘30.15 free hanging encapsulated in glass K—Rb Sdiff (10‘8 K1) imp 3.53 T=3K 151 N.N. Thermoelectric Ratio for K-Rb In Figure N-18, the G data for all the K-Rb alloys are shown together with those for the pure samples. In Figure N-2l, the G data for the alloys only are shown in enlarged scale. Assuming the form as described in Section 3.N and Section 3.8, one sees that phonon drag is quenched more and more as the impurity con- centration increases. The diffusion term G0 is positive. The G data below 1 K are shown in Figure N-22. In Figure N—23, the data below 1 K for the 2.2N%, 0.83%, 0.32% and 0.13% alloys and that for the 1.5 mm sample (K1) are plotted vs T and T2. One sees that the normal phonon drag com- N ponents Gg are roughly the same for the alloys and the pure sample, although the temperature dependence of G: 2 is no longer T for the alloys. The values of the diffusion term G0 are obtained by extrapolating the data to T = 0 and are given in Table N-6. A Gorter-Nordheim plot is shown in Figure N-2N. The relationship 0 +—E(G G = G o imp 90 pure - Gimp) is roughly observed and the diffusion thermoelectric ratio 152 Table N-6. The diffusion components GO of the pure samples K1 and K2 and the K-Rb alloys. 95'2“ 0 (l) 1 lo8 1 Sample (10 Q-cm) 0 V 0(N.2K) Q-cm Kla 0 1.5 6.67 Klb -0.0310.03 K2 1.73 -0.06 5.78 K—Rb 0.05% 9.97 +0.N35 1.0 K—Rb 0.13% 23.5 +0.N66 0.N26 K-Rb 0.32% 56.0 +0.N7N 0.179 K-Rb 0.83% 1N2 +0.N76 0.070N K—Rb 2.2N% 387 +0.N85:0.3 0.0258 153 .4 - .2 '— OAO. o. ' .0AD .0 L- '. O 4. j1-.ir.1 ”.1. 1 .. ‘ ° 2.24% G V — . . O A P O A ‘ 32 ‘ A A. ‘ ° 0 O r- ' o o UK) Figure N-21. G data below N.2K for the K-Rb alloys. 15N .enofiae omun on» non mm.H soaoo e n> o no wooed .mmue onnmfin 155 '. AAA I l I I . A A A T 4 *- <- . 2.24% 317 ° “ . it 1 ° ° ° o l _ «VZF ° 0 " .83 o D O .0 o J 4 _ ° 13 T a <- . ° 0 .32 j. .3 - . “V 4a.. 17‘," v D. .4 b . ‘7 v T 2 Figure N-23. Plots of G vs T and T below 1K for the K-Rb 2.2N%, 0.83%, 0.32% and 0.13% alloys and pure sample Kl. 156 .va Ho.oees.o+ IIFIT F on o .zmlz mpswfim 157 characteristic of Rb impurities in K is found to be H Rb in K 1 _ .. -8 V The pseudo-thermopower S — GO LOT - 3.53 x 10 K at imp T = 3K can be compared with the result from data of Gruénault and MacDonaldC23) ' -8 v S - 2 x 10 - . diff Imp) T=3K K Since they neglected the effect of phonon drag below 0.5 K in determining their diffusion thermopower, and from our data, phonon drag is not negligible even at the lowest temperature, the discrepancy between our results for the diffusion thermopower is understandable. To illustrate, we consider G = G at 0.5 K, then 0 s G L T = 2.9 x 10‘ K at T = 3K. diff = o o The discrepancy could be reduced if the appropriate con- tribution of phonon drag is taken into account. 158 N.5. Discussion and Summary N.5.1. Resistivityifor Pure K We have measured the temperature derivatives of the resistivities (% g%) of three 3 mm diameter and one 1.5 mm free hanging pure K samples down to 0.07 K. (Previous reported measurements on K were only down to 0.5 K). The results are given in detail in Section N.1. In brief, our data below 1 K for the 3 mm samples (especially KN) show a possible T2 dependence from 1.0 K to 0.N K, but there is complicated behavior below 0.N K. In the range 1.9i0.03 from 0.08 K to 0.N2 K, best fits with T were 2 observed, and below 0.2 K, possible T fits were again found. For the 1.5 mm sample (K1), the temperature de- pendence was found to be lower than T2 from 1 K down to at least 0.2 K. Below 0.2 K, the data are consistent with a T2 dependence. In this section, we compare our data for the pure K samples below 1 K with currently available theoretical models. Below 1 K, the contribution to the resistivity due to electron-phonon scattering becomes negligible small. From data above 1.5 K, we obtained the component of Del-ph’ and below 1 K this is at least three orders of magnitude smaller than the total temperature dependent part of the resistivity (at 1 K, lg—g—élflmq x 10‘7, to be compared with % %% W N x 10-”). So our results are 159 not affected by the phonon effect. Currently, there are several theories for the resistivity of K below 1 K, as described in Section 3.5.2, namely, isotropic\e-e scat- tering, anisotropic e-e scattering, and electron-phason scattering. We compare our data with these theories as follows. (a) Isotropic e—e Scattering For simple isotropic e-e scattering, the contribution to resistivity is expected to vary as AT2 and the co- efficient A for a given metal should be independent of other scattering mechanisms. For K, Lawrence and Wil- kins(3) calculated A = 1.7 x 10‘13 0-cm/K2. For the data 2 of our pure samples, such a T law is not able to describe our data over the entire temperature range up to 1 K. For the 1.5 mm sample (K1), the temperature dependence of the resistivity is lower than T2 and higher than T, except below 0.2 K. For the 3 mm sample (KN), the data from 2 0.37 K to 1 K are consistent with a T law, with a co- efficient. A(KN) = (2.7eo.27) x 10‘13 Q-cm/K2 Similar qualitative behavior was observed for samples K2 2 and K3. There are deviations from a T dependence below 0.NK. For the 3 mm samples K3 and KN in the temperature 160 range from 0.08 K to 0.N2 K, the best fits to the data 1.9i0.03. 2 are with T A T fit is not possible to within the uncertainties of the data. However, below 0.2 K, from plots of c vs T2, the data for K1, K2 and K3 show pos- sible T2 dependences. (There are insufficient data to make such a plot for Sample KN). The coefficients were de- termined to be A(Kl) = (2.61:0.5) x 10"13 0-cm/K2 A(K2) = (2.57:0.5) x 10'13 0-cm/K2 A(K3) = (3.2:0.3) x 10‘13 0-cm/K2. The coefficients A(Kl), A(K2), A(K3) and A(KN) of the pos— sible T2 terms are consistent with the theory of simple isotropic e-e scattering, i.e., they are of the right magnitude and roughly sample independent. However, there are presently no satisfactory explanations for the ap- parent Tl'9 dependence for the 3 mm sample and the dif- ferent behaviors of the 1.5 mm sample and the 3 mm samples above 0.2 K. (b) Anisotropic e-e Scattering Kaveh and Wiser(l7) proposed a theory considering the effect of anisotropy on e-e scattering. When the dominant scattering mechanism is anisotropic, for ex- ample, electron—dislocation scattering, then the e-e 161 N-processes produce a T2 term which is dependent on the residual resistivity due to this anisotropic scattering. With this theory, they explained why the data of Levy, (l6) 1.<13) t 1. and of van Kempen, 23 showed sample dependence when the T2 law is assumed to be accurately 2 obeyed. However, the possible T terms from the data of our pure samples do not show significant sample dependence as in other's results. Even though for the 1.5 mm sample, our data show changes in magnitude for the two runs with the sample being cycled back and annealed at room tempera- ture for two weeks in between, the changes are small, and 2 the T law was not well obeyed. Since we were measuring .1. p (we were unable to determine the change in no at that time). 2 g%, these changes could be due to the change in 00 The coefficients of the possible T terms from our data do fall within the range of values predicted by Kaveh and Wiser. Since we have no systematic way to determine the ratio poI/poD (see Section 3.5.2) for our samples (they are free hanging therefore relatively stress free and the changes in pol/00D could be small for our samples), we cannot make a rigorous test of this theory. More high precision measurements on samples with controlled pol/DOD are necessary to clarify this. The deviations 2 from T behavior are not predicted by this theory. 162 (c) Electron-Phason Scattering Bishop and Overhauser(15) proposed the theory of electron-phason scattering to explain the possible Tl°5 behavior of the data of Rowlands gt a1,(lu) (see Section 3.5.2). For our 1.5 mm sample (K1), the data appear to show similar behavior below 1K. In an attempt to fit our data 2 0 for K1 assuming p = p0 + AT J2 (fig) and using the same "phason temperature" 8 (= N.85 K) as. obtained for the 0 data of Rowlands et a1., we obtained only a fair fit, as shown in Figure N-25. In order to have a better fit, 6¢ was varied until a best fit was achieved. The best value of 0¢ = 6.5 K. Figure N-26 shows the fitting curve with 0¢ = 6.5 K. However, a better fit is inevitable when there are more parameters. And for the 3 mm samples, a T2 fit is possible from 0.N K up to l K, thus a similar kind of fit with J2 (z?) would not be appropriate. Since the sample diameter of the samples of Rowlands, gt 91., was 0.8 mm, and the results of our 1.5 mm sample showed closer similarity to the results of Rowlands et_al. than to that of our 3 mm samples, such a deviation from T2 could possibly be associated with a size effect. Measure- ments on more different diameter samples would be neces- sary in order to sort out this possibility and to ascer- tain whether the theory of electron-phason scattering is appropriate for the resistivity of K. oe 0.8... w 5.5 4:93 No N.2 + on u a 9.253.. J: 223 5. .6 Boo hymn. no“. «:3 9.33.. of. mm-.. .953“. . . . 0:... . . 0. mo 00 to N o o _ 4 _ a _ A _ a A 0 .. A .. J m m. J u— Tomi L 2 .. ....m c Q _ 16N .nm.o u so noes ..e\oev me an + oo u o enanneee .nH soaeo fix no eoeo we m_ou had seen .emus enemas Av: .— 0.— 0.0 0.0 V0 «.0 . 0 _ _ _ _ _ _ 1 . . 0 165 (d) Conclusion From the above discussion, we conclude that the T2 law due to simple e-e scattering provides a better expla- nation for our data below 1 K than other available theories, even though none provides perfect explanations. (More extensive measurements as suggested above are neces- sary in order to ascertain the validity of the various theories.) Although there are deviations from a T2 law, for which no satisfactory explanation is presently avail- able, the dominant scattering mechanism that is respon- sible for the temperature dependent resistivity is best described as isotropic e-e scattering. From the results of the K—Rb alloys, as shown in Section N.2, the T2 dependent resistivity due to inelastic electron-impurity scattering is at least an order of magnitude smaller than the T2 term in our pure K samples below 1 K. So the in- elastic electron-impurity scattering only contributes a 2 small correction to this T term in the pure metal. The 2 law could be due to the size effect deviations from the T associated with electron-boundary scattering, but more systematic measurements are necessary to clarify this point. 166 N.5.2. Resistivity for K—Rb Alloys We have measured %-%% on five dilute 3 mm diameter K—Rb alloys and found a dominant T2 term below 1.3 K that is linear with residual resistivity. Below 1 K, the electron- phonon resistivity becomes at least three orders of mag- nitude smaller than the total temperature dependent part of the resistivity, so we were able to study the dominant scattering mechanism separately. Below 1.3 K, we obtained, for the K-Rb alloys, 0 = 0o + (8o5i0-26)X10-600T2 + (2.15:0.32)x10-13T29-cm. The term (8.5i0.26)xlO-6p0T2 is best described by the theory of inelastic electron—impurity scattering. The coefficient is close to theoretical values. We believe that this is the first time the Koshino-Taylor term is unambiguously being observed. The other T2 term (2.15 0.32) x 10'13 T2 Q-cm was found. This T2 term which is independent of pO could be associated with e-e scattering. N.5.3. Thermoelectric Ratio for K and K-Rb We have measured thermoelectric ratio on free hanging pure K and dilute K-Rb alloy samples down to 80 mK with higher precision than that which has been attained before. For the pure samples, the thermoelectric ratio was found to be of the form 167 0 = 0 + AT2 + g -93 e /T From the data up to N.2 K, we obtained for the umklapp phonon drag term 9* = 2312 K. 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Josephson (1962)(5u) first pre- dicted for a system consisting of two superconductors separated by a very thin insulating layer, the electron 'cooper pairs' can tunnel through the layer, yielding a flow of superconducting current across the layer at zero voltage. This is the d.c. Josephson effect. The supercurrent density JS is given by JS = JC sin(AGJ) , where JC is the maximum current density, determined by the properties of the Junction, and AGJ is the phase differ- ence between the phases of the wavefunctions of the cooper pairs in the two superconductors. If a voltage V is ap- plied across the Josephson Junction, then the phase change A03 is related to V by 1714 or d(A0 ) ____1_.= 3: dt 2" V h Thus A0J would change in time and so JS would oscillate with frequency f = v %§ = N83.6 v (MHz/0V) . This is the a.c. Josephson effect. Later, experiments confirmed his predictions and also other weak links between superconductors were found to have the same effects.' They are called Josephson Junc- tions. Figure A-l shows the principal types of Josephson junctions. In a SQUID, the Josephson Junction is part of a super- conducting circuit (Figure A-2a). The total phase change A0 along a loop through the Junction and the bulk super- conductor with total flux through the loop ¢, is A¢o = - 2%5i'¢ + AGJ = 2Wn . Writing Induum contacts V / 175 E -Suoerconducfor~|00 nm 0 /w cup-r Superconducting A Gloss substmfe mock wlfh~ 2 nm Oxide Crossmg strip r? I; ”#05: \ Gloss substrate Fone neck 10sz Superconducting " metal fulm ~IO' 6m muck Figure A-l. \Ot'dvzed Nb wnre~|mm OIO Drop of lead-tun solder J D'SC bonmv ~'OOnm copper etc I /or ~ IOnm of / sermconduc for 2mmmo ND wNe sharpened to~2ym pom? Nb post (d) Hannah 0‘ ND /wnre or solder covared copper wue The principal types of Josephson Junction. a) Tunnel Junction. ductor barrier Junction. d) AdJustable point-contact. 'SLUG'. b) Normal or semicon- c) Dayem bridge. e) Solder drop f) Crossed wire or hair pin Junction. (After Giffard §£.al., Prog. Quan. Electr., N, 301 (1976)). 176 Is Josephson junction .— 2 —.1L AG)l —2nn+ 2nq) , (Po-20 . o ’5 :1c sm(A®i) SCREW NTT A LOCK NUT} 0 05C LE F1 Figure A-2. a) The Josephson Junction in a superconducting loop. b) Single Junction, rf biased symmetric. SQUID of Zimmerman, Thiene and Harding . 177 The quantity '6- O ¢'=¢-2}-A6J=n¢o is the fluxoid and 90 is the quantum flux or fluxon. This is London's theory of fluxoid quantization in the super- conductor. Now JS JC sin(AeJ) = JC sin(2nn+2w $9) 0 JC SiH<21T gfi) 0 With an external flux ¢ext’ the total flux through the hole inside the superconductor ¢ = ¢ext + LJS 3L + LJC sin(2n ¢o) . ¢ext (30)) From the derivative (after LOunasmaa 178 one sees that if 21rLJC/cbO >’ 1, then do/doext changes sign from positive to negative through infinity. ¢ is thus a multi-valued function of ¢ A plot of ¢/¢o vs ¢ext/¢o ext' is given in Figure A-3. The operation of SQUID could be understood by considering the response of o to the external flux ¢ We will consider a SQUID magnetometer, which, ext' in a modified form, is used as our null-detector. The most widely used SQUID magnetometer is a single Junction, radio- frequency biased SQUID (Figure A-2b). An inductor coil er is put inside the SQUID hole. er is driven by a rf oscillator at its resonant frequency (f0 = 19 MHz) of the er Crf circuit. er is loosely coupled to the supercon- ducting ring inductance L through mutual inductance M. External flux ¢ext coupled to er through the superconduct_ ing ring and changes the effective impedance of er. Then the change in voltage Urf across the resonant circuit, which is a function of ¢ can be detected. Referring ext’ to Figuresjbfi3and A-N for 2nLJC/60 = 5, if the d.c. ¢ext is first biased at X (o = 00), then by increasing 0 ext ext from the rf source by increasing the rf level, the flux would move up along the curve XX', thus Urf would increase up to Al (in Figure A-N), corresponding to point R (in Figure A-3. Further increase of the rf level would cause the Josephson Junction to become normal and a flux Jump from point R to point S, dissipating the additional energy, so no increase in Urf is possible. The flux in the super- 179 I V I T I T I 3 0 '- anJc/¢°.1 2 5 ~ 3\ S\ 2 0 *- O S. 6 \ 1S '- I -< & ‘ / : /’I’ ‘ R ' Ill ..... - w X 9' ’ z 1 r- Y 0 ---- H 1” x o .4 """"" It’l / / O I, .’ 4L [I 0.5?“ ' l . q ¢'¢Qlt/"l X/ ,’ P z . ’1’ ......... 0 ,p ’ 4 I l l l 1 L l l 0 0.5 1.0 1.5 2.0 2.5 3.0 ¢efll¢o Figure A-3. ¢/¢O as a function of ¢ext/¢o in three cases: 21rLJc = ¢o’ 300, and 500. Vertical lines with arrows correspond to discontinuous changes of one flux quantum in the fluxoid ¢' and to some- what sma11§S)changes in the flux ¢~ (After ). Lounasmaa 180 UH RF LEVEL Figure A-N. The staircase pattern. The voltage Urf across the tuned erCrf-circuit is shown as a function of the rf level. At the plateaus the quantity plotted is Urf(max), the voltage Just before a dissipative transition occurs. (30).) (After Lounasmaa 181 conducting ring would follow the hysteresis loops until the rf level is increased to a level in which there is more energy than that which is dissipated through the hysteresis loops, then the flux would again move along S and T, Urf would start to increase again (along A3 to Aé). A stair- case pattern of Urf against the rf level thus results (Fig- ure A-N). If while keeping the rf level fixed, a modulat- ing field which moves the starting point to the right is present, flux Jump would occur at smaller rf level, thus Urf would be smaller. When the starting point is moved to Z (cpeXt = g 90): a minimum Urf would be reached. Further increase to point W (which is equivalent to W') results in higher Urf' If a low frequency modulating field that sweeps the starting point between X and Z (peak to peak ampli- tude is ¢O/2) is present, Urf would oscillate from Urf max to U at the frequency of the modulating signal. Thus rf min a triangular pattern in Urf appears (Figure A-5). The amplitude of this triangular pattern can be detected by a phase-sensitive detector. A typical SQUID set up is schematically shown in Figure A-6. Now, external flux experienced by the SQUID causes the triangular pattern to shift horizontally. If the output of the PSD is integrated and fedback to the SQUID to counteract the external flux, the triangular pattern would be locked on. (The SQUID is now in a locked-on mode). The feedback voltage is then proportional to the external flux. “VIV'VN UN ("‘01, Figure A-5. The "triangle" pattern. The maximum voltage Urf(max) vs ¢dc for different values of the rf level. (After Lounasmaa<30).) 183 i9MHz' 50 C (35C RF 7ir' level RF .AMAP Tune :> I J C] i 1 feedback A integrator [TVAA g—{D r-‘x --------------------- 1 4 K environment L____--_-___“.§MQ§§__J Figure A-6. Typical rf SQUID electronics.