“32?; . , .. (:43: . 5,). :3 ,. N a . g... :93. ‘ 47.}. En. . ~ ’ . er- 13534 .. my. . 5‘ ‘ \ 22.533 ‘1‘ 4-,; 25‘ ~ . '\ ”$2.2“ "E!" ' 9’. I: {3 *3 a": .. w :55- “ 5,55”: :- ‘ . - . A 4.223;? $“5tfifi8‘ ‘ , ‘ "v§3;t,gc:§§a".u .5 ~~ ’3 'A 1.7:: mug. a; “ 4 155’ «v .N. ‘ a: 1;: ‘13 .-.M 3 h‘lJb‘ \ I . I: ‘ K 37.“. “-c 1:1. vitfietc'm‘u “‘3 “J " '- ' ' ‘ ":57. 1.35595) . 3: 3"???“ .-.. ~ 3 ,¢‘§5‘.‘§'§3‘“§““ ML; 6 . ~ :,fi¢§g§-.%xs;. . 7.35:» “:“i- :a «3" M‘Anw...“ :3, Jan- 4. .- 533,“ . ., ' ..‘ 3, » . - ... 4 " 2‘- ' .3. 1. .' ‘ .‘z a? -' ‘3 " . .... 52%? 3 ‘ . _ R“ _ .... .. ...... .. x ...W“. tfiwfi.fix “or ‘wfifififiw ..-3§-,9;“"i5‘a . -... . ~ A, - a" , ‘ u{.-,_ .r a. . .. _ ,- m; «an... , me... W .-., "w with: ->u:~‘§ 1. ‘8'..."‘. _,. 33,-? - ‘21}; v" M ‘32, 2mg»? 1 w. fivi’. ‘ WW}. mt:- $153“; “Evie 2+k2]-k2} is ThisemrgymcreasemaynmexceedmeenergygapE'mmemisethenmwnducuvity willbedestroyed Thus,theintriudccolrerencelengtlréminterpretedasthemcan spachgbetweenpahofelecfiomfmagivenCooperpahmanbedefinedbasedonthe criticalvalueofthemodulatioanfi]. 11sz 11v].- §0 * 1’40 = r13: = 53'; wherek,isthehighestpossiblekvalue,andthecorrespondingvfistheelectronvelocity attheFermisurface. AmorepreciseresultgivenbytheBCStheoryis[55] §0=2UVFIKE8 . Enquaufizafionisanimportantchmacterisucofsuperconducfivitythat resuictsthemagneficfltnrtbroughaholeornon-superconducfingregionina superconductor disk to integral multiples of a quantity O, called fluxoid or flux quantum. Thismsfltcanbedefivedfiomtheexpressionfmsupercmrentdemflyjmmissecuon HiingratedalmgaclosedpathCJeephanmemondmtmrhgfiheresuhiswo becausethereisnosupercurrentintheinteriorofasuperconductor,i.e.[55,56] 16 _.c_’ 2 _°_’ . = iA-d-m.ITI {C(hve CA)d1 0 or 11ch0- (11 = {T’ch-dl . Integration of V0 along a path gives the phase change A0 from starting point to end point which has to be integral multiple of Zn, i.e. 21m, for a closed path. Applying Stock's theoremtoconvertthe integral ofA intoa surface integration over areaSboundedby C , yields[55,56]: Iii. ve-dr = 21mh = flea-d! = ‘5 I. VxA-ds = ‘6 LB-ds = °E . Definetheflraor’dOo a 2nllC/e’. Thetotal fluxtbthroughthesuperconductor ring becomes 6 =n(-2;fi) =nd>o . Thevalueofe'wasdeterminedtobeZebyexperimentaflymeasmementofO. This result ¢o=2nllC/(Ze) is in agreement with the electron-pairing theory. The flux quamizationisagoodexampleoflong-rangequantmnefi‘ectthatthecoherenceofthe superconductingstateextendsoveraringorsolenoid Under suitable conditions superconducting electron pairs can move from a supercondtwtmthroughammmulamrhyermtomomersupemonduamifthehyer thicknessissmallerthanthecoherencelengthofthesuperconductors. Thisphenomenon iscalledloseplrsorr srrperconductortrmnelr’ngflfl. Thisphenomenoncanbedescrrhed using the phase difi’erence, A0=01-02=A00-2th/li , ofthe particle probability ampfinrdesbetweenflntwosidesofthejmcfionwhereVandtarethedcvohage appliedacrossthejtmctionandtime. Thesupercurrentdensityacrossthejtmctionis[55] j = losin(A00 - 2eth 11) 17 Asaresult,thechoseplrsouefl'ecrreferstoadccmrentacrossthejtmctioninthe absence ofany electric or magnetic field, and the ac Josephson eject refers to a rf oscillating current across the junction with an applied dc voltage. The oscillation current basaangularfreqwncyc0=2eV/1i ,e.g. 1 uVappliedvoltage producesafiequency of 483.6 MHz This can be interpreted as that a photon ofenergy 110) = 2eV is emitted or absorbed when an electron pair crosses the biased junction. Besides the junction with insulator middle layer, i.e. SIS junction, the dc Josephon effect is also observed on junction with normal metallic middle layer, i.e. SNS junction. Josephson jtmctions, whichcanbeusedashighspeedswitchingdevices,arethekeyelementof superconducting electronic devices. This is due to the characteristic current-voltage relationwithtwowell definedvoltage statesch, whicharerelatedtothe energy gap by E.= e Vc , Figure 2[55]. A very important application ofthe Josephsonjunctions is the superconductor quantum interference devices (SQUIDS) which are used as high sensitivemagnetometers. TheoperationofSQUIDSisbasedonthemcroscopic quantum interference that is another example of long-range quantum efl‘ect of superconductivity. Similartothederivationoffiuxquantimtionfihetotalfltuttbpasses throughtheloopinFigure 3[55]isrelatedtothephasedifi‘erence goingoncearoundthe loop, A0, by A0=(2e/llC)d>. The phase difi‘erences caused by the magnetic flux at jtmctionaandbare cc /(11C)and-ed>/(liC) , respectively. Total current density j is[55] i=ja +11, =J'0[8in(490 + fl) + gin(M10 ‘ $11) J . . co = ZJomAOOcos-fé- . l I Voltage Figure 2. Current-voltage characteristic of a Josephson junction. Insulatora la 1 \ \ Insulatorb / / // —s i ©B W // / / F1311" 3' “MC quantlnn interference experiment setup 19 2.1.4 Type II Superconductors Most pure elemental superconductors are type I superconductor that show complete Meissner efl‘ect up to the thermodynamic critical field Hc , the critical magnetic field calculated from free energy balance, and becomes normal conductor in a field larger tlnn He, Figure 4(a). On the other hand, the type II superconductors, Figure 4(b), maintain complete Meissner effect up to the lower critical field He, and carries some magnetic flux between the lower and upper critical field; however, the zero resistance stateispreservedupto‘theuppercritical fieldI-IQ. Using the Ginzburg-Landau equation, the upper critical field H0 is related to the thermodynamic critical field Hc by[55] Hc2= Edema/(21:9), wherex=M§istheGinzbmg~Iandauparameten Forx<1/f2—,H°1lf2-, Ha>HcdefinesthetypeIIsuperconductorwhich shows completeMeissner efi'ect inweakmagnetic field, i.e. belowHa, andallow some fluxto penetrate regions in numalsmenmoundedbysuperwndmfingmauixmwongfieldiehetweenliamd 11°.ThetwocasesfmtypensupacomwmamcafledMeissnerstateandvonex state,respectively. Thedimensionofavortexcordcanbededucedfromtheabove equauonmbemtheorderofthecoheremelengthbecamethevorficesmepackedas closeaspossibleatI-Ia. 20 (8) HC - Type I 2.. 'T Superconducting Normal state 3% state He Applied magnetic field Ba —-> (b) Hc .. Type II 2.: ‘i Meissner Normal Vortex 8131: state L Hcl He Hc2 Applied magnetic field Ba —9 Figure 4. Magnetintionverses applied magnetic field for (a)type I and (b)typeIIsupereonductors. 21 Lower critical field Hc1 also can be related to the thermodynamic critical field I-Ic by[55] He] =11. / (flu) = so / (410.2). From the above two equations the thermodynamic critical field is the geometric mean of the upper and lower critical fields. For many type II superconductors, HQ is much larger than1-1c,i.e.x>>1/f2—,soHaisverysmall. Thepresenceofvortexstatecanbeunderstoodintermsofmterfacialenergy betweennormalandsuperconductingregions. Thisinterfacialenergyispositiveifxis smallandnegativeifxislarge. Thecrossoverfiompositivetonegativeinterfacial energy occurs at x=llf2—. The term vortex state describes the circulation of superchorfices,aromdthhmdsofmn—superconducfingmgionudthinthe superconductoreachbearingasinglefltntoid Thisconditioncanbeunderstoodby minimizationofmagneticenergyassociatedwiththevortices. Assumingasinglevortex with n fluxoids, i.e. Bat n 8.2 A At high temperatures, YBa,Cu,O.,,. loses additional oxygen (8 > 0) fiom the top andbouomCu-Ophnes,accompamwbyadecreaseoftheoxygenordennginthese planes. ThestructureonBCObecomestetragonalwhenSZ 0.7. Thechangeinoxygen content, and the orthorhombic-tetragonal phase transition are reversible with transition temperaturearound700 'C[64-70]. Thetetragonalphase is semiconducting, andthe firflyoxygenfledmthmhombicphaseismehlficandwpacmdmfingaboveandbelow Tc , respectively. The oxygen content in the orthorhombic phase is important because Tc increaseswithincreasingoxygencontentandreachesthemardmmnwithfig 0.1. 29 . h; k i n V o it v 1: ‘i O O 1| 0 ins; ‘. * O O Figure 8. YBCO unit cell 30 2.3.2 BSCCO System The high Tc Bi-Sr-Ca-Cu—O superconducting system has a number of phases with different critical temperatures (T c,). The three major phases are referred to by their cation ratiosas2201 ('I‘c below 77 K), 2212 (Tc~85K), and 2223 (Tc~ 110 K) phases[35]. The structures of these phases are very similar to the structure of (LaHer)CuO,. For simplicity the following discussion is based on the un-doped La,CuO, (La-Cu-O). Conventional unit cell of La-Cu-O contains two chemical formula units, i.e. 2(La,CuO,). SimilartotheYBCO imitcell,thiscellisalsocomposedofthreeperovskitecells; howeverthe top andbottom cells are displaced as shown in Figure 9. Similarity between theBSCCOphasesandLa-Cu-OcanbeseeninFigure 10. TheshrwhueonZOlphasecanbeobtainedbyinserfingtwopairsofBi-Oplanes intotheIa-Cu-OmuctmeandreplacingthelaatomswiththeSratoms,Figme 11. The La-Cu-Oand2201plnsehaven=landlowcriticaltemperatures. The2212suucuneisobtainedbysphtdngthecopper-oxygenoctahechonsand inserdngaCa-atomplaneinbetweenFigme 12. Itisclcarthatn=2forthisstructure. Similmly,the2223phasecmbedenvedfiomthe2212phasebyimerungmaddifionfl Cu-OplaneandaCa-atomplaneasshowninFigtne 13. Asaresultthe22238tructure hasn=3anch>100K TT-Ba-Ca-Cu-O systemalsohas2201,2212and2223phasesthathaveexactlythe samesuucnnesasthecorrespondingBSCCOphasewithTTreplacingBiandBa replacingSr. 31 Figure9. 2(La,Cuo,)unitoc11 32 BSCCO - 2223 BSCCO - 2212 3% 1 page»... 3......4 rm? 0 \ e \ ..lwihflm, (Mag-a BSCCO - 2201 51%499 .o a ... .sv...AP., A. efzaeznwre 5935331.. -. .233. 903:1} ... s....0. ..4 c.2295 3.. WV. ...,4. .47 . ....mwv Figure 10. Unit cells of 2(1.a,CuOJ and BSCCO phases BSCCO - 2201 33 La-Cu-O .' o m. u. Figure 11. Relation between crystal structures of LaZCuO. and BSCCO - 2201 34 a: $9104...-A at _’PC 4.. refinances... i. r. .A BSCCO - 2212 BSCCO - 2201 .1 ,n 4 . . ......H («Vow W. MW" 4." m... $1.7. 4 so . - waved» e»... e4. .4 Figure 12. Relation between crystal structures ofBSCCO - 2201 and -2212 35 agree _ - . ($4 . sneer... . .....1... he. dfi?€£&¥ nave»... . BSCCO - 2223 u o n . a O ... . 5. ... . . . ....eaeflgaez. .... Figure 13. Relation between crystal structures of BSCCO - 2212 and - 2223 36 2.4 High To Superconductor Thin Film Deposition Techniques Since the discovery of high Tc superconductors, many techniques, most of them from semiconductor processing, have been adapted to fabricate superconductor thin and thick films. Almost all high Tc superconductor thin film deposition techniques can be categorized as physical or chemical vapor depositions. Examples of physical vapor depositions are laser evaporation or ablation[3,5-23], plasma or ion beam sputtering[71-74], electron beam or molecular beam epitaxy[75-77], and thermal evaporation[78-80]. Examples of chemical vapor depositions is organometallic chemical vapor deposition[81]. All vapor deposition processes involve three major steps which are[82]: 1.Creationofvaporplnsespeciesbythermalenergy,photonenergyor kinetic energy 2. Transportofthevaporspeciesfiomsourcetosubstrate: Dependenton fliedepositiontechniqmusedthistransportcanocctuwithoutmuch collisions between atoms and molecules, i.e. under molecular-flow condifionorwithmanycollisionsinthevaporphasespecies,i.e. higherpartialpressureofthevaporand/orgasspeciesorsomeionized species. 3.Filmgrowthonthesubstrate:Dependentondepositionrateand mobilityofatomsespeciallyinthesm'faoeandnear-stn'face,theas depositedfilmcanbeamorphousorcrystalline. Increasingenergyof thevaporspecies(e.g.producingspeciesinexcitedstateorincreasing velocity of vapor species), increasing substrate temperature and/or bombardmentofthegrowingfilmbyiominthevaporspecieswill increasethemobilityofatomsonthegrowingfilm;thus,promote nucleation and growth of crystalline films. 37 Deposition rate, stoichiometry and crystalline quality are the most important parameters in depositing high quality superconductor thin films. The first parameter mainlydependsonthefirsttwostepsofthevapordeposifionpmcess;whilethe crystalfinequalitydependspfimmflyonthefilmgrowthstepoftheabovemodel. Therefore, itwinbemucbeasiertooptimizetheseflneeparametersifthreemajorsteps in the vapor deposition process can be independently controlled For all physical vapor deposition techniques mentioned above, these three deposition steps can, more or less, be independently controlled. On the other hand, in the chemical vapor deposition technique, itisdificulttoseparatethesethreestepsbecausethedepositionspeciesarecreatedright onthesurfaceofthe hot substrate, i.e. allthreemajorsteps ofvapor depositionoccurred s-ultaneously. Nevertheless, if complicated substrate geometry is necessary, chemical vapor deposition is the only non line-of-sight deposition method among all techniques mentioned 2.4.1 Pulsed Laser Deposition (PID) of Superconductor Thin Fihns: Amongthetechdqueswhichhavebeenadaptedmgrowhigthsuperconductor Mfilmgptnsedhserabhfionmmusedhserdeposiumisthemomfidelystudiedmd mostsuccessfulone. ThekeyreasonsforthesuccessofthePIDprocessareits stoichiometry conservation property, and excited high energy vapor species, i.e. excited andionized species,itproduced[42-46]. Becauseofthesetwoproperties, high quality epimxialfilmofwmpficawdcomposifionsmhasYBCOsuperconductm,canbemade insituatlowtemperatme(400-650°C)witharelativelylargedegreeoffieedomin processing parameters[4,12.14]. A collection of various PLD processing parameters, and properfiesofrenflfingfilmsuimethefimmdsuccessfiflPIDdeposifimofhigh Testrperconductingthinfilms[4])isshownonnextpage,Table 1. abusive-Eli's: Una-wounvochhu OIUpaa stun)! Iva-«lug! 1111er I. l 38 i l 2.1 Oz 8n 85.6.: §< 1 U< The. 83 Rodi. voo— E .5... solace: a: 3. 8 0: n. 8‘ 85.33 S. n: 2.8. sac...— e: at. a. I a: 8« on. 8.5:. 8» n.» 3.... E split-ices! 9 oz .2 8m 00: a a. v8.— .2. 832:5: latencies I 3 Oz .3 93 3F”; a 8.. — ...: =3 ... I 8 oz a. $4 an» on n. =8. «8 .2. s! 2.11.8?an all-J use... In I... re! ...-a s... .l ... E... ....5 .25. Inwr any 8" an. 85:. 8' a n «a E. :8 n. a an» 8" 8.. 3:»: 8' a a 3n _=_ 8...! 3.5.1 29!... 8.8!»? a is. at... s s... s1... s2 .....8. .. ...... 0.302. 3 an» o... 8" So 853 8' _ a man .2. I no a: o 2 Sn 8. 8.5:. 8' n n n...» E. I I 0: 8" 8c 35:. 8' n a n2 .... | 8 an» 8" can an» S ...n 8n .3. in. .8! I... also: :51. 8.51.1.1... 2:. l 8 E 8" 8m new 5 ed 8» .... a: a k an» 8" one an» S ...n .8 .... 2:.de 8 an» 8" 8c 35.» S ...n .8 .2. ...: h 5559.... at. a." a a 832 83:. 3.533 8-3 .4 8n 5. ME%. 8 a 8" n2 area .. ... a: an :2. a 8 E 8n on. Noise .. _ a: .2. seats. :3 c 3-. at. e 8 a: 8" one 82.: I a: .... ...-...... ...: c 2-. Salaam.— 8 E 8" 8. we. a: .... at. .4 a an... 8" one we. .. a: .— o1...- .. anon. 3 3.: 8. obs—S: .- ...-ol- oIial EeOod an» 8v 2... 82 i I a: .... a: .u 8 a: 8" one 353 a: n.» a: .8. aaamm it an» 2:. i i R. E. 35.9.. 8 a 8“ en. 35:. 2. n.» a. .— .- sl ass-allot... 853...: 8 >8». ...... 1:33.... ..l... «89:. 8 a a o By nor—Wasp. I1 n a. use... 0. .852 so... _ oooooo .0.. _ 8o.— «Eoiug aw- .aeoaoel. , tam—... annuals. uhgnnau «have Mun—.0.. He he 0 a b 5n...- L 833-. SIR—ice.— Eo-oclx. nun-8.9!. 2825.3 9588.5 08... .23 e838»! nee—u n.~.— .«o 8:83.:— ue- E2052!- ufiaoook— Gan Bot; .— 03:. 39 AtypicalsetttpforprnlsedlaserdepositiomFigme l4,consistsofapulsedlaser source, a vacuum chamber with optical windows, a rotating target holder, a heated substrate holder, and a source for oxygen gas or activated oxygen atoms/ions. Due to the fact that laser induced plume, i.e. the vapor species, ejected from the target surface movesmadirecfionmmalwthetargetsurface,thesubsuawholderisposifioncd parallel to the target and centered to the laser-target interaction spot Substrate distance from the target, typically a few centimeters, is critical because ofthemn-uflfomspatialdishibrfimoffievapmspeciesmddecflngenagyofvapm species as they move away from target. For a given deposition condition, the substrate distancealsoconu'olstheareacoverageofdepositedfilmonthesubstrate. Because stoichiometry is usually preserved during pulsed laser ablation process, a single stoichiometrybulktargetisnormallyused. Thetargetisusuallyrotatingatalowspeed toexposedifl‘erethsofthetargettothelaserptflsemmderwprevemlocal overheafinganderosionofthctargetlhisisbecauseoverheatmgwiflresuhm composifimalvmiafionofthetargetbysegregafionmdevaporafiommdmn-phmr targetsmfacewilldirecttheplmneawayfiomthesubsu'ate. 2.4.1.1 Effect of Pulse-Width and Wavelength of the Laser InserptflsesusedforPLDprocesstypicaflylmveaptnse-widthofabomtenma fewtemofnmoseconds,focusedwafewmiflimetersspotsizeonthetargeganda musoemrgydensityofafewJ/cm’Mpmdtmapeakpowerdensitymthemduof tenstohtmdredsofmillionWattspercm’. Duetoextremelyhighpeakpowerdensity mdexuemelyshondmafiomthehsuptnsesonlyaflemaveryflfinsmfacehyerofthe urgetandsponnncomlyconveflithnoavapormfiagmentswithomcomposifional variationorsegregation. Suchvariationmightbeexpectedfi'omexceasivemeltingofthe High ‘I‘c superconducting materials[4.83]. laser eam optiqglty/ w1ndow 'sufinfie _____———_. target ( .J D — l.— J 0% Figure 14. 'I‘ypicalpulsedlaservapordeposrtr’ 'onsetup 41 Although superconducting thin films have been successfully deposited with a wide range of wavelengths, i.e. from infrared CO2 and Nd:YAG laser to ultraviolet excimerlaser,highcstquahtymsimepitaxialfilmsamprodwedbyUVlasers. Thisis because shorter wavelength lasers have higher photon energy and greater absorption by the plasma plume resulting in a higher degree of decomposition, excitation and ionization of the vapor species by photoionization and other related processes[16,43]; thus, the qualityofdepositedfilmisenhancedbyincreasedmobilityofatomsnearthe surface of thegrowingfilm,Figme15.Deposifionusingmfraredhserswinnsuhmhigher absorptiondepthandhigberdepositionrate,butthequalityofdeposited frlmsare lower than films deposited with UV lasers[9, 16,84]. 2.4.1.2 Nature of the Laser Induced Plume Oncevaporspeciesformedbyinitialpartofalaserpulse,theyarefitrther decomposed,iodzedandheatedbyimemcfingwiththcremaininglaserpruse. Dueto rapklheeungmdwtpandmgofthehsermducedphmaanmplmnecmsistsof highenergyvaporspeciesejectedfi'omtbetargetwithveryhighvelocitiestowardthe substrate[42-46]. Impomntmfomafionabomhserinducedpltme,stwhasvapmspecies,pfinciple luminescent species, expansion velocities, and extent of ionization, lnve been determined by many groups using emission specuoscopy[43,45,46], mass spectrometry[44],andion probe[43]. 'I'heseparametersareveryimportamintermsof mdenmndingthePIDprocessandhnprovingproperuesofhserdepositedfilms. 42 I (all an) vvv'vviv'vvvavaI'vv amp—Hou- 1_ —4-t31 . 4 - n 1 1 1 - a a "" c v"" a"' ‘ 0‘ ..- "' ..................o 1 a" "U"... 4 . AAIAAI Innnalnnnnl-nnnl ” 1“ 1” u 250 a ‘. I I 1 mum . ° a-l-532nm . 0.0 - "ll-355:!!! ‘ I F . . ‘E at - > ‘ ' E ’ A ° 4 OJ '- ‘ . I .. u - . ‘ I I b I . I u 1 r “--.“ 13 I5 fl 1mm (K) ' ”1.0.14. 91‘. ~ .¢ ..w, -; .- Figure 15. PID onBCO on SrTiO, substrate using nm), 2nd harmonic (532 nm and 3rd harmonic (355 nm) of Nd:YAG laser with 3.5 J/cm power density, 200 mTorr oxygen and 730 °C substrate temperature ' fundamental (1064 43 Following characteristics of laser induced plume from high Tc superconductor target have been reported by several groups under typical deposition conditions, i.e. several Joule/cm’ energy density and a few tens of nanoseconds pulse-width l. Angular distribution of vapor species consisted of two distinct components. One of the components is non-stoichiometric and has a cos 0 angular distribution which is characteristic of evaporation; the other forward direction component is stoichiometric and has a cos'O to cosne dism‘bution[15,16.42]. The forward component increases with respect to the evaporation component as laser energy density increases[42]. 2. The major luminescent species in the plume are neutral and positively ionized atoms and dimers[43]. 3. By observing the change in the emission intensity oflaser induced plume, theplmneinitiallymdergoesaone—dimensional expansionforaboutone spotdiameterandthenathree-dimemional expansion, inwhichthevapor density rapidly falling ofi‘and the excitation diminishing[3,43]. 4. The expansionvelocities ofthevapor species are about 10‘m/s, andthe corresponding particle energies are in the 25-50 eV range. Relative velocitiesforCuandYareformdtoconfirmtheM‘“dependence predicted by vacuum fiee expansion model[13, 43, 45, 46]. 5.Degreeofionizationoftheplmneiscstimatedtobe 1.4-4 %ofionized speciesfiomintegratedionsignalandmassremovalperpulse,assming atomicspeciesonlyandacoseangulardismbutionofthespecies respectedtothetargetnormal[43]. This 1.4 -4 %ionization estimationis likelytobemuchtmderestimatedbecausethesharpcos‘Gtocosne distribution of the forward vapor component. 6. Plasmatemperatrneisestimateifromexpansionvelocityandlocal thermodynamic equilibrium, to be in the range of 6400-13000 K[43]. 44 2.4.1.3 Problem with High-temperature Post-Annealing Correct crystallinity and oxygen content is essential for good superconducting properties of the high Tc oxide superconductors. Low deposition rate in the order of anyfiomperlaserpulse,a®quatesubsu'atetemperatmeabom600to750°c,and suficient oxygen partial pressure of a few hundred millitorrs are important criteria for obtaininginsituhigthsuperconductingfilms. lfthese criteriaarenotsatisfied,the as-depositedfilmwiflmtbesuperconducfingorwiflnothavehigthandhithc (critical current density). Therefore, a high temperature, above 850 °C, post- ' is necessarytorestorethesuperconductivity. Carehastobetakentominimizethe following undesirable properties associated with high temperature post-annealing process. l.Chemicalrcactionwiththesubstrateresultingintheformationofa non-superconducting interface layer[5,85-87]. 2.1moffilmstoichiomeu'yafieranncalingduetoswfaceevaporationand film-substrate interaction[4,87,88]. Barium and/or copper deficiency has beenobserved afterpost-amrcaling process in YBCO films. 3. Crackand/orroughingdmingthermalcyclingresultinginlowcritical current densities[6]. 2.4.1.4 Methods to Improve Quality of Low-Temperature Grown Films Iowcdnsmmwmm.wmminsthcmmfinsmufiu.is flrekeymgrowingmulu-layercomponethhdifi‘erentmatefialsmtomtegratehigth variations of the basic PID process, i.e. plasma assisted PLD[10,46], dc-biased PLD[14], andatonficoxygenassistedPID[13],havebeensuccessfiulyabletolowertheinsitu 45 deposition temperature to as low as 400 °C[10], Figure 16. Reduction of the deposition temperature is made possible by creating reactive oxygen species such as atomic oxygen, oxygen ion beam, or oxygen plasma and/or by enhancing mobility of surface atoms with dc-bias or ion bombardment. 2.4.1.5 Problem with Surface Particles OnetmiquefeanneofPLDdepositedfilmisthepresenceofsm'facepanicleson otherwise smooth film surface. The formation ofthese surface particles has been attributed to sub-surface micro explosion caused by overheating of the sub-surface layer dminglaser-targetinteraction[3,89,90]. Korenetal fomdthatparticlesarefewerand maflerasthewawlengmofthehserdecreasemwmhigherabsorpuonofhseremrgy by the plasma plume and higher degree of fiagmentation in the vapor phase[16], FigurelS. Fmagivenhserwavelmgththesmfaceparficleproblemcanbeminfinizedby Mgmeabsmpfioncoeffidemmmcmalmufityofthemgegwhichm mesub-swfaceovaheafingandbyimprovmgmemmgthofmetugegwhichmcmses theresistancetoexplosion[91]. Increaseddensityofthebulktargetbysilveraddition, hserarfacemelfingmehprocesamhmisosmficpressmgaflPHsexpeaedmm thesm'faceparticleformation. Recently,Eidellothetal.reportedamethodtoremove surface particles by chemical polishing with diluted HF solution without degrading the superconductingproperties ofthe films[92]. (a) LIDIVL DflllVlOI Figure 16. (a)l’lasma-assistedPIDsetupvvith lO‘Torroxygenpressure drmngdeposifiomandCb)l?c-biasedPIDsempwdth200 mTorroxygenpressuredm'mgdeposition 47 2.4.2 Pulsed Laser Ablation Using Millisecond NttYAG Laser (ms-PID) Although high quality YBCO thin films can be obtained by using nanosecond UV lasers,thedepositionrateisverylow,typicallyafewangstromsperlaserpulse,andthe depositfimeacowmgeisverysmlhafewmminnddthduetothenmrowangmar distributions as sharp as cos'O to cos‘2 6[15,16,42]. On the other hand, high deposition ratesuptolOOnm/s[15]andalargetmiformdepositioncoverage,duetoabroadercose angular distribution of the evaporated species can be obtained by using millisecond pulsedlasers. 'I'hcsetmiquepropertiesmakemillisecondPLDapraeticalprocesstobe usedtoproducecontinuouscoatingoftapes. 2.4.3 Nd:YAG Solid State Laser vs. Excimer Gas Laser lasersmndsfmlighrwhficaionbysfimulaedauiafiouofmfiafiouthatis prodwedbprgaflumescmgmatefidmaopficalcmdtytypicanywmistedoftwo parallel mirrors facing each othcr[93], Figure 17. Usually both minors are coated to increaserefiectanceforthewave-lengthofthelaser. Therearmirrorisalmost 100% mflecfingandthefiomm,i.e.theouqnnminor,isparfiaflyuansmiuingwith reflectanceR<1toextractlaseroutpm Usually, the fluorescing medium is excited to higher energy state by optical pumping for solid state laser or by electric arc discharge, electric glow discharge, or microwave excitation for gas lasers. 48 reflectieficg outputmirror rcarmirror Figure 17. Basic laser cavity 'I'herearebasicallytwowaysbywhichatomsatexeitedstatescanradiate energy[94]. Oneisthespontaneousemissionprocessinwhichexcitedatomschangeto lowerenergystaterandomly. Fluorescentlightproducedthiswayisnotdirectionalnor coherent,i.e.consistsofvariousfiequenciesandphases. Theotherprocessinvolves stimulatingtheexcitedatomsbyanextermlelecu'omagneticfieldorlightfinthecaseof laser)oftheproperfiequency.Thisiscafleds1inmlatedmb-ion. Thisprocess prodtwescohemmhghtofflresamefiequeneyanddirecfionofpropagafionasthe stimulatingsource. Sincethesfimulatedemissionindrwesmomemissiomthcresultis amplification of the original light sigml. Figure 18(a)showstheenergydiagramofatlnee-levelopticallypmnpedlaser mdimegtriplyionizedchromimninarubylaser. Theactuallaseractioninvolves transitionsfiomlevetholevellthatproducephotonsofenergyhv. Theatomsofthe medittrnstr'onglyabsorbphotonenergy,hv,,ofthepurnplightandexcitetotheenergy bandatthirdlevel. However,this1evelisneverpopulated,i.e.thefi'actionofatomsin level 3 (n,) is approximately zero, due to nearly instantaneous non-radiative transition fiomthisleveltolevelZ. 'I'hethirdlevelisrequiredtoachieveanecessaryconditionfor ampfificafioncanedpopulaioniumsionthathefiacfionofatomsmleverz,n,,is 49 greaterthanthefi'actionofatominlevellmr Definingn=n,-n,,atgromdstate n,= n,=0,n,=1andn=-l;thepopulationinversionisattainedwhenn>0. Higher eficiency can be obtained with a four-level laser that has the ground level is far below the lower laser level or the level 1, Figure 18 (b). In this case, the lower laserlevelistmpopulated,i.e.n,=0,thus,anypopulationinleve12givesrisetoan population inversion. Therefore, it is not necessary to pump a four-level laser fi'om n = —1 to n = 0 before achieving gain. Moreover, the four-level laser medium never exhibits absorptionofthelaserlightitselfbecausen,=0. (a) (b) ,// / /,‘/_, ////// /,/ ///, /////////W/// hv'iia , // 1.71;" leve13 hm?” ZZ/C/y/W / ““13 rlevel 2 715W] 2 Imam 133“ hv-< 1”“ absoptitm em'nsion emision k level 1 we 1mm Figure 18. Energy diagrams of (a) three-level laser and (b) four-level laser Iftheopticalcavityisconfigmedconectlyandthefluorescentmaterialis homogeneous, multiple reflections are possible in the direction defined by the two cavity mirrors. Lightampfificafionoccmsifthegainduewsfimmatedemissionisgreaterthm 50 theabsorptionlossandtheoutputthroughfi'ontmirror. Whenthisconditionoccursthe laserissaidtooscillareorlasewithhighlydirectionalandcoherenthght 2.4.3.1 Nd:YAG Solid State Laser TheNd:YAGlaserwasdiscoveredhl961,anditisnowthestandardindusuial solid state laser. The active medium of Nd:YAG laser is triply ionized neodymium atoms, a typical four-level laser medium, which replaces some of the yttrium atoms in the host yttrium aluminum garnet, Y,Al,0n or YAG. Major components of a Nd:YAG laser head are shown in Figure 19, which consist of a dual-elliptical pump cavity, adjustable MandrearminomandtheopuonalQ-switchandnonlinear-crystalharmonic generator. 'I'helaserrodandflashlampsareenclosedinfirsedquartzflow-tubesfor directwatercooling coolingwater mm “he i. 1...... crosseddouble- \\ l l ularrzer \ \\t\\\\\\\\‘3\\\\\\\\\\\\\\\\‘li\\\\\\\\\\‘\\\\\\\\\\\\\\\\\\\\\\\\~‘I ................................................................. ......................................... » ...”...“un ..... ‘ x\\\\‘\\\\\\\\\V<\\\\\\\\\\\\\k\\\\\\\\\\‘\\\\\\\\\\\\\\\‘2\\\\‘Q‘b"».\§ ‘ Figure 19. Typical Nd:YAG laser cavity 51 In the long pulse mode, i.e. without Q-switch, the pulse-width is typically a few hundred microseconds to a few milliseconds which corresponds to the fluorescent life time of the laser medium and the duration of the excitation flash-light, respectively[95]. On the other hand, the Q-switched pulse-width is typically ten to a few tens of nanoseconds which is closely related to the cavity life time determined by the distance between mirrors and the reflectance of the output mirror[93]. 2.4.3.2 Excimer Gas Laser The term excimer stands for excited dimer, a molecule consisted of two identical atomsandexistsonlyinanexcitedstate,suchasHe,andXe,. Nowadays,excimeris usedtodescribeanydiatomicmoleculethatexistsonlyinexcitedstate,suchangBr, ArF,KrF,XeClandotherrare-gashalide molecules. Thefactthatthesemolecules exist mexchednatemakememgwdcandidatesaslasamediabecausemeydecomposesmm mbondedabmsafiertmsifionfiomexcitedstateandmmaficaflydepopulatethe lowerleveloftransition. Excimerlaserswerediscoveredinmid-l970s,andverysoontheybecame commercially available because existing transversely excited atmospheric-presstne camondiotddeiasethntdmmwomsmsomhiyweuwimmenewiydewiopediaset media. The major problem involved in this conversion is the halogen corrosion which hasbeensolvedwithhalogenresistantinternalcoatiny96]. 'I'helasermeditnnisamixttneof90-999ttofheliumorneonbufl‘ergasto facilitateenergytransfer,l-9%ofAr,KrorXeraregastoformexcimermolecules,and 0.1 -0.2% of F3, Brz, C1,, HCl, HBrorHFashalogen donor. Thelife time, typicallyin theorderoflO‘ahotsorafewhomsatZOOshots/s,ofexcimergasmixtureisveryshort. 'I'hisresultedintheproblemsofhighoperationcost,approximateSSOperchargeofgas mixnne,mdhandlmgofhazardsdischargedgas[97].1heexcimer1asemaresfifl 52 relatively new, and mainly used in research laboratory. However, with the recent development of large industrial excimer lasers in kilowatt range, the operation cost per joule of laser energy is expected to be lower[98]. Excimer lasers used for PID process typically have a wave length of 193 nm (ArF), 248 nm (KrF) or 308 nm (XeCl), a pulse-width of ten to a few tens nanoseconds, a pulse-energy of a few hundreds mini-joules. In this study, a millisecond pulsed Nd:YAG laser with 1064 nm wavelength was used. The advantages of using an thYAG laser over an excimer laser are as follows: First, high power Nd:YAG lasers can be easily operated at high repetition rate with high pulse-energygthusalargerdepositionratecanbeexpected. Second,ithasawiderange of possible output wavelength by harmonic generation, namely near-infrared 1064 nm fundamental, green visible 532 nm 2nd harmonic, and ultraviolet 355 nm 3rd harmonic. 'l‘hird,therearechoicesofawiderangeofoperationmodes suchashighrepetitionrate mode, long pulse (ms) mode and Q-switched (ns) mode. Finally, due to its solid state design,itdoesnothavecomplicatedmovingcomponents, suchashighvacuurnpumps, and,thereisnomdforexpensiveandcorrosivegases. 3. El 3.1T 3.1 3. EXPERIMENTAL PROCEDURE 3.1 Target and Bulk High TC Superconductor Preparation Both BSCCO and YBCO superconductors were prepared from high purity, at least 99.9% ptuity, single-metal oxides or carbonates. Initial grinding before calcination and intermediate mindings between multiple calcinations and final sintering were performed with a pestle and mortar. Afier initial crushing of large particles, methanol was added to form a slurry to increase the minding efficiency. Methanol was chosen as the minding medium to prevent possible degradation of the superconducting compound due to moisture pickup[99, 100]. 3.1.1 Pb-Doped BSCCO 2223 Superconductor Starting materials of Bi,O,, PbO, SrCO,, CaC03, and CuO were weighed and mixed to have Bi:Pb:Sr:Ca:Cu cation ratio of l.5:0.5:2:2:3. This starting composition is chosenfiomthenponeddanfmmardmizingthecfificaltemperatmecomidedngmat some lead loss may occur during laser calcination[38,40]. This powder was thoroughly groundwithapestleandmortartoensurethroughmixing. 3.1.1.1 Laser and Conventional Calcination obe-doped BSCCO The mixed fine powder was placed in a specially designed slow rotating pan and irradiated with a defocused pulsed Nd:YAG laser beam at two different power levels of 50 and 90 Watts, Figure 20. . 53 54 Beam Lens Shielding\ Gas , ozzle __W 7 o O l I \ l \ [T F J Figure 20. Laser calcination apparatus 55 Dminglaserfiradiafiomthepowderwasconstanflysfinedbyastauonaryvane attached to the rotating pan. Periodically, calcining powder was reground to ensure uniform laser-powder interaction. The average linear speed of the rotating pan with respecttolaserbeamwasabout25cm/s. A400WNd:YAGpulselaserwithapulserate oflOOpulses-per-secondandapulsewidthof2.2mswasusedduringallthe experiments. Thelaserbeamwasfocusedtoa4mmdiameterspot Thus,the pulse-energy density was 1 or 1.8 J/cm’, and the peak-power density was about 450 or 800 W/cm’, Table 2. chompafisomanidenficalbatchofpowdermixtm'ewasalsocalcined conventionaflyinafinnacesetat830°Cfor7homs Table 2. Calcining conditions of Pb doped BSCCO laser power pulse-energy peak-power density time (W) density (J/cnn’) (W/M’) (hr) sample A 90 1.8 810 0.5 sample B 50 1 450 1.5 sample C Conventionally calcined at 830 °C for 7 hours 3.1.1.2 Sintering obe-doped BSCCO mlasercalcinedandconvenfiomnycalcinedpowderswerepeuefizedudtha 0.5” diameter mold and a hydraulic press. One drop of amyl-acetate (CI-LCOOCJI“) per gramofpowdermixtm'ewasmedasabinderforbettergreenstrength. Thescpellets weresinteredat865 °Cinairfordifl‘erentdmatiom oflS, 50, 85,100,and240hours, thenfiunacecooledtoroomtemperauneatarateabomIOO°Clh 56 3.1.2 YBCO and Ag-Doped YBCO Superconductors YBCO targets with stoichiometric composition were prepared from high purity Y,O,, BaCO,, and CuO using conventional solid state sintering process. Finely ground powder mixture was firmly hand packed in a alumina pan for double calcination at 930 °C for 10 hours. It is important to pack the powder firmly because the calcination and formation of YBCO will be greatly accelerated The double-calcined sample was carefully ground and pelletized with molds of different geometry and a hydraulic press. One drop of amyl-acetate per gram of powder mixtm'ewasusedasabinderforbettergreenstrength Thesepelletsweresinteredat 950°C for36hours. OnlyYBa,Cu,0,phasewasdetectedinfinalsinteredYBCOtarget by using a x-ray dim'action method. SilverdopedYBCOtargetswerepreparedbycmshingYBCOpelletsandadding 16 wt% or 24.5 wt% of 99.9% purity Ag,0. Well-mixed powder was pelletized and sinteredat 850 °C for 12hoursplus 930 °C for 36 hours plus960 °C for48 hours. Only verysmallamormtofimpmityphasewasdetectedwithx-ray dimactionmethod 3.2 Substrate Preparation and Silver Thin Film Deposition Substrates for ion-beam assisted millisecond PID were metallographically polished polycrystalline silver (99.9% pure), commercial grade polycrystalline alumina substratewithS umsilvercoating,optieallypolished(001)ytuimnstabilizedzirconia (YSZ)and(001) YSZwith0.2 umsilverbuffer layer. Multi-layerAg-dopedYBCO/Ag tapeswerestartedwithaStoSO umlayerofsilveroncommercialgradefirsedsilica slides. Silver bufl'er layers of the ceramic substrates and silver layers of the multi-layered tapeswerepreparedbyconventionalvacmnnthermalevaporationM‘E). Atungsten 57 wire basket was used as heat source to evaporate silver chips of 99.9% purity onto room temperature substrate. The base pressure of the evaporator was lxlO“ torr. 3.3 Millisecond Pulsed Laser Deposition ARAYTHEON SS-500 SERIES 400 Watts pulsed Nd:YAG laserwasused This- laser is operated at the fundamental line of the Nd:YAG crystal, i.e. wavelength of 1.064 um,andhasamaximum pulse-energy of 50 Joules. The pulse-rateiscontinuously variable from 1 to 200 pulses per second The pulse-length, variable from 250 us to 7.2 ms, and pulse-shape, most often square wave or triangular wave, can be selected by reconfiguration of the pulse-forming-network of the pumping flash lamp. The square wavepulseshaveaminimumpulse—lengthofl.2ms,whilethetriangularwavepulses have a maximum pulse-length of 1.2 ms. Anadjustablebeamexpanderisusedtoexpmdthelaserbeamsizetoabom 10 mmdiamewr.1hisexpandedbeamisbentdownwardmthefocusingheadeqmpped wimacoaxialmmoctflmmicroswpethatisahgnedwiththehsubeamandusesme laserfocusinglensasobjectivelens. Thisconvenientmicroscopecanbeusedtoaimthe targetandtoinsituobservethelaserirradiatedtarget. 4"or8”Plano-convexlensmade ofUV-gradefirsedsilicaisusedtofocuslaserbeamontothetarget. Figure21isasketch ofthelaserbeamdeliverysystem. 58 Monocular Safety Shutter n == 1.06 um Absorption :MW Filter Nd:YAG —’~.——-- l W Mirror Control S Expander .... F . Lens Work Piece Figure 21. Laserbeamdelivery system 59 3.3.1 Plasma assisted PLD Apparatus 3.3.1.1 Plasma Assisted PLD Chamber The design and consti'uction of the PLD vacuum apparatus were a major undertaking ofthis research project The preliminary results ofthis research were gatheredwithavacuurnchamberthatisconvertedfi'omasectionofanoldHitachi transmission electron microscope, Figure 22. This chamber has an internal size of4" diameter by 4" high, one 3" diameter fused silica optical window and three 3" diameter accessory ports on the side. Normal O-ringsareusedthroughoutasvacuumseals. Ahalfinchbrassplatewasmachinedtocoveroneoftheaccessoryportto fadfihtewldefingmbmzingofgasifletandcoppermbefmelecuicfeed-mrough. Oxygenisinuommmthechamberbyallvcoppermbmgthroughthebrassphw withavacmnnsealformedbysoldering. Oxygenflowintothechamberiscontrolledby aneedlevalveandmonitoredwithaflowmeter. Theelectricfeed—throughwasmadeby embeddingsixcopperwiresinbakeliterodwithtwoO—ringgroves. A3/4”almninmnplatewasmadetosealthebottomofthechamberandtomotmt PLDparts. Anl.5"diameteropening,onthetopofthechamber,withanO-ringgroveis adoptedtoanopticalwindowtodeliverhighenergylaserpulses. 3.3.1.2 Target and Target holder Arotationtargetholderisdrivendirectlybyadcmotorinsidethechamber. A speciaflydesignedfom-piecemoldwasusedmpmducebulkYBCOtargetfings, Figure23. Targetringsinsteadofmoreconvenfionaltargetdiskswereusedtomaximize targetstufaceutilizationandtopreventtmevenetchofthetarget. Figure22. PLDchambermedforpreliminarystudy 61 Figure 23. Specially designed mold, and YBCO target ring produced by using this mold 62 The uneven etching of the target will result in misdirected plume, i.e. the evaporated species, because laser induced plume always ejected perpendicularly to the target surface. This concern is especially important for millisecond-PLD process due to much higher target material removing rate compared to nanosecond-PID. 3.3.1.3 Heated Substrate Holder Substrate holderwasmade ofstainless steeltoholdthe substrate of20mmx 10 mmsize.1hewbsuateheaterwasphcedmthemrbsuateholderdimcflybehindthe substrate. ThisheaterwasmadebywindingFe—Cr-Alalloyheaterwireonagrooved alumina blocktogetashighas650 °Csubstratetemperatm'e. 3.3.1.4 Oxygen Plasma Generation Intenseoxygenplasmawascreatedbyapplyingmosciflafingdchighvoltagew thesystem. Thehighvoltagepowerisgeneratedbyusingastep-downtransformerthat converts110V60Hzacpowerinto6Vor12Voutputupt010A. Thisoutputis convertedinto lZOHzoscillatingdccmrentbyafull—wave diode-bridge. Aautomobile ignitioncoilisthenusedtostep-upthevoltagetoapproximatelylKV. Becausethis Mgnexceedstheorigimldesigneapabilityofthehighvoltagecoil,itiscooledbya copperwaterjacket. Ibeiflfialdesignconsistedofasflverudre—lmpanode,mdmecathodecomisted ofthetargetandsubstrateholders together, Figure24 (a). Figure 25 shows pictures of thedepositionapparatusdmingadepositionprocess. Ba 25.3 . 53 é a: 9E 8.3.. . as, 3 .58 3.. uses. Ea: .3 23: 63 ’7.” . mi “......“ ..m o £85.33 33 3.8... a gown“ am 2:38 337. Ntmaa _ m Emma ..me Emma .83. A6 . any Figure 25. Plasma assisted PID chamber (a) with the laser head and (b) close-up view plasma to the 3.3.2 1 MP5 for a tilt: 65 lawnafitsedsihcambewiththreesflverwireloopelecuodeswasusedmstead of the original single wire-loop anode, Figure 24 (b). This is to confine the oxygen plasmatotheareabetweenthetargetandsubstrate, andtoreducethetarget heatingdue to electron bombardment 3.3.2 Plasma Assisted Millisecond PLD Process (PPID) Table 3 lists the important processing parameters. The chamber is pumped with a two-stage mechanical pump to get a base of about 20 mtorr. The vacuum requirement formillisecondPlDisnotasstrictasfortheconventionalnanosecondPIDbecausethe totalprocessingtimeismuchshorterduetoordersofmagnitudehigherdepositionrate. Ihechamberwasflushedwithptueoxygenseveralfimesafiermitialptmpmgto diluteresidualair. Dmingdepositionprocessastreamofoxygenfloweddirectlytoward thesubstrate,anda250mtorrofoxygenpressluewasmaintained Table 3. Important Processing Parameters for plasma assisted PLD PROCESS PARAMETERS Wavelength 1064 nm Pulse Width 2.2 ms Repetition Rate 2 pulses / s Spot Size on Target 15 mm2 elliptical spot Pulse Energy Density 40 J / cm2 Peak Power Density 18.18KW/cm2 Substrate Temperature 500 °C Target to Substrate Distance 3.5 cm Chamber Pressure 250 mtorr of oxygen Target Material Conventional sintered YBCO ring with near stoichiometry composition Post-Annealing $00,600,850 and 940 °C in air or oxygen 66 Laser pulses used had 6 joules per pulse pulse-energy, 2.2 ms pulse-width, and the repetitionratewasZpulsespersecondwps). Theselaserpulseswerefocusedtoa 15 min2 elliptical spot on the target. This spot size was chosen to cover the entire width of the ring to prevent uneven erosion of the target, Figure 26. However, the maximum peak power density was restricted below 0.02 MW/cm’. The resulting pulse-energy density and peak power density were 40 J/cm2 and 18.18 KW/cm’, respectively. Figure 26. A YBCO target ring alter deposition process 3.3.3 lt Mb: flmb mcch mach 3.3.3 6‘11 five- 55’ 67 3.3.3 Ion-Beam Assisted PLD Apparatus Due to the 0.02 MW/cm2 maximum peak power limitation, and the target overheating problem, designing of a flexible material-processing chamber was initiated Thegoalwastodesignanapparatusthatcouldsolvethepresentproblemsandwas flexible enough to be adopted to solve future problems. Tominimizethecostanddevelopmenttime,standardhighvacumnand mechanical parts were used whenever probable, and all other parts were modified or machined right in the laboratory. 3.3.3.1 Ion-Beam Assisted PLD Chamber Thechamberbodyisastandudsminlesssteelhighvacmmfive-waycrosswith 6'mbediametermd8”standardwnflatflanges‘.1hedistamefiomthecemerofthe five-waycrosstoeachoftheflangeisapproximately6.5",Figme27. 'I'hetopportandtheportontherightarecoveredwithstandardS"to4l/2" nducingflangesthatacceptstandardpermanenflysededoptiealvieWponsor customizedadapters for standard 3" diameterand 1/8" thickness optieal window blanks. AllotherthreeportsarecoveredwithstandardS"blankflanges. Iaserbeamisimroducedintothechamberthroughthetopponandasmaflhole onthestainlesssteellining. Theliningisapieceofthinsheetthatcoverslefithrough righttubesectionstoeatchdebrisfiomms—Plerocessandtolimitdebrisenteringthe top, fiont and rear sections ofthe chamber. " AllhighvaeuuncompormareobtainedfromtheKutJ. LaskarCompany,ClairtonPA 68 Figtue27.’l‘heion~beamassistedP1Dchamberandthelaserhead ‘0 oi mov lens Slit, 69 The mechanical pump is connected to the chamber through a high gas conductance brass right-angle high vacuum shutoff valve, with 1 1/2" bore, Viton O-ring bonnet and seat seals and bellows shaft seal. A brass needle venting valve and a stainless steel thermocouple gauge tube are located close to the chamber on the 2" brass tube connecting the front port of the chamber and shutoff valve. The thermocouple gauge is connected to a JC CONTROLS model lOOTC controller with one set point and a bargraph display of vacuum from 1000 to 1 mtorr. The right port with an optical window is used for process observation Figure 28 is a sketch of the chamber arrangement, which shows the penning ion gun, the heated substrate holder and the x-y target manipulator, viewed from the right view port. 3.3.3.2 Spatially Resolved Emission Spectrum Analyzer Figure 29 is a sketch of the spatially resolved emission spectrum analysis setup. Alemisusedwimagethehsermdmedphmethroughtheobserwuonwindowmwme entrance slit of a optieal multi-channel analyzer (OMA). This imaging lens is mounted masmndardlemholderthatpermitseasychmgeoflenseswithdifi‘erentfocal lengths toobtaindifi’erentfieldofviewandspatialresolution. Aprecisionlinearslideisusedto movethelensmountforfinefocus. Acubebeamsplitterisloeatedbetweentheimaging lensandtheOMAslittosendapproximatelyhalfoftheintermityupwardtothesingle lensreflex(SLR)camera. Theopticalpathdistancesfi'omtheimaginglenstotheOMA slit, andthe camerafilmplaneare settobethe same; therefore the plumeeanbefocused throughthecameraviewfinderandrecordedonthefilmforfmtheranalysis. Alloptical componentsexceptthecameraammadeofINgradefirsedsflica(veryofiencafled "quartz”)topreservetheultraviolet spectrum. Theemissionspectrmnanalyzersetupis placedonastablecartwithadjustablehigh,andtheoptiealcomponentsaremountedon anoptical rail for precision alignment, Figure 30. 7O optical window-q % l l Nd:YAG: rue:- bum — _-__1- l l l l l l l L l l l I l l l I l I cathode 1 anode : substrate | I ..heat er with -—=- , ,I ran be radiation III ' ' , : shield gas i I Panning Ion Gun tpulator Figure 28. The ion-beam assisted PID chamber viewed from the right view port .Eaasiaafisesiaaeiaaeziasaga: 71 ampu__gm Emma ease Needy: :2. cenm_nc0 .occmmo - I.p_:E _ _au_uao w\"/ <20 _\B_ R wngmu EEmm '72 Figure 30. Spatially resolved emission spectrum analysis setup with PLD chamber 3.3.3.3 ( 15' die draw them and th: in the feed‘ tll 73 3.3.3.3 Oxygen Ion Gun AsketchofthehomemadepenningiongunisshowninFigure31. Asectionofa 1.5" diameterfirsedsilicatubeservesasthebodyof the iongun Major components of thegunaremadeofbrass. Teflonandaluminaareusedaselectrical insulators. Vacuum seals are formed using heat-resistant silicone O-rings. When high voltage is applied to the gun under proper oxygen pressure, glow discharge occurs between the cathode plates andthecylindricalanode. Theoxygenionbeamisextractedfromthegunthroughahole inthefrontcathodeplate,Figme32. Theiongunismomrtedinsidethefi'ontportwiththehighvoltagefeedthrough andtheoxygengasfeed through mountedonthe flange, Figure 33. Thehigh voltage feedthroughwich3/4”conflatflangehasfomcopperconductorsthatareeapableof carrying75Aat5KV. 'I‘heoxygengasfeedthroughhasonell4”stainlesssteelmbeand all/3"conflatflange. Aprecisionneedlevalveisusedtoconuolthegasflow. The mdlevalveandtheiongmmeconnectedmthefeedthroughusingstandardbrass compression fittings. _-_;u 2 brass electric feed-through 6,11,18 teflon insulator 9,12 alumina insulator 10 optional magnet 16 bras protective ring 17 fused-silica ion gun body 1,4 teflontube 3,8,15 O-ring 5 brass end cap 7,14 cathode 13 anode Figure 31. Penning ion gun Figure 32. Penning Iongunatwork 76 Figure 33. Penning ion gun mounted on the front port flange 3.3.3.4 H in safe Figurei tinge Met high VI control of a: mid Si 2' 77 3.3.3.4 High Frequency High Voltage Power Supply A high fiequency high voltage is chosen to power the oxygen ion gun to increase thesafetyoftheoperation. Thisisduetothereasonthathighfiequencycmrentis confimd to a very thin surface layer ofa conductor. The high frequency high voltage power supply is based on a TCL4 PLUS high frequency high voltage supply parts kit furnished by INFORMATION UNLIMITED‘. Figure34 isthecircuitdiagramof the modified high voltage power supply. TheNPNuansistorQlissettooscillatebythefeed-backwindingofthehigh voltageuansformer,andtheoscfllationfiequencyissettobe10t020Kl-Iz Output wltageiscontofledbyavmiableresisththhroughaconfiol-tansistorQBanda poweruansisth2thathmimthecmrentmroughthteandthepdmmywindingof high voltage transformer. Two high power 2N3055 transistors and one T1P31 power uansistorareusedtoreplacetheofiginalpoweruansistorsQlandQZ,andthe control-transistor Q3toincreasethereliabilityandoutput of the circuit“. Performance ofthecircuitisfin'therirnprovedbyfancoolingthetransistors. Themodifiedcircuit providesapproximately40Wattstotheprimarywinding Thisgivesapproximatelyl KVandafewtensofonutputatthehighvoltageside. Tofiuthernrcreasetheoutpm,aseparatecirctntconsistedofa555TlMER oscillatoratZOKHLanda120Wattspoweramplifiereanalsobeusedtopowerthe ‘ Normation Unlimited, Box 716, Amherst NH 03031 " Radio Shack Electronics Store 78 3&3 BEE ems—e» 52 85.62.. .35 .3 95mm 4|. evoca o» 03033.9 on v0 u... r «5 ma :8 n «a u M .1 e. "I .. 4.. e M no _.- e r. om . In ..wt: ... 3 '_r m momaom mmm M F: L “ .532. b " >3“; _ a. +. e“ m V m 3 o 533%: u. n 5.3.. Soiu Q a»... on" AHVHIHd mummddnm mmzonm >I 3.3.3.5 Ihche: mdal: Figure holder With 2 by a b Molt feed-1 CNS- 00111! “m2 ma with 79 3.3.3.5 X-Y Target Manipulator and Heated Substrate Heater Left port of the chamber is used for specimen exchange. The specimen stage, and the heated substrate holder are mounted on a 8" flange that rides on rails for easy access and alignment. A picture of this setup, with the substrate holder removed, is shown in Figure 35 (a), and the heated substrate holder is shown in Figure 35 (b). Anx-ytargetmaniprflatorisusedinsteadofamore commonrotatingtarget holder,mgenerateazig2agareascammgthatfiulyufihzearectangulartarget surface with any beam spot size. The x-y manipulator is designed to have a low profile, and resembles a typical sample stage of a scanning electron microscope. Each axis is driven by a bellows sealed linear motion feed through Two stepper motors, SLO—SYN #MA61-FS-62019‘ with 200 steps per revolution resolution,and6002-innormalholdingtorque,areusedtodrivethelinearmotion feed-throughs through telescopic double universal joints, NORDEX CMX-Al-l and CNS-Al-l“, to accommodate linear motion and axial mis-alignment. The stepper motor controller is built around two single-chip stepper motor controllers ( HURST MFG. CO. NO. 220001‘“ ), and the scanning pattern is generated using a 556 DUAL-TIMER and six position switches. Substrate heater is made of four layers of F e-Cr-Al strip heating element enclosed maalmnmaboxwiththinalummasheembetweenthelayem.1hisheeteriscovemd withsilverandhasfomstainless steelboltstoholdthesubstrates. Astainless steel radiation shield is used to reduce chamber heating and to increase heating efficiency. '6 and H Sales Co., 2176 E. Colorado Blvd, Pasadena CA 91107 " Nordex 00., 50 Newtown Rd, Danbury CT 06610-6216 ”' Hurst MFG 00., Box 326, Princeton IN 47670 80 Figure 35. (a) Low profile x-y target manipulator and (b) Heated substrate holder 81 3.3.4. Ion-Beam Assisted Millisecond PLD Process (IBPLD) An8"quartzlensfocusesthelaserbeamtoanellipticalspotabout1mm’insize onthe target at 45° to the laser beam Laser induced plume is ejected perpendicularly fromthetargettowardthe substrateatadistanceabout3to3.5cmfromthetarget. Substrates were held at 650 to 750 °C for IBPLD during deposition by a resistance heater. On the other hand, the deposition temperature for the multi-layer Ag/YBCO composites were 200 to 250 °C. This is to prevent peel-off of the tape from thesubstrateduetothermalmis-mathIOl],andyettoprovide enoughtemperatureto achieve a good adhesion of YBCO film on the silver layer. Dmingdeposiuomthechamberwaskeptat100to300mtorrofoxygenaftera ptmpdowntoZOmmnbasepressme,andflushedwithoxygensevemlumesmfiiany. Fmtheiombeamassifleddeposifiomastemofoxygeniomgenmfledbythepenfing iongmopuatedataboleV,wasusedtosupplyacfivatedoxygentotheplumeand growingfilm. Figure36showsthelaserinducedplumeandtheoxygenionbeam with 40 J/cm’ pulse energy density, 250 us pulse-widthand 300 mtorr oxygen pressure. Important process parameter for IBPID films and VTE / ms-PLD multi-layer tapesarelistedinTable4. 3.4 Post-annealing Sineetheas-depositedPPIDandIBPlDfilmsandtheYBCO layersofthe multi-layer tape were not superconducting, post-annealing was required TheplasmaassistedPLDfilmswereannealedat500,600,850and940°Cinair oroxygenfordifi‘erenttimes. FortthBPIDfilms,thepost-amlingwasmadeat 850°Cfor30t0120minutesinair. Inssoffilm,especiallyfiomthecomersandedges ofsmples,wuoccesimallyobsewedThiscanbeprevMedbycmefingmefihthha piece Tab? 82 piece of YBCO sintered bulk during annealing. YBCO/Ag multi-layer tapes were annealed in a YBCO box at 855 and/or 905 °C for 10 to 60 minutes in air. Table 4. Important Processing Parameters for IBPLD Films and VTE / ms-PLD Tapes PROCESS IBPLD FILMS VTE / ms-PLD TAPES PARAMETERS SILVER LAYERS (VTE) Heat Source I —- tungsten wire basket Evaporator Base -- 1x10" Torr Pressure YBCO LAYERS Wavelength 1064 run 1064 nm Pulse Width 0.25 - 2.2 ms 0.6 -2.5 ms RepetitionRate 2pulses/s lor2pulses/s SpotSizeonTarget ~1mm’ ~1,3.5,or7mm2 PulseEnergyDensity 40-28OJ/em2 60-300J/cm2 PeakPowerDensity 0.12-0.32MW/cm2 0.05-1MW/cm2 Substrate Temperature 650 - 750 °C 200 - 250 °C Target to Substrate 3.5 cm 3 cm Distance ChamberPressure 100to300 mtorrofoxygen 100to300 mtorrof oxygen GrowthRate 2.5nm/s 2-50nm/s Target Material Conventionally sintered conventionally sintered YBCO with near stoichio- YBCO, 15% Ag doped metry composition YBCO, 23% Ag doped YBCO Post-Annealing 850 °C for 30 to 120 min. 855 and/or 905 °C for 10 in air to 60 min. in a YBCO box 83 Figure 36. Laser induced plume and oxygen ion-beam 3.5 Sample Characterization Methods 3.5.1 Crystal structure and Phase Identification X-ray dim-action (XRD) method was used to study the crystal structures, to identifyphasesandtocontrolthepost-annealingprocess. CuKaradiation, obtainedby using a Ni filter or a double-crystal monochrometer, and a computer controlled dimactometer (Scintac-XDS-ZOOO difl‘ractometer, Scintag Co.) were used As sintered or as depodted surfaces were used most of the time; however, mechanically polished surfaces were also examined occasionally to isolate any possible surface efl'ects such as surface texture and surface composition variation 3.5.2 Microstructures and Chemical Compositions Merosmwnuesweresmdiedusingbothopticalmieroscopeandscaming electron microscope (SEM). Samples for optical microscopy were metallographically pofishedfoflowingstandardprocedmesusmgemerypapermdaltmimpowderof various particle sizes. Small samples were hot mounted with bakelite before polishing. Methmolwasusedasthegrindingmedirmmpreventmoisuuepickupandposmble degradationofthesuperconductors. Scanning electron microscopy was performed directly on diamond-saw cut smfacesmfiacuuesmfacesfmbulksamples,mdmpmnfacemfiacnuecross-secfion for films and tapes. Samples were ultrasonically cleaned in methanol and mounted with copperconductingtapeorsilverpaint Averythinconductingvactuunevaporated coatingofPt-Pdwasusedformicrostructmeobservationofasdeposited non-superconductingfilms. 85 A Link energy dispersive x-ray spectroscope (EDS) attached to the Hitachi S-2500C scanning electron microscope was used for chemical analysis. EDS quantitative analysisofthecafionswasmadepossibleusmgcahbmfionstandardsandtheZAF software supplied with the system. The backgrormd noise calibration and processor gain calibration were performed using Au Lal line at 9.711 KeV. The standards have to cover all elements analyzed and have to be as close as possible chemically to the unknown sample. For YBCO samples, a sintered stoichiometric bulk was used as a standard due to non overlapping strong emission lines, i.e. Y L-lines, Ba K-lines and Cu K-lines. On the other hand, four different oxides, SrCuO,, Ca,PbO,, Bi,CuO4 and CgCuvaemusedasstandmdsfmthePbdopedBSCCOdtwmoverlappedemission lines. Achestandardswerepreparedfromhighpmitymetaloxidesorearbonatesby whdsmtesimmngprocesssimflumtheprepamfimofbmkhigthmpemondmtom. Allstandardswerecalcinedat600°Cfor15hand750°Cfor3 h,followedbysintering at900°C for48hexceptforBi,CuO,whichwassinteredat800°Cfor2h Final compositions of the standards were determined by ion coupled plasma (ICP) analysis. 3.5.3 Electrical Resistance and Magnetic Susceptibility Measurements Resistancemeamuemmwemperformedusinganamo-balancingacbfidgewith a lock-in amplifier (Linear ResearchLR-400) with a standard four-probe technique. This bridgeiseqrfippedwithamrnualinducmnceopuonthatallowsthismsuumemm firnctionasanauto—balancingmutualinductancebridge. Thus, the mutual inductance, whichisproporfionflmtheumagneficsuscepubifityofmem-phasecompmemQGcm bemeasureddirectly. Thisbridgehasanadjustableexcitationcmrentfiom 1 uAto3 mAandresoltuiomoflmicro-ohmandlmicro-hemyfmtheresismnceandmtuual inductancemodesrespectively. Figure37isawiringdiagramforbothresistanceand mutualinductaneemeasurements. LR—4OO auto-balance 4-wire resistance and mutual inductance bridge precision voltage [selectable constant J [ range selectable J on sampler current AC excitati +—; IIT G 06) \/V\/\/\/\AW\/\/\/\/\/\/\/\/\/J sample sample mutual inductance setup resistance setup Figure 37. Wiring diagram for both resistance and mutual inductance measurements up .mmhun m 87 Figure 38 is a sketch of the computerized resistance versus temperature ('R-T) measurement setup. Four-point contacts are formed by sandwiching four rectangular gold-coated wire-wrap pins and the sample between two bakelite blocks and two poly-vinyl chloride (PVC) blocks. The rigid bakelite outer blocks are used to insure uniform clamping pressure on the four pins, and the deformable PVC inner blocks are used to accommodate the thermocouple and slight variation of the pins and sample thickness. The sample is cooled by inserting the whole clamp setup into a half filled liquid nitrogen dewar, Figure 39. A very stable cooling can be achieved in the liquid nitrogen vapor to within 10 K ofthe liquid nitrogen boiling point The cooling rate ean be increasedbydecreasingthedistancefiomthe liquidnitrogensm'faceorbyincreasingthe heaterpowertocreetemorevapor. Amanual laboratoryjackorasteppermotor driven linearmofionthreadedmdisusedtoconfiolthedistancebetweenthesample clampand the liquid surface. For temperature close to 77 K, the sample clamp is completely submergedinliqrridnitrogenandthenslowlyliftedoutofthe liquidnitrogen Figme40isasketchofthemagneticsuscephbilitymeasmementdeficethat consists of induction coils, specimen holder with thermocouple, and liquid nitrogen deliverysystem ThecircuitdiagramisshowninFigure 37. WhentheacexcitationcturentwasappliedtotheprimarycoilmadeofBOOO turns of #32 AWG magnet wire, it produced a uniform magnetic field around the secondarycoilsmadeof2000nnns#34AWGmagnetwireeach Intheabsenceofa magneticmaterial,theacvoltageinducedbythesamplesecondarycoil exactlycancels theacvoltageinducedbythereferencesecondarycofl.However,anon—zero signalis proportional to the magnetic susceptibility ofthe sample ifa magnetic material is present in the sampling coil. 88 computer data acquisition system mm four-wire Ac . . resrstance mes bridge , w/ 001ng ‘ thermocouple current probe(+) current WONG) vow voltasc probe (-) nylon Au I high T083319]: bolt probes PVC bloc; Bakelite block ILJJ thermocouple IL...” IL.” Figure 38. Computerized resistance - temperature measurement setup 89 H “6" D: motor , . J // s L _] V .— L H H... F A - V -porfit’p'robe to the resistance liquid N; bridge and data @/ l 0386! l'i H I“ Figure 39. Cooling device for resistance - temperature measurement 90 9 FINE; 5 i“ ’ I U" ‘ ’ III/II/I/IIIIA ,0 ,WI/I/I/I/IA 'Illlllllllfl: :1. Fill/Illlllll 0 br 3? pus ' ii nylon . . 51’ng g; push- liquid N; Eu tube reservoir 1* g}! 5ng primary :5: excrtatron a _ coil \ Figure 40. Magnetic susceptibility measurement apparatus cooled b control-i sample hacigro 3.5.4 Ft 91 To obtain the temperature dependence of magnetic susceptibility, the device is cooled by liquid nitrogen After the temperature is stabilized, the liquid nitrogen level control-valve is shut to let the temperature rise slowly. Temperature and mutual inductance are continuously recorded via a computer. A reference curve, with an empty sample holder, is collected before each sample curve as the background. The background is deducted from the sample curve to get the final result. 3.5.4 Four-Point Bending Test The mechanical strengths of YBCO and Ag-doped YBCO targets were compared using a four-point bending test. Figure 41 shows the four-point bending device. The dismebetweentheomersupponsa)is20mm,andmedisMncebetweentheimer supports(a)i810mm. Rectangularbarspecimemof6mmwidth(b)and2.5mmdepth (d)wereused ThemodulusofntptmeMORfistheflexmalsuengtniethefiacnue strengthofamaterialtmderbendingload. Forfour-pointbendingMORequals 3P(L-a)/2bd’. Sets of five samples each fiom YBCO and 15%Ag-doped YBCO were testedtodeterminestrength. 92 Figure 41. Four-point bending setup 4. RESULTS AND DISCUSSION 4.1 Factors Which Affect Processing of Bulk YBCO Superconductors It was found that careful wet grinding and firm hand packing greatly accelerates the calcination, and formation of the YBCO compound. Furthermore, higher purity of starting oxides and carbonate, i.e. purity of 99.99% or better, also enhanced the formation of the YBCO compormd over the 99.9% purity starting chemicals, Table 5. It was also found that powder preparation before final sintering affects quality of the sintered superconductor. Highest green density was obtained with well crystallized YBCO powder, i.e. powder with shiny black particles. 4.2 Laser Calcination and Kinetics of Formation of BSCCO - 2223 Phase Since the discovery of superconductivity in this compound[31], many efforts have been made to maximize the amount of high Tc - 2223 (110 K) phase. A major enhancementintheformationofhigth-2223phasewasmadebydoping Bi-Sr-Ca-Cu-O compound with Pb[32-36]. However, with Pb doping, about 200 hours of total processing time is required to obtain a single or nearly a single high TC phase. 4.2.1 Kinetics of Formation of BSCCO - 2223 Phase It has been shown that addition of Pb enhances the formation of 110 K (2223) phase in Bi-Sr-Ca-Cu-O system because of kinetic reasons[32]. It has also been shown that formation ofthe high Tc phase can be enhanced by melt-quench method with Ca and Cu rich starting compositions[ 3 7] . 93 94 Table 5. Effect of starting powder purity and powder compaction on formation of YBCO 99.9+% starting chemicals 9999+ starting chemicals loose jOWdCl' firmly hand packed power color of bulk pale green dark green dark geen bonding and loose powder very weakly bonded weakly bonded 930 °C shrinkage 7 hf X lineissn bulk no no no effect wden no partially and very partially mixed of weak strong and weak color of bulk green very dark green dull black bonding and loose powder weakly bonded and no strongly bonded, 930 °C shrinkage significant shrinkage shrunk significantly 7 hr X 2 but crushed powder is and crushed powder notflufl‘yeasytopack iseasytopack meissner bulk no weak weak efl‘ect rowder no morethanhalfis morethanhalfis “098 strong color of bulk dark green dull black shiny black bonding and very weakly strongly bonded and strongly bonded and 930 °C shrinkage bonded shrunk significantly very hard to crush 7 111' X 3meissner bulk no strong strong efl'ect Powder partially and very majority strong all strong weak color of bulk very dark green shiny black — bonding and weekly bonded strongly bonded and 930 °C shrinkage rand no significant well crystallized — 7 hr X 4 shrinkage eissner bulk weak strong — effect wder partially and all strong — [PO weak color of bulk dull black —— -—— bonding and bonded and 930 °C shrinkage shrunk —— -—- 7 hr X 5 sigificantly eissner bulk fair — —— effect [powder partiallystrogg -- —— color of bulk shiny black —— —- bonding and strongly bonded 930 °C shrinkage and well — — 7 hr X 6 cgstallized eissner bulk stronL —-- —-- rlefiect [powder majority strong —- — 95 A similar melt-quench effect was obtained when Bi-Pb-Sr-Ca-Cu—O powder mixture was exposed to high energy and short duration laser pulses. Coarse particles were formed by localized melting. Due to a localized rapid heating and quenching, chemical homogeneity of the well mixed starting powder was preserved Therefore, we were able to greatly increase the rate of formation, and the volume fraction of the high-Tc phase ('1'c ~ 110 K) without using any excess Ca and Cu in the starting powder. The mechanism of formation of high TC phase by laser and conventional processesappeartobequite difl‘crentasindicatedbytheXRDdata. AsseeninFigure 42, the conventionally processed sample initially showed a mixture of low Tc - 2212 phase and Ca,PbO,. As the duration of sintering increased, the amount of Ca,PbO, decreased, and a phase cycling behavior was observed[35]. The high TC - 2223 phase was then formed by a reaction between the low Tc phase with Ca,PbO, and CazCuO, [102,103]. Difi‘erent results were observed for two laser processed samples at two difl‘erent laser powers, Figure 43 and44. At an early stage ofsintering, predominately a low Tc - 2212 phase was formed After prolonged sintering, the high Tc phase, Bi,Sr,Ca,Cu,Ox, was formed via an unbalanced reaction ofthe following form[104]: 2Bi,Sr,CaCu,O, -> Bi,Sr,Ca,Cu,o, + 13i,Sr,Cuoz Theinitialformationof2212phaseleavessomeexcessCaandCuionsofthe starting stoichiometric 2223 composition The 2201 (Bi,Sr,CuO,) phase formed, then combineswiththetmusedCaandCuionstoformtheloch-2212 phase. Therefore, comparedtothehigth-2223phase,theamountofretained2201phaseinlaser calcined sampleswasnotlarge. Arbitrary Scale 96 sampleC . Ohlgh Tc‘fl”) ACaszq 0 *C32C003 #2201 DCUO . e o e O 0 e i C ‘ . ‘e l . * A . * 0 «a .,, 85b e e ' e C . e A . I 0 g» * 120h O o ' o a - °-l -‘ 24°" :5 as as 29 (degree) Figure42. mpatternsofconventionallyprowssede-dopedBSCCOmple Arbitrary Scale 97 sample-B e . Ohigh'lam . Glow E0212) e ACaszQ . *C32C003 0 t. “20‘ ' * 15h . r I "1 " "‘ l e e 0 ‘ - at A ‘ ° * * son . o o e. e C O O 0 e A ‘ ' * * 85h e O. 0 O .0 O . o * 120h : a" as ' ' . ' air 29 (degree) Figure43. XRDpatternsof50Watts haer-processede-dopedBSCCO sample 98 sampleA . Ohlgh (2223) . Clank 2th) . . seazpbq, #2201 - . 0040 O 9 e ‘ 15h f. 1 e . e e o ' .0 o O t D ‘ ° 0 50b 0 o . 3‘3 , o E e ' e * O a o ‘ 0 85h . o o . 1 ° 2 .0 n o O , 0 O ‘ 1% 23 36 13 29 (degree) Figure 44. XRD patterns of90 Watts laser-promede-dopedBSCCO sample 99 A considerable amount of CazCuO, was also formed in sample B after prolonged sintering. Due to the complexity of this sample, it is diflicult to determine how much Ca,CuO3 was present. EDS analysis were performed on fiactured surfaces of this sample. TheEDS andXRD data supportthe assumptionthat Cawas infact trapped in the form of Ca,CuO, in the sample B[39]. Thus, a low volume fraction of high Tc phase and the zero resistance temperature below 77 k were observed for this sample. Duetothehighenergydensityofthelaserbeamsomeweightloss,intheform of particulate ejection, of the starting powder is unavoidable during laser calcination process. Thus, the final compositions of laser calcined and conventionally calcined sample were analyzed by EDS rather than by a weight loss measurement. No significant compositional difi‘erence was found through the chemical analysis. 4.2.2 Microstructures and EDS Analysis of Laser Calcined BSCCO Scanning electron micrographs shown in Figures 45 (a) and (b) indicate a characteristic plate-like grain structure. The 90 Watts laser-processed sample , fig 45 (a), showedwell-grownplates 10-30 umwideandabout l umthick. Theplate size oflaser processedsamplewasabomZ-3fimesashrgeastheconvenuomflyprocessedone. Scanning electron micrograph of 50 Watts laser-processed sample shows plate-like grains and some not very well defined phase, Figure 46. Figure 47 shows EDS spectra collected fi'om areasofthe samples showninFigure 45 and46. 100 Figure 45 . Scanning electron micrographs of (a) 90 Watts laser-processed sample, sample A, and (b) conventionally processed sample, sample C 101 Figure 46. Scanning electron micrograph of a 50 Watts laser-processed sample 102 (a) ., ll : i sample A Figure47. EDSspectrmnscollectedfromareasofthesamplesshownin Figure45and46 103 4.2.3 Resistance and Susceptibility Measurements of Laser Calcined BSCCO The measurements made on the resistance and the magnetic susceptibility of laser and conventionally processed samples are plotted as a function of temperature in Figure 48 (a) and (b). All these samples show superconducting onset temperature of about 110 K. The zero resistance temperature of 90 Watts laser-processed sample, after lOOhourssintering,isabout98K The second inflections ofthe ac susceptibility curve were observed for sample A, sintered for 100 hours, and sample C, sintered for 240 hours. The second inflection in these two samples is likely due to Josephson-like weak coupling between the high Tc grains[105]. A sharp drop in magnetic susceptibility for sample A, sintered for only 85 hours, can therefore be attributed to the absence of Josephson-like weak coupling Although the laser and conventionally processed samples show similar onset transition tempuatmesmdovmaflfiendsthemsmtsshowedthatdependmgontheprocessmg conditions the laser processed samples can have a significantly large resistance transition width. 104 SRKJ) A _ _. Soaplr H . 858 8|55°C ’— ... ’ -= ’ _._ See 0 " r Infuse ”' ‘ _._. Soaper / .—- V 2885 885°C / ’H'” w3l. U z c '— 0') CD LU Oi 01 I. 73 81 89 87 185 113 121 129 (b) INDUCIHNCE ( Arbitrary Scale ) 11111 73 81 89 97 185 113 121 129 TENPERHTURE (K) Figure48. (a)Resistancevs. temwatmecurvesandw)Magnetic susceptibility vs. temwaturecurvesofconventionally prowssedand90Wattslaser-proceesedsamp1es 105 4.3 Millisecond Pulsed Laser Vapor Deposition 4.3.1 Problems with Millisecond PLD 4.3.1.1 Target Overheating Problem and Peak Power Density limitation The greatest problem with the millisecond pulse deposition is overheating of the target due to high pulse energy density input required to create a reasonable peak power density on the order of a million W/cm2 for deposition This is due to approximately five orders of magnitude longer pulse-width of the millisecond laser pulse. Hundreds of Joule/cm2 pulse energy density is required to achieve a peak power density close to a million Watt/cm’, which is still much lower than thepeakpowerdensityproducedbyananosecondlaserpulseattypicallyafewJ/cm2 energy density. With a rotating target, overheating and severe local melting are major problems. Avery highpulse energyisrequiredtoobtaintherequiredpeakpowerdensitybecauseof thelarge, 15 mm’elliptical, spotsizenecessarytocovertheentirewidthoftheringto prevent uneven erosion of the target. To avoid formation of excessive liquid phase, and severe segregation with a mtafingdng-mrgetptuseenergyandptnseenergydensityamfimiwdm6lomesand 60 J/cm’. However, the maximum peak power density is restricted below 0.02 MW/cm’ with a 2.2 ms pulse-width. 106 4.3.1.2 Oxygen Depletion As mentioned before oxygen stoichiometry is very critical in obtaining a good YBCO superconductor, and the equilibrium oxygen content decreases at elevated temperatures. Oxygen depletion on the deposited film is expected due to a combination of high laser-induced plasma-temperature and a low oxygen pressure. Moreover, this problem is expected to be aggravated by the high deposition rate of ms-PLD process. 4.3.2 Pressure Dependence of Laser Induced Plume Itisfomdthattheshapeoftheplume,thustheangulardismbtnionofthevapor spedes,isstonglydependeMonmepressmemthedeposiuonchamber,Figme49. The difl'ennceisevenmoreevidentbycompafinglasermdwedpltmesmvacmnnandm one atmosphere air, Figure 50. The angular dependence of various species and dependenceoftheuspafialdismbufionmflnchamberpressmeandotherpamem canbesmdiedusingaspatiallyresolvedemissionspecu'ometer. 107 Figure 49. Oxygen ion-beam, and laser induced plume with 250 us pulse-length and 40 J/cm2 pulse-energy density at oxygen pressure of (a) 100 mtorr and (b) 300 mtorr 108 Figures 50 Laser induced plume with 250 us pulse-length and 40 J/cm pulse-energy density in one atmospherearr 4.3.3 4.3.. of 0.1 Sll 109 4.3.3 Ion-Beam Assisted Millisecond PLD 4.3.3.1 Effect of X-Y Target Manipulator To ease the overheating problem and peak power limitation, a x-y target manipulator was used to obtain a zigzag scanning pattern instead of a more commonly used rotating target configuration. This allows the whole area of a rectangular target to be scanned withamuch smaller laser spot size. As a result, much higher peak power density can be obtained with a combination of much shorter pulse and much smaller pulse-energy. Peek power density as high as 0.16 MW/cm2 was obtained with a 1 mm2 spot size, 0.4 J pulse energy and 250 um pulse-width Even with pulse-energy density as high as 0.16 MW/cm’, a relatively flat target surfacecanbemaintained Thisisduetothefactthatasmalllaserspotandlow ptflse-eneryaflowmorecoolingtimeoneachlocafionofthetargetmuface. 4.3.3.2 Effect of Oxygen Ion Gun Averylargedifl‘erencewasfomdbetweenfilmsdepositedtmderidentical conditions except with or without an oxygen ion-beam. When deposited without an oxygen ion-beam, Figure 51 (a), only a very light coating of a light brown color is deposited on the substrate which is about 0.5 cm recessed in the heater. The brown color of the film indicates oxygen deficiency. The light coatingmaybeexplainedbythepositionofthesubstratewhichisloeetedoutsidethe plume, Figure 49 (a). 110 Under the same conditions, except with the oxygen ion-beam turned on, a tmiform black coating is obtained on the substrate, Figure 51 (b). This observation indicates that oxygen ion beam not only helps to replenish oxygen but also helps to drive vapor species onto the substrate. 4.3.3.3 Spatial variation of film composition An uniform coating of YBCO, with large area coverage more than 1" diameter, has been successfully deposited on fused silica substrates by ion-beam assisted laser vapor deposition, Figure 52. Typical energy dispersive spectra of YBCO film and YBCO target are shown in Figure 53. Results of quantitative analysis using EDS are summarized in Table 6. Compared to the stoichiometric composition, as-deposited film is slightly high in barium content and low in yttrium and copper contents. However, an increasehyttirmmdafiuthudecreasehcoppercontenEmeobsewedafiermepost annealing treatment Table 6. Typical compositions of YBCO films produced by IBPLD process sample conditions yttritnn atomic % barium atomic 96 copper atomic % as deposited on silver substrate 14.6 37.1 48.3 850 °C 60 min annealed on sil- 18.8 36.6 44.6 ver substrate 850 °C 120 min. annealed on 18.4 34.1 45.8 Ag-coated (001) YSZ 850 °C 60 min. annealed on 21.2 34.1 44.7 Ag-coated alumina substrate lll Figure51. Silversubstratesinsubstrateheaterafierlaservapor depositionwithO.25mslaserpulses,401/cm’pulseenergy densityand100 mtorrofO deposited(a)withoution-beam and(b)withion-beam 112 —+— r --e-- la -o- c- 0 . 0 8 16 Distance from Center (mm) Figme52.ChemiealcompositiondisuibufionofasdepositedIBP1DYBCOfilm onfirsedsilieasubstrate(quantitative-Sanalysis) 113 I V V L ACO ' romso “U .2 _-:.r.+a=ieiw_ . IFSII 32K: .EE: 15E iET ch 532= 3W0 cts I Figure53. TypicalEDSspectrmnsfiom(a)alBPIDYBCOfilmand(b)aYBCOtarget 4.3.3.4 broad 8:40 2 Ta fi.fi 7' Fl. It?“ I I and ind 114 4.3.3.4 X-ray Diffraction Analysis of IBPLD Films Data on XRD study of as-deposited and annealed films on silver substrate are summarized in Figure 54. Due to a high deposition rate of the IBPLD process, x-ray dimaction patterns of as-deposited films only show peaks from the substrate plus a few broad peaks around 30° of 20 angle which are attributed to various compounds of Y,O,, BaO and CuO as well as YzBaCuO, , also known as 2-1-1 phase[106], Table 7. Table 7. List of possible compormds which might produce a strong dim'action peak near 30° of 20 for Cu K0. radiation COMPOUND 2-theta I HKL 2-theta I HICL 2-theta I HKL ZBaO.Y,O3 30.4 x 103 28.8 7 110 41.14 4 200 3BaO.2Y,O3 29.28 x l 10 30.09 9 112 42.6 4 207 4BaO.Y,O3 30.09 x - 29.09 9 -- 41.6 5 — BaO.CuO 29.33 x 600 30.15 5 61 1 40.05 3 741 BaO.Y,O3 29.68 x 320 29.48 6 40 31.05 6 121 ZCuO.Y,O3 31.32 x 211 33.2 9 204 33.51 5 13 2Y203.32r02 29.7 x 211 29.42 4 3 34.35 3 122 BaO.ZrO2 30.14 x 110 43.14 4 200 53.52 4 211 2BaO.ZrO2 29.18 x 103 29.83 9 110 43.33 3 200 3BaO.ZZrO2 30.16 x 1 10 29.58 9 105 43.22 6 200 Y,BaCuO, 29.88 x — 30.51 7 - 53.52 4 211 Threestrongestpowderdiffiaetionlinesfi'omCuKalineradiation column ”I": xfor strongestline (100%); othersx 10% Justhalfanhourofpostannealingat850 °Cconvertsmajorityofthefilmtothe 1-2-3 phase which is believed to be influenced by microscopic chemical homogeneity of thefilm. Fmtherameaflngremfltsmfiutherdecreaseofthemn-supercondmfingphases, and development of a higher degree of c-axis preferential orientation which is clearly indicatedbythe increasingratiobetween002 peaknear 15° and 103/110 peaknear 33°. 115 xY203'an0-2Cu0 8Y2 BuCuOSO * YBC12CU3OX 0 YBCO on Ag Ag* as deposited YBCO on 850' 0.511 Ag annealed o YBCO on A9 850' 1b Arbitrary Scale YBCO target 10 20 30 40 50 60 20 (degree) Figure54. XRDpattermonBOOfilmsdepoeitedonsihrersubstrates 1 16 As-deposited films on (001)YSZ and (001)YSZ with a 0.2 mm silver buffer layer show similar results as those for the films on silver substrate. However, after post annealing, a strong film/substrate reaction was observed on films deposited on (001)YSZ, which is indicated by an additional peak of xBaOerO2 near 43°, Figure 55. It is found that 0.2 mm of silver bufl‘er layer efi‘ectively minimizes degradation caused by film/substrate reaction of (001)YSZ substrate, Figure 55. 4.3.3.5 Microstructure of IBPLD Films Typical microstructure of YBCO as deposited film on (001) YSZ, produced by ion-beam laser vapor deposition process with 0.25ms laser pulse and 40 J/cm2 energy densityisshowninFigure56. Asimilarmicrostructurewasalsoobservedforthe as-depositedonsilverzhowever,aquite difi‘erentmicrostructurewasformdfortheas deposited film on (001) YSZ with silver bufi‘er layer, Figure 57. Figure 58 shows microsfiuctmeonBCOfilmsdepositedonsflver,afierhighkmpemhneamalhg. 117 xY203-yBa0-2Cu0 8YzBaCu050 YBCO 0|: (001)YSZ Y802CU3OX. 8501: 1 ZrOZA annealed A“ x BaO - y Zr021 3 YBCO on (001) YSZ with Ag buffer layer E 850T 1"! e annealed g e YBCO target 10 20 30 40 SO 60 70 80 20 (degree) Figure55. XRD onBCOfilmsdepositedona(001)YSZsubstrateand a(001 YSZsubstratewithanAgbufi‘erlayer 118 Figure 56. Scanning electron micrograph of an as-deposited lBPLD film on (001) YSZ (0. 25 ms laser pulse with 40 J/cm2 pulse-energy densitY) 119 Figure 57. Scanning electron micrograph of an as-deposited IBPLD film on (001) YSZ with silver bufi‘er layer (0.25 ms laser pulse with 40 J/cm pulse-energy density) 120 Figure 58. Scanning electron micrograph of a 850 °C, 1 hour, annealed IBPLD film on silver (0.25 ms laser pulse with 40 J/cm’ pulse-energy density) 121 4.3.4 VTFJms-PLD Multi-Layer Ag/Ag-Doped YBCO Tapes 4.3.4.1 Effect of Ag Addition to YBCO Target In IBPLD process, a zigzag scanning pattern of the target with a x-y target manipulator reduces target overheating problem and produces YBCO films with correct compositions. However, for a prolong deposition without frequent re-surfacing, the pulse energy density is restricted to about 60 J/cm2 which limits the deposition rate below 10 nm/s. The target overheating and severe melting problems were completely resolved by the combination of silver doped target and zigzag target scanning pattern. This improvement is believed to be caused by higher densities, higher thermal conductivities and better mechanical strengths ofthe silver doped YBCO targets. The density of silver doped YBCO target increased from about 77% theoretical density, for the pure YBCO target, to about 84% theoretical density, assuming the rule of mixture, for both 15 wt% and 23 wt% Ag-doped YBCO. The flexural strengths of YBCO and 15% Ag—doped YBCO targets, determined by four-point bending, are 12.38 :t 2.39 and 30.51 :t: 0.75 MPa, respectively. Both the strengthandthe scatteringofstrengthdataare greatly improvedbythe silver addition. As a result, continuous deposition rate as high as 50 nm/s was attained with only 15% silver addition ‘ Picture of both YBCO and 23% silver doped YBCO targets after ms-PLD processes, with a moderate pulse energy density, shows clear improvement in resistance tosurfacerougheningbysilverdoping,Figure 59. Thedepositionparametersusedwere 2ppspulse-rate,1mm/ssean-rate,1mmfeedper-scan,and6OJ/cm’pulseenergy density. 122 YBCO-+23% AG 2 cm Figure 59. YBCO and 23% Ag-doped YBCO targets after 4 or 15 laser scans Figure 60 shows seaming electron micrographs of target surfaces alter four laser scans under same conditions. YBCO target shows severe cavitation and cracking while 23 wt% silver doped YBCO appears to be flat and smooth Cross section micrographs of the same YBCO target, Figure 61 (b), shows an almost delaminated resolidified layer of approximately 30 um thickness. On the other hand, the 23 wt% silver doped target only shows a very thin and continuous resolidified layer, Figure 61(a). These differences are even more evident after fifteen laser scans under the same conditions, Figure 62. 123 Figure 60. SEMmierographstakenfrom surfacesofla) 23%Ag-doped YBCOtargetand(b)YBCOtargetaflerfomlaserscans 124 Figure 61. Cross section SEM micrographs of (a) 23% Ag-doped YBCO and(b) YBCO targets after fourlaser scans 125 Figure 62. Cross section SEM micrographs of (a) 23% Ag-doped YBCO and (b) YBCO targets afier fifleen laser scans 126 Similar improvement in the resistance to high power laser pulses is also found with only 15wt% of silver addition to YBCO target. Due to the superior properties of silver doped YBCO targets, 15% silver doped YBCO targets were used for deposition process. 4.3.4.2 Adhesion between Ag layer and Ag-Doped YBCO Layer Figure 63 shows a target after 35 minutes of continuous deposition process and two Ag/Ag-doped YBCO multi-layered thick tapes with approximately 8 microns of Ag-dopedYBCOtoplayers. Oneofthefilmshasbeenbenttoshowgoodadhesion betweentheAg-dopedYBCO layerandthesilver,nodelaminationwereobserved The as-deposited Ag-doped YBCO layers appear to be nooth and dense with goodadhesionthatcanbeseenfiomSEMmicrographstakenfiomsmfaceofan as-deposited film, Figure 64 (a), and fiactured cross section ofa silver doped YBCO/Ag film. Figure 64 (b)- Figure 65 shows atypicalopticalmicrostructme ofanannealed 15wt%Ag-doped YBCOfilmafierpolishing. 'I'hefilmappearstobeverydense,andmostofthesilver content forms uniformly distributed micron size particles. 127 Figure63. A15wt%Ag-dopedtargetafler35 minutesoflaser irradiation, and two AgIAg-doped YBCO multi-layered thicktapeswithapproximate8micronsong-doped YBCOtoplayers 128 Figure 64. SEM micrographs from (a) surface of an as deposited film, and (b) fiactured cross section of an Ag-doped YBCO/Ag film 129 Figure 65. Typical optical microstructure of an annealed, 15 wt% Ag-doped YBCO film 130 4.3.4.3 Effect of Peak Power Density on the Composition of Ag-Doped YBCO Layers EDS data collected from Ag-doped YBCO layers, deposited under different conditions, are shown in Figure 66 along with an EDS spectrum from a silver doped targetforcomparison. Peakpowderdensityisthemostimportantlaserparameterin ms-PLD process. Samples produced with the same pulse energy density but different pulse duration, hence difl‘erent peak power density, have quite difi‘erent compositions. Samples deposited at peak power density of about 0.9 MW/cm2 have compositions very close to that of the target. On the other hand, samples with lower peak powder densities, e.g. about 0.2 MW/cm’, show yttrium and copper depletion. 4.3.4.4 X-ray Dimaction Analysis of Ag-Doped YBCO Layers Typicaldataonmstudyofas-depositedandameeledAg-dopedYBCOlayers aresummarizedinFigme67. TheXRDpatternofasdepositedAg-dopedYBCOlayers showverybroadsilverpeaksandaverybroadpeaksarormd30°of2-Osimilarto tie-deposited IBPLD films. The as-deposited layers are more amorphous than as-deposideBPIDfilmsduemmmhlowersubsuawtempemuneandtheabsenceof highenergyoxygenion-beam. Just 20 minutes ofpost processing annealing at 855 °C, converts majority ofthe layertol-2-3 phase. Thisisbelievedtobeeausedbymieroscopic chemical homogeneity oflayers. Fmtherannealingat905°Cfor30minutesresultsinadecreaseofthe non-superconducting phases. Higher degree of c-axis preferential orientation, indicated bytheimreasmgintensflyoftheOOZpeaknear15°,isobmimdbyanaddifional30 mhanedhgaW5°Qhowwerthemdesirablesecondphasealwdewlopsdming prolongannealing. 131 ch 560= 517 Figue66. .Sapectrafi'om(a)15%Ag-dopedYBC01ayerdepositedwith2.5mslaser pulses,27OJ/em’enerydensityandabom0.2MW/cm’peakpowerdenfity (b)15%Ag-dopedYBCO layerdepositedwith0.6mslaserpulses,2701/cm; energy density and about 0.9 MW/cm2 peak power density, and (c) 15% WYBCOW Arbitrary Scale 132 szanBaO'zCuO 8t YzBaCu05 O YBazCuan 0 ° A Aga as deposited D A 855° C/20m1% ‘ D I 85530/20min+° 905 C/30m1n A U U 0 an A Cl 0 E] .An 855°C/20min+ 905°C/q9nin [:1 DO [6' I I IZIOI I I I3IOI I I I4|OI I I I5lOI I I I6|O 28 (degree) Figure 67. Typical x-ray diffiaction patterns taken from as-deposited and annealed 15% Ag-doped YBCO layers 133 4.3.4.5 Critical Temperature of Ag/Ag-doped YBCO Tapes Critical temperature (Tc) ofthe annealedtapeswasmeastn'edusingastandard four-probe technique with an auto-balance bridge. Figure 68 is a typical resistant-temperature curve of Ag/Ag-doped YBCO tapes annealed at 855 °C for 20 minutes and 905 °C for 30 minutes respectively. A metallic behavior (positive temperature coefiicient of resistivity) is observed in the normal state followed by a broad transition, and a TC ofabout 77 K. 160 “120.. T on c: I up <3 I RESISTANCE (In-Ohm 0 l 1 1 1 '73 93 113 133 153 173 TEMPERATURE ( Kl Figure 68. Typical resistant-temperatme curve of an annealed Ag/Ag-doped YBCO tape 5. SUMNIARY 5.1 Factors Which Afiect Processing of Bulk YBCO Superconductors The preparation of bulk YBCO superconductors, through conventional solid-state processes, has been systematically studied. Carefirl wet grinding and firm hand packing were found to greatly accelerate the calcination and formation of the YBCO compound Furthermore, impurity less than 0.1% in the starting materials can significantly retard the formation of the YBCO compound. High green density is important in obtaining high quality bulk superconductors. High green density can be obtained using a well crystallized YBCO powder with a shiny black appearance. 5 .2 Laser Calcination of Pb-Doped BSCCO The problem associated with sluggish kinetics of formation of 2223 high Tc phase in Pb-doped Bi-Sr-Ca-Cu—O system was investigated A laser calcination process for Pb-doped Bi-Sr-Ca-Cu-O (BSCCO) material was established that reduces total processing time of obtaining a near-single phase high Tc material to about 100 hours. The high Tc phase was found to form via a different kinetic path in laser calcined sample compared with the conventionally processed sample. The onset critical temperature of the laser calcined sample was found to be about 110 K However, the zero resistance temperature was about 98 K. 134 135 5.3 Ion-Beam Assisted Millisecond PLD An ion beam assisted millisecond pulsed laser vapor deposition process was developed to fabricate YBa,Cu,Ox (YBCO) high Tc superconductor films. Target overheating problem is greatly reduced by using a zigzag scanning pattern of the target with a x-y target manipulator. With the x-y target manipulator, peak power density up to 0.16 MW/cm2 can be attained to deposit YBCO film with a composition close to the target composition. Large uniform YBCO film was successfully deposited on fused silica substrate. High energy oxygen ion beam used in this process is found not only to replenish oxygen, but also to help propagating vapor species onto the substrate. As-deposited films are composed of various compounds of Y,O,, BaO and CuO as well as Y,BaCuO,. Due to microscopic chemical homogeneity of films, films with majority of 1-2-3 phase are formed by just halfan hour of post annealing at 850 °C. The silver buffer layer is found to efiecfively minimize degradation caused by film/substrate reaction of (001)YSZ substrates during post annealing 5 .4 VTE/ms-PID MAS-DOM YBCO Tapes A new process, combining ms-PLD and vacuum thermal evaporation (VTE) techniques, was developed to produce a multi-layer Ag doped YBCO/Ag thick film. The target overheating and severe melting problems were completely resolved by thecombinationofsilverdopedtargetandazigzagtargetscanningpattem This improvement is believed to be caused by higher densities, higher thermal conductivities and better mechanical strengths ofthe silver doped YBCO targets. 136 As a result, continuous deposition rate as high as 50 nm/s was attained with only 15% silver addition Ag doped YBCO layer and the silver shows good adhesion, no delamination were observed even after bending. Peak power density is found to be the most important laser parameter in ms-PLD process. Samples produced with high peak power density have compositions very close to that of the target. On the other hand, samples produced with lower peak powder densities show yttrium and copper depletion The ms-PLD processed Ag-doped YBCO tapes show a metallic temperature dependence of resistance in the normal state and a broad transition to a TC of about 77 K. APPENDIX APPENDIX Addendum to the review of Selected Theories of Superconductivity List of Symbols H magnetic field strength E, Fermi energy B magnetic flux density v, velocity of electrons at E' A magnetic potential field F. superconducting state free energy density 1 current density Fa normal state free energy density T temperature 9 Debye temperature Tc critical temperature 0n Debye frequency e charge of an electron U electron-phonon interaction matrix elements m mass of an electron EI superconducting energy gap C speed of light in vacuum 3. penetration depth k, Boltzmann’s constant M London penetration depth h Planck's constant g coherence length ll h / 2n 5,0 intrinsic coherence length e' charge of superconducting x Ginzburg-Landau parameter charge carrier (1: = 7d: ) m' mass of superconducting (D total magnetic flint charge carrier n conduction electron density (Do fluxoid ns superconducting electron Hc thermodynamic critical field density n', density of superconducting HeI lower critical field charge carrier N, normal state electron density at Hc2 upper critical field the Fermi energy 137 138 Al Two-Fluid Model: A. 1.1 Free Energy in Superconducting State Letn=NNbethedensityofallconductionelectrons,whereNandVare the total number of conduction electrons and volume of the sample. n, and n. denotes the superconducting and normal-state electron densities, respectively. The two fluid model assumes a free energy of the conduction electrons in superconducting-state as been = xl/zrna)+(1—x)£sm [56]. where x = nn/n is the fraction of normal state electrons. Freeenergyofnormal stateelectronsissettobe fnm = —YT2/2 in order to get a linear electron specific heat ofnormal -state, i.e. Cm: -T 5260') m2 = 'yT. Freeenergyofsuperwndiwfingelecuomissettobeequaltothesupemonducfing condensationenergy-B,i.e.£r(‘r)= 43. Sinccx=0at0K,ie.allelectronsare incondensedstate,F:(0.0)= —B All Temperature Dependence of Superconducting Electron Density The equilibrium fraction of normal-state and superconducting electron at temperatmeTcanbeobtainedbysetting(6F/OX)T =0. 139 2 4 4 =.Y_T_ = l 2 - xequg 1682 _ (Tc) ,where Tc — 4B/y. Therefore, n,/n= l- (T/Tc)4 l;therefore,n,(Tc)= 0 and n,(0)= n . A13 Temperature Dependence of Thermodynamic Critical Field TheparametersBandycanbederivedusingthepropertythatthefreeenergy difference between normal and superconducting states is equal to the magnetic energy at the thermodynamic critical field, i.e. 2 Fn-F,=%:- anan=fn= -yT2/2 F" — F, = r.. - {XI/2f" +(1-x)f_,} = {1- crrrc>2}(-v'r2/2) — {1— (mark—p) .-. p{—3’§(r2 -— r4rr3) + 1- {my} e{—(2/TZ:) (T2 - WI?) + 1— any} 2 B{l- (Hafiz: ’3‘;- 9 [Harm (81IB)"2{ 1 - any} = He(°){ 1 - arrc)2}| 140 A. 1.4 Electron Specific Heat Consider the Helmholtz free energy, F(V,T) = E - TS, the following relations are true for any reversible process: dF=-PdV-S¢Il‘ ; (6F/5T)V=-S; dS=dQRlT ;Cv=(dQ/d1),,=(dE/Jl')y; (Cyril/Dy = (dQ/T)V= dS . Therefore, lee = T(dS/dI‘) .-. T%(-6F/5I')y= awe/er?) V l The electron specific heat in normal and superconducting states, Cmand Ces,can be obtained by -r(a21=,,/ar2) and —T(02F,/er2) . respectively. 62F» a a 41" a -T—2- = ‘Tfi[3f('T)] = “T5679 = YT a... mm (ell-ail {1—(%)}‘<-m _ r B) 4 _ 1 B 4 1 4 _——+—r---—+—r- =——r— ( 2T? r2 '3 I 2'r% «rs/mi} ‘3 41% '3 [cw 4:? =3vTc(%)3 (ca / em, = {swear/ref} Int.) = 3 141 A2 London Equation The London equation is an important phenomenological theory based on the two fluid model to try to understand the Meissner effect. Recall the result of the two fluid model, the density of superconducting electrons is 2’f.—”—=1—c1‘rr.)“. 1130c): 0. and n.(0)= n ~ The current due to the superconducting electrons is j = -ev,ns where its is the velocity of superconducting electrons which can be obtained from Newton's law F = m(dv/dt) = -eE. Thus, 6I 6V 32: bT=~cn;-;=l-%JE substituting E above into Maxwell's equation, VxE = - gas/at) , yields gtfiv x 1 + a): o [56]. The Londons showed that the Meissner effect can be account for by restricting the solutions to those satisfying B: TCVXJ whichiscalledtheLondon ' e n, i equation[55,56]. A2.1 London Penetration Depth Another form of the London equation can be obtained by applying Maxwell's equations, VxB=(4n/C)] and V-B=0, and the vector identity, V x (v x B)= V(V . a) - v23 to the above equation that yields[55,56] 142 2 B=-%C-Vx(2%VxB) =_ ”C V213 or V23=B/xi J’ e n, 41tn_,e2 where 31. is the London penetration depth defined as Lie—i a mC2 / 41tnse2I. Yet, the other form of the London equation is obtained by taking curl of both sides of the first form of London equation and applying the physical bormdary V 0 j = 0 , that yields[56] VxB = (%'—)j=—;¥2”iVxij=-§fi[V(V-j) —v21] or |v2j=1/A§|. A.2.2 Exponential Decay of the Magnetic Field B and Supercurrent Density 1 V23= BIL: and v21=y 1% indicate exponential decay ofthe magnetic field andsupercturentfromthefieestn'face intoasuperconductorwithacharacteristic length equal to the London penetration depth 3‘1.- Forexample, letthefree surfaceofthe superconductortobeperpendiculartothe x axis with positive x in the superconductor, and let the applied magnetic field parallel to positive 2 direction and the supercurrent in the positive y direction Solutions for the magnetic field and supercurrent density are[56] [32 = Bz(O)exp(—x/ AL) land I” = jy(0)exp(-x/ KL) , ,respectively. 143 A.2.3 Temperature Dependence of the London Penetration Depth Temperature dependence of the London penetration depth can be obtained by adopting the temperature dependence of (us/n) from the two-fluid model[56]. mm = (mCZ/ 41m,c2) 1/2 = {(mC2/4rmc2)/ [1 _ (T/Tc)4]}1/2 [MID = xr(o>[1 - cr/ mfl’m I A.2.4 Magnetic Potential Field A and London Rigidity TheLondonequationcanalsobewrittenintermsofavectorpotentialA,which willbeusedindiscussingGinzbtug-Iandautheory,suchthatB=VxA. Thefirstform ofLondonequationcanberewriteintermsofMas C C j “C 4:1}. 41: x12 '1: 4x1 1. SincejccA ,wehaveV-A=0andA,.=0,whereA,. iscomponentoprerpendicular toextemalsrufaee,inordertosatisfyingphysicalbormdaryconditionV-j=Oandjn=0. Thisequafioncanalsobeobtainedinamoreinmitivewaybyconsideringthe canonical momentum P=mv+(—eA)/C. London proposed a quantum mechanical theorytlntifthegrotmdstatewawfimefionismchangedbytheappficauonofthe magnetic field, i.e. ‘I’ = To so-called London rigidity, the net moment P should be zero. The London equation for the supercurrent density follows automatically[56, 58]. _ --E s; _-_nnei =_ C I"’“’”” m(P+C)0’ tnCA 4,,sz L 144 1/2 2.1,(0): (mC2/41tnc2) or in the SI units “2 11(0) = (eomc2/ nez) 107/41tC2 Coul.2/N-m2 -9.110xio-31(kg)-02 1112/52 ( )( ) ( ) n(m-3)-(1.602x10-19)2(Cou1.2) = tr“2 . 5.315 x106(m)= tr"2 - 5.315 x1015(nm) For metallic elements the conducting electron concentration, n, is in the order of 1028~1029m'3[55]. The corresponding 2., in the order of 101~ 102 nm. Experimentally measured penetration depth in elemental superconductors tend to be largerthanthe calculated 11(0) [56]. Fmsuperconductorthinfilmsinmagneficfieldsparaflelwthefilm,themagnefic field will penetrate the whole film resulted in incomplete Meissner efl‘ect ifthe thickness offilmismuchsmallthanthepenetrationdepth. Veryhighcriticalfield,HOis expectedmthissnuafionbecausetheindwedfieldismuehlessthantheapphed magnetic field, and the free energy expression, 2 a - 81: F" -F, = , no longer holds. rte. w 145 A3 Ginzburg - Landau Theory (G.L. theory) All Ginzburg-Landau Order-Parameter Ginzburg and Landau (1950) proposed a phenomenology theory of amerwndtwfingsmtemmmsofaspafialwfiedorderparamewr‘l’(r)WMchvammesm a second-order phase transition temperature[55,56.58]. ‘I’(r) is related to local superconducting charge carrier density, n,’ . ‘I”(r)‘I’(r) = l‘1’(r)l2 =ne’(r) f A.3.2 Ginzburg - landau Free Energy In the absence of magnetic field and spatial variation of order-parameter, the difi‘erenceinfieeenergydensityisexpressedintypicallandaufomfi]. F, 43. = -aI‘I’I2 + -;-Bl‘~l'l4 = —otn..’ + %Bn,;2 ParametersaanchavepropertiesthatB>0foranysecond-orderphase transition,a>0fortemperaturebelochanda<0fortemperatureaboveTc. This energydensitydifi‘erenceexhrbitsastableminimmnat ‘I’=0forT>Tc,i.e.thenormal state. Inthesuperconductingstate,i.e.T . By shifting the origin from x=0tox=xo=—likyC/(e’B) , the x coordinate becomes X = x - x,. Substituting to the above equation yields[55] e’B 2 nzki m-éazz-d’m +— (2)2 X @= ((1- 2111’ )0 , Thisequationisintheformoftheschrédingerequationforthemagnitudepart,u(x), of an linear harmonic oscillator[107]. --“—- du+«1-kx2u=Eu Undertheboundary condition u—)0asx-+oo,the energy eigenvalueE canonlybe in the form En =(n+1/2)hv=(n+ U2)“, W60=Wm)m is the angular frequency of the oscillator and n is any non-negative integer. ( are 153 The maximum magnetic Bmax =Hc2 is corresponding to n = 0[55]. Because the supercurrent andA is in the Y direction, IE2 is zero. H02 23m = 2am’C/(e’h) 1/2 This can be related to the thermodynamic critical field He = (41tt12/B) by using the Ginzbug-Iandauparameterx:%f(%)m. 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