Macroscopic properties of a multipolar electron cyclotron resonance microwave-cavity plasma source for anisotropic silicon etching

In Collections: Electronic Theses & Dissertations

Copyright Status: In Copyright

Material Type: Theses

Authors: Hopwood, Jeffrey Alan

Date: 1990

Subjects: Cyclotron resonance
Plasma etching
Silicon

Program of Study: Electrical Engineering

Degree Level: Doctoral

Language: English

Pages: xv, 250 pages

Permalink: https://doi.org/doi:10.25335/dnyn-n462