Characterization and modeling of a compact ECR plasma source designed for materials processing

In Collections: Electronic Theses & Dissertations

Copyright Status: In Copyright

Material Type: Theses

Authors: Tsai, Meng-Hua

Date Published: 1999

Subjects: Electron cyclotron resonance sources
Manufacturing processes
Plasma (Ionized gases)--Mathematical models

Program of Study: Electrical and Computer Engineering

Degree Level: Doctoral

Language: English

Pages: xv, 173 pages

Permalink: https://doi.org/doi:10.25335/3j6d-mq95

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